Abstract: An inkjet printhead includes multiple sets each of which includes a nozzle, pressure chamber, and actuator; a circuit board; and a connection member. The circuit board includes a wire, through hole via, and ink channel. The connection member, which connects the wire to a driving unit, is provided outside of an array area where the sets are two-dimensionally arrayed. The number of the nozzle rows is N, and each row includes M nozzles (M and N: integer of 2 or more). The through hole vias corresponding to the nozzles of n nozzle row of the N nozzle rows are provided inside of the array area (n: 1?n<N). The through hole vias corresponding to the nozzles of the N nozzle rows except the n nozzle row are provided outside of the array area.

Abstract: A manufacturing method of nozzle plate for liquid ejection head includes, providing a substrate having a first base material of Si and a second base material, of which the etching rate in Si anisotropic dry etching is lower then that of Si, provided on one side of the first base material, forming a film as a second etching mask on the surface of the second base material, forming a second etching mask pattern having a small-diameter opening shape in the second etching mask film, etching until the etching part is extended through the second base material, forming a film as a first etching mask film on the surface of the first base material, forming a first etching mask pattern having a large-diameter opening shape in the first etching mask film, and Si anisotropic dry etching until the etched part is extended through the first base material.

Abstract: An inkjet printhead includes multiple sets each of which includes a nozzle, pressure chamber, and actuator; a circuit board; and a connection member. The circuit board includes a wire, through hole via, and ink channel. The connection member, which connects the wire to a driving unit, is provided outside of an array area where the sets are two-dimensionally arrayed. The number of the nozzle rows is N, and each row includes M nozzles (M and N: integer of 2 or more). The through hole vias corresponding to the nozzles of n nozzle row of the N nozzle rows are provided inside of the array area (n: 1?n<N). The through hole vias corresponding to the nozzles of the N nozzle rows except the n nozzle row are provided outside of the array area.

Abstract: A liquid ejection head, having: an insulating nozzle plate provided with a nozzle having, a liquid supply port to supply liquid and an ejection port to eject the liquid supplied from the liquid supply port onto a substrate; a cavity communicating with the liquid supply port to reserve the liquid to be ejected from the ejection port; an electrostatic voltage applying device to generate an electrostatic attraction force by applying an electrostatic voltage between the liquid in the nozzle and the cavity, and the substrate; and a control device to control the electrostatic voltage applying device for conducting polarization relaxation operation by applying an electrostatic voltage having reverse polarity opposite to that of the electrostatic voltage applied in liquid ejection, wherein the nozzle is a flat nozzle and the control device.

Abstract: A liquid ejection head including: an insulating nozzle plate 5 provided with a nozzle having, a liquid supply port to supply liquid and a ejection port to eject the liquid supplied from the liquid supply port onto a substrate; a cavity in communication with the liquid supply port to reserve the liquid to be ejected from the ejection port; an electrostatic voltage application device to generate an electrostatic attraction force by applying the electrostatic voltage between the liquid in the nozzle and in the cavity, and substrate; and a control device to control application of the electrostatic voltage through the electrostatic voltage application device; wherein the nozzle is a flat nozzle not protruding from the nozzle plate and the control device control the electrostatic voltage application device so as to eject the liquid from the nozzle by applying a bipolar pulse which alternates between negative and positive polarity.

Abstract: A liquid ejection head including: an insulating nozzle plate 5 provided with a nozzle having, a liquid supply port to supply liquid and a ejection port to eject the liquid supplied from the liquid supply port onto a substrate; a cavity in communication with the liquid supply port to reserve the liquid to be ejected from the ejection port; an electrostatic voltage application device to generate an electrostatic attraction force by applying the electrostatic voltage between the liquid in the nozzle and in the cavity, and substrate; and a control device to control application of the electrostatic voltage through the electrostatic voltage application device; wherein the nozzle is a flat nozzle not protruding from the nozzle plate and the control device control the electrostatic voltage application device so as to eject the liquid from the nozzle by applying a bipolar pulse which alternates between negative and positive polarity.

Abstract: A liquid ejection head having: a nozzle for ejecting a liquid; a flat nozzle plate on which the nozzle is provided; a cavity to store the liquid to be ejected from an ejection hole of the nozzle; a pressure generating section which generates pressure on the liquid in the nozzle and forms a meniscus of the liquid in the ejection hole of the nozzle; an electrostatic voltage applying section which applies electrostatic voltage between a base material and the liquid in the nozzle and the cavity, and generates electrostatic suction force; and an operation control section which controls applying of the electrostatic voltage by the electrostatic voltage applying section, and controls applying of drive voltage to drive the pressure generating portion, wherein a volume resistivity of the nozzle plate is 1015 ?m or more.

Abstract: A manufacturing method of nozzle plate for liquid ejection head includes, providing a substrate having a first base material of Si and a second base material, of which the etching rate in Si anisotropic dry etching is lower then that of Si, provided on one side of the first base material, forming a film as a second etching mask on the surface of the second base material, forming a second etching mask pattern having a small-diameter opening shape in the second etching mask film, etching until the etching part is extended through the second base material, forming a film as a first etching mask film on the surface of the first base material, forming a first etching mask pattern having a large-diameter opening shape in the first etching mask film, and Si anisotropic dry etching until the etched part is extended through the first base material.

Abstract: A liquid ejection head, having: an insulating nozzle plate provided with a nozzle having, a liquid supply port to supply liquid and an ejection port to eject the liquid supplied from the liquid supply port onto a substrate; a cavity communicating with the liquid supply port to reserve the liquid to be ejected from the ejection port; an electrostatic voltage applying device to generate an electrostatic attraction force by applying an electrostatic voltage between the liquid in the nozzle and the cavity, and the substrate; and a control device to control the electrostatic voltage applying device for conducting polarization relaxation operation by applying an electrostatic voltage having reverse polarity opposite to that of the electrostatic voltage applied in liquid ejection, wherein the nozzle is a flat nozzle and the control device.

Abstract: A liquid ejection head having: a nozzle for ejecting a liquid; a flat nozzle plate on which the nozzle is provided; a cavity to store the liquid to be ejected from an ejection hole of the nozzle; a pressure generating section which generates pressure on the liquid in the nozzle and forms a meniscus of the liquid in the ejection hole of the nozzle; an electrostatic voltage applying section which applies electrostatic voltage between a base material and the liquid in the nozzle and the cavity, and generates electrostatic suction force; and an operation control section which controls applying of the electrostatic voltage by the electrostatic voltage applying section, and controls applying of drive voltage to drive the pressure generating portion, wherein a volume resistivity of the nozzle plate is 1015 ?m or more.

Abstract: A color developer concentrate composition is disclosed, comprising a color developing agent, a sulfite and a compound represented by formula (1), the color developing agent concentration 0.02 to 0.2 mol/l and the sulfite concentration meeting the following requirement: 0.

Abstract: A concentrated color developer composition packed in a container which is comprised of material exhibiting an oxygen permeability of not more than 50 ml/(m2·day·atm), and the concentrated color developer composition comprising a hydroxyalkyl-substituted p-phenediamine type color developing agent of not less than 0.05 mol/l, a sulfite and a hydroxylamine salt. The processing method by use of the concentrated composition is also disclosed.

Abstract: A method for preparing a bleach-fixing processing solution for a silver halide color photographic light sensitive material, the method comprising the step of:

Abstract: A concentrated color developer composition packed in a container which is comprised of material exhibiting an oxygen permeability of not more than 50 ml/(m2·day·atm), and the concentrated color developer composition comprising a hydroxyalkyl-substituted p-phenediamine type color developing agent of not less than 0.05 mol/l, a sulfite and a hydroxylamine salt. The processing method by use of the concentrated composition is also disclosed.

Abstract: A color developer concentrate composition is disclosed, comprising a color developing agent, a sulfite and a compound represented by formula (1), the color developing agent concentration 0.02 to 0.

Abstract: An image recording apparatus having therein an image recording section includes: a light emitting dot row provided on a base plate and having thereon anodes arranged in a form of an array of a single row or a plurality of rows and having phosphors provided on the anodes; a cathode provided apart from the light emitting dot row, electrons emitted from the cathode colliding on the phosphors thereby the phosphors emit light; a grid which covers at least a part of the base plate in the vicinity of at least the light emitting dot row; an image focusing optical system having a focal depth of 350 .mu.m for focusing light emitted from the light emitting dot row on an image recording position; a driving element for driving the light emitting dot row so that the light emitting dot row emits light; and a conveyance device which conveys the light emitting dot row or an image recording medium so that the image recording medium moves relatively to the light emitting dot row.