Patents by Inventor Atsuko TERAOKA

Atsuko TERAOKA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10138555
    Abstract: A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.
    Type: Grant
    Filed: October 12, 2016
    Date of Patent: November 27, 2018
    Assignee: HORIBA STEC, CO., LTD.
    Inventors: Hiroshi Nishizato, Kotaro Takijiri, Masakazu Minami, Atsuko Teraoka
  • Patent number: 9823181
    Abstract: The present invention intends to provide a Cp2Mg concentration measuring device capable of accurately measuring the concentration of Cp2Mg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 ?m and on the basis of the light intensity, calculate the concentration of Cp2Mg in a material gas.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: November 21, 2017
    Assignee: HORIBA STEC, CO., LTD.
    Inventors: Daisuke Hayashi, Yuhei Sakaguchi, Masakazu Minami, Atsuko Teraoka
  • Publication number: 20170101715
    Abstract: A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.
    Type: Application
    Filed: October 12, 2016
    Publication date: April 13, 2017
    Applicant: HORIBA STEC, CO., LTD.
    Inventors: Hiroshi NISHIZATO, Kotaro TAKIJIRI, Masakazu MINAMI, Atsuko TERAOKA
  • Publication number: 20170052115
    Abstract: The present invention intends to provide a Cp2Mg concentration measuring device capable of accurately measuring the concentration of Cp2Mg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 ?m and on the basis of the light intensity, calculate the concentration of Cp2Mg in a material gas.
    Type: Application
    Filed: August 18, 2016
    Publication date: February 23, 2017
    Applicant: HORIBA STEC, CO., LTD.
    Inventors: Daisuke HAYASHI, Yuhei SAKAGUCHI, Masakazu MINAMI, Atsuko TERAOKA