Abstract: A radioactive noble gas removal filter, a filter unit, and a nuclear reactor containment vessel vent system with improved durability are provided. The radioactive noble gas removal filter according to the present invention includes a polyimide film including a structural unit represented by general formula (1).

Abstract: A slurry containing: abrasive grains; a compound X; and water, in which the abrasive grains contain cerium oxide, and a hydrogen bond term dH in Hansen solubility parameters of the compound X is 15.0 MPa1/2 or more. A polishing method including polishing a surface to be polished by using this slurry.

Abstract: A slurry containing: abrasive grains; a compound X having 3 or more carbon atoms; and water, in which the abrasive grains contain cerium oxide, and a dispersion term dD in Hansen solubility parameters of the compound X is 18.0 MPa1/2 or less. A polishing method including polishing a surface to be polished by using this slurry.

Abstract: A reception unit (32) receives shape values pertaining to the shapes of respective configurations of a semiconductor package, and physical property values of materials to use. Each time the shape values and the physical property values are received, a simulation unit 34simulates warpage of a substrate on the basis of the received shape values and physical property values. A calculation unit (36) calculates, with regard to each of plural materials registered in a material database (40) in advance, the difference between physical property values of the plural materials and the received physical property value. A display control unit (38) displays simulation results and the results of calculating the difference in physical property values at a display device.

Abstract: A problem is to specify a more proper manufacturing process for a product as a material. A configuration of the present invention for solving the above problem is a manufacturing process optimization system 1 which includes an input device 12 which receives a final product and information on its manufacturing process, a central control device 11 which in accordance with a product management unit 21 stored in a main storage device 14, separates each process block constituting the manufacturing process into functions that the process thereof is responsible for, and selects the sensitivity of each separated function along the manufacturing process to thereby calculate process conditions in all manufacturing process, and an output device 13 which outputs the process conditions.

Abstract: A slurry containing: abrasive grains; a compound X; and water, in which the abrasive grains contain cerium oxide, and a hydrogen bond term dH in Hansen solubility parameters of the compound X is 15.0 MPa1/2 or more. A polishing method including polishing a surface to be polished by using this slurry.

Abstract: A slurry containing: abrasive grains; a compound X having 3 or more carbon atoms; and water, in which the abrasive grains contain cerium oxide, and a dispersion term dD in Hansen solubility parameters of the compound X is 18.0 MPa1/2 or less. A polishing method including polishing a surface to be polished by using this slurry.

Abstract: A radioactive noble gas removal filter, a filter unit, and a nuclear reactor containment vessel vent system with improved durability are provided. The radioactive noble gas removal filter according to the present invention includes a polyimide film including a structural unit represented by general formula (1).

Abstract: A problem is to specify a more proper manufacturing process for a product as a material. A configuration of the present invention for solving the above problem is a manufacturing process optimization system 1 which includes an input device 12 which receives a final product and information on its manufacturing process, a central control device 11 which in accordance with a product management unit 21 stored in a main storage device 14, separates each process block constituting the manufacturing process into functions that the process thereof is responsible for, and selects the sensitivity of each separated function along the manufacturing process to thereby calculate process conditions in all manufacturing process, and an output device 13 which outputs the process conditions.

Abstract: The present invention relates to a method of producing a composite particle of a nanoparticle and a liposome in which a substance to be introduced has been encapsulated, characterized in that a hollow nanoparticle containing a hepatitis B virus protein or a modification thereof is fused to the liposome in which the substance to be introduced has been encapsulated.

Abstract: A process for producing a polyester film is disclosed, which comprises melt-mixing from 3 to 12 parts by weight of a master polymer comprising a poly(alkylene terephthalate) which contains from 0.3 to 3 wt % inorganic lubricant and has an intrinsic viscosity of 0.5 or higher with from 97 to 88 parts by weight of a poly(alkylene terephthalate) containing no inorganic lubricant and having an intrinsic viscosity of 0.5 or higher, and forming the resulting mixture into a film by the electrostatic casting method. The master polymer is obtained by a process comprising adding to a poly(alkylene terephthalate) oligomer having an average degree of polymerization of 10 or lower an alkylene glycol slurry of an inorganic lubricant and specific amounts of a potassium compound and a phosphorus compound, depolymerizing the oligomer, subsequently adding specific amounts of antimony trioxide and germanium dioxide, and then effecting polycondensation.

Abstract: A flame resistant polyester produced by addition and copolymerization of a phosphorus compound represented by general formula (I) below as a diol component of the polyester in an amount of 500 ppm or more in terms of phosphorus atom content in the polyester, which polyester has alkylene terephthalate units as main repeating units and which has an intrinsic viscosity of not less than 0.5 measured at 20.degree. C. in a mixture of equal weight of phenol and tetrachloroethane: ##STR1## where E is --CH.sub.2 CH.sub.2 --, Ar is an aromatic group or an aromatic group substituted by a lower alkyl group or a halogen atom, and m and n denote, respectively, integers the sum of which is from 1 to 20.