Patents by Inventor Atsunobu Murakami

Atsunobu Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical element and exposure apparatus
    Patent number: 10175584
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: October 17, 2013
    Date of Patent: January 8, 2019
    Assignee: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Optical element and exposure apparatus
    Patent number: 9046796
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: June 2, 2015
    Assignee: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • OPTICAL ELEMENT AND EXPOSURE APPARATUS
    Publication number: 20140043592
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: October 17, 2013
    Publication date: February 13, 2014
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • OPTICAL ELEMENT AND EXPOSURE APPARATUS
    Publication number: 20120212716
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: February 28, 2012
    Publication date: August 23, 2012
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • OPTICAL ELEMENT AND EXPOSURE APPARATUS
    Publication number: 20120206705
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: April 18, 2012
    Publication date: August 16, 2012
    Applicant: NIKON CORPORATION
    Inventors: Takeshi SHIRAI, Takao KOKUBUN, Hitoshi ISHIZAWA, Atsunobu MURAKAMI
  • Optical element and exposure apparatus
    Patent number: 8189170
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: May 29, 2012
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Optical element and exposure apparatus
    Patent number: 8149381
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: May 2, 2006
    Date of Patent: April 3, 2012
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Optical element and exposure apparatus
    Patent number: 7993008
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: November 14, 2008
    Date of Patent: August 9, 2011
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Optical element and exposure apparatus
    Publication number: 20100220305
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: February 25, 2010
    Publication date: September 2, 2010
    Applicant: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Optical element and exposure apparatus
    Patent number: 7697111
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Grant
    Filed: August 26, 2004
    Date of Patent: April 13, 2010
    Assignee: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Optical element and exposure apparatus
    Publication number: 20090103070
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: November 14, 2008
    Publication date: April 23, 2009
    Applicant: Nikon Corporation
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami
  • Optical element and exposure apparatus
    Publication number: 20060203218
    Abstract: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
    Type: Application
    Filed: May 2, 2006
    Publication date: September 14, 2006
    Applicant: NIKON CORPORATION
    Inventors: Takeshi Shirai, Takao Kokubun, Hitoshi Ishizawa, Atsunobu Murakami