Patents by Inventor Atsuo MATSUTANI

Atsuo MATSUTANI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11430611
    Abstract: Disclosed herein a thin film capacitor that includes a lower electrode layer, an upper electrode layer, and a dielectric layer disposed between the lower electrode layer and the upper electrode layer. The dielectric layer has a through hole. The upper electrode layer has a connection part connected to the lower electrode layer through the through hole and an electrode part insulated from the connection part by a slit. A surface of the lower electrode layer that contacts the connection part through the through hole includes an annular area positioned along an inner wall surface of the through hole and a center area surrounded by the annular area. The annular area is lower in surface roughness than the center area.
    Type: Grant
    Filed: February 2, 2021
    Date of Patent: August 30, 2022
    Assignee: TDK CORPORATION
    Inventors: Yuuki Aburakawa, Tatsuo Namikawa, Akiyasu Iioka, Atsuo Matsutani, Hitoshi Saita, Kazuhiro Yoshikawa
  • Publication number: 20210265116
    Abstract: Disclosed herein a thin film capacitor that includes a lower electrode layer, an upper electrode layer, and a dielectric layer disposed between the lower electrode layer and the upper electrode layer. The dielectric layer has a through hole. The upper electrode layer has a connection part connected to the lower electrode layer through the through hole and an electrode part insulated from the connection part by a slit. A surface of the lower electrode layer that contacts the connection part through the through hole includes an annular area positioned along an inner wall surface of the through hole and a center area surrounded by the annular area. The annular area is lower in surface roughness than the center area.
    Type: Application
    Filed: February 2, 2021
    Publication date: August 26, 2021
    Applicant: TDK CORPORATION
    Inventors: Yuuki ABURAKAWA, Tatsuo Namikawa, Akiyasu Iioka, Atsuo Matsutani, Hitoshi Saita, Kazuhiro Yoshikawa
  • Patent number: 10755854
    Abstract: Provided is a thin film capacitor that includes: a first electrode layer having a principal surface in which a plurality of recesses are provided; a dielectric layer laminated on the principal surface of the first electrode layer; and a second electrode layer laminated on the dielectric layer. When a depth of the recess is defined as FL and a thickness of the dielectric layer is defined as T, H/T is 0.05 or more and 0.5 or less.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: August 25, 2020
    Assignee: TDK CORPORATION
    Inventors: Masahiro Hiraoka, Hitoshi Saita, Suguru Andoh, Atsuo Matsutani
  • Patent number: 10472250
    Abstract: A piezoelectric layer made of potassium sodium niobate which is a perovskite type compound represented by the formula ABO3, wherein, in the Raman spectroscopy measurement of the piezoelectric layer which is performed while the piezoelectric layer is rotated in the in-plane direction, the measured intensity of the lattice vibration region of the perovskite type compound in the Raman spectrum obtained in polarized Raman spectroscopy measurement (yx) has a periodicity of approximately 90°, wherein, the polarized Raman spectroscopy measurement (yx) is performed while the piezoelectric layer is rotated in the in-plane direction and Raman scattering light is polarized in a direction perpendicular to that of the incident light.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: November 12, 2019
    Assignee: TDK CORPORATION
    Inventors: Masahiro Oishi, Atsuo Matsutani, Ryu Ohta
  • Publication number: 20190103220
    Abstract: Provided is a thin film capacitor that includes: a first electrode layer having a principal surface in which a plurality of recesses are provided; a dielectric layer laminated on the principal surface of the first electrode layer; and a second electrode layer laminated on the dielectric layer. When a depth of the recess is defined as FL and a thickness of the dielectric layer is defined as T, H/T is 0.05 or more and 0.5 or less.
    Type: Application
    Filed: September 28, 2018
    Publication date: April 4, 2019
    Applicant: TDK Corporation
    Inventors: Masahiro HIRAOKA, Hitoshi SAITA, Suguru ANDOH, Atsuo MATSUTANI
  • Publication number: 20160133825
    Abstract: A piezoelectric layer made of potassium sodium niobate which is a perovskite type compound represented by the formula ABO3, wherein, in the Raman spectroscopy measurement of the piezoelectric layer which is performed while the piezoelectric layer is rotated in the in-plane direction, the measured intensity of the lattice vibration region of the perovskite type compound in the Raman spectrum obtained in polarized Raman spectroscopy measurement (yx) has a periodicity of approximately 90°, wherein, the polarized Raman spectroscopy measurement (yx) is performed while the piezoelectric layer is rotated in the in-plane direction and Raman scattering light is polarized in a direction perpendicular to that of the incident light.
    Type: Application
    Filed: November 6, 2015
    Publication date: May 12, 2016
    Inventors: Masahiro OISHI, Atsuo MATSUTANI, Ryu OHTA