Patents by Inventor Atsushi Akao

Atsushi Akao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220048862
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Application
    Filed: October 27, 2021
    Publication date: February 17, 2022
    Applicant: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Patent number: 11186547
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Grant
    Filed: September 16, 2020
    Date of Patent: November 30, 2021
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Publication number: 20200407322
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Application
    Filed: September 16, 2020
    Publication date: December 31, 2020
    Applicant: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Patent number: 10822307
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: November 3, 2020
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Publication number: 20190389804
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Application
    Filed: September 3, 2019
    Publication date: December 26, 2019
    Applicant: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Patent number: 10407393
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: September 10, 2019
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Publication number: 20190185432
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Application
    Filed: December 21, 2018
    Publication date: June 20, 2019
    Applicant: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Patent number: 10259791
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: April 16, 2019
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Publication number: 20170233344
    Abstract: Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
    Type: Application
    Filed: August 26, 2015
    Publication date: August 17, 2017
    Applicant: Eisai R&D Management Co., Ltd.
    Inventors: Taiju Nakamura, Taichi Abe, Yusuke Miyashita, Hirofumi Kuroda, Yusuke Ayata, Atsushi Akao
  • Patent number: 7683218
    Abstract: Disclosed is an efficient and widely-applicable method for commercially producing a thioether compound or a thiol compound which is useful as a pharmaceutical compound or a production intermediate of it. Specifically disclosed is a method for producing a thioether compound represented by the general formula [I] below or a salt thereof. This method is characterized in that a compound represented by the following general formula [III]: [III] (wherein X represents a bromine atom, a chlorine atom or a trifluoromethylsulfonyloxy group, and ring A represents an aryl group or a heteroaryl ring group) or a salt thereof is reacted with a thiol compound represented by the following general formula [II]: [II] or a salt thereof in the presence of a palladium compound such as Pd2(dba)3, a base such as i-Pr2NEt and a phosphorus compound represented by the following formula [AA].
    Type: Grant
    Filed: October 7, 2005
    Date of Patent: March 23, 2010
    Assignee: Banyu Pharmaceutical Co., Ltd.
    Inventors: Takahiro Itoh, Toshiaki Mase, Atsushi Akao
  • Publication number: 20090131664
    Abstract: This invention is related to a method for producing 3-{4-[3-(1-pyrrolidinyl)propoxy]phenyl}-5-trifluoromethyl-4(3H)-quinazolinone comprising a step for reacting 2-methyl-5-trifluoromethyl-4H-3,1-benzoxazin-4-one with 4-[3-(1-pyrrolidinyl)propoxy]aniline or an acid-addition salt thereof, or 4-(1-cyclobutyl-4-piperidinoy9oxyaniline or acid addition salt thereof in the presence of an acid catalyst.
    Type: Application
    Filed: July 4, 2006
    Publication date: May 21, 2009
    Inventors: Atsushi Akao, Takehiko Iida, Takahiro Itoh, Toshiaki Mase, Kimihiko Sato, Naotaka Sawada, Chie Kadowaki, Takayuki Tsuritani, Nobuyoshi Yasuda
  • Publication number: 20080108823
    Abstract: Disclosed is an efficient and widely-applicable method for commercially producing a thioether compound or a thiol compound which is useful as a pharmaceutical compound or a production intermediate of it. Specifically disclosed is a method for producing a thioether compound represented by the general formula [I] below or a salt thereof. This method is characterized in that a compound represented by the following general formula [III]:[III] (wherein X represents a bromine atom, a chlorine atom or a trifluoromethylsulfonyloxy group, and ring A represents an aryl group or a heteroaryl ring group) or a salt thereof is reacted with a thiol compound represented by the following general formula [II]:[II] or a salt thereof in the presence of a palladium compound such as Pd2(dba)3, a base such as i-Pr2NEt and a phosphorus compound represented by the following formula [AA].
    Type: Application
    Filed: October 7, 2005
    Publication date: May 8, 2008
    Inventors: Takahiro Itoh, Toshiaki Mase, Atsushi Akao
  • Publication number: 20060229264
    Abstract: The present invention relates to crystalline free base compound having the following formula: wherein R is an unsubstituted pyridyl methyl group or a pyridyl methyl group substituted by a hydroxy methyl group; or a pharmaceutically acceptable salt or a solvate thereof.
    Type: Application
    Filed: July 21, 2004
    Publication date: October 12, 2006
    Inventors: Hideaki Imamura, Satoshi Sunami, Atsushi Hirano, Mitsusu Ohkubo, Atsushi Akao
  • Publication number: 20050176968
    Abstract: The present invention provides a process for industrially advantageously producing a compound represented by the formula (I): or a pharmaceutically acceptable salt thereof, which is useful as an anticancer agent, and also provides a catalyst used for hydrogenation reaction in the process.
    Type: Application
    Filed: August 22, 2003
    Publication date: August 11, 2005
    Inventors: Atsushi Akao, Masashi Kawasaki, Asayuki Kamatani, Toshiaki Mase
  • Patent number: 6790836
    Abstract: A process for preparing indolopyrrolocarbazole derivatives [I] by trating a compound [V] with a base in an inert solvent to prepare a compound [IV], reacting the compound [IV] with a compound [III]to prepare a compound [II], and deblocking the compound [II]; intermediates [II], [III] and [IV]; and a process for preparing compounds [III]: [wherein Y1 is hydrogen, C1-4 alkyl, phenyl, benzyloxymethyl, or aralkyl; R1, R2, R3, R4, R5, and R6 are each independently a hydroxyl-protecting group; R7 and R8 are each independently hydrogen or a hydroxyl-protecting group; and X is an acid molecule]. The above process is a safe and easy industrial process for preparing indolopyrrolocarbazole derivatives [1] useful as antitumor agents.
    Type: Grant
    Filed: August 6, 2002
    Date of Patent: September 14, 2004
    Assignee: Banyu Pharmaceutical Co., Ltd.
    Inventors: Shouichi Hiraga, Masashi Kawasaki, Atsushi Akao, Asayuki Kamatani, Masayuki Hagiwara, Toshiaki Mase, Fumio Nakano
  • Publication number: 20030060621
    Abstract: This invention relates to a process for preparation of an indolopyrrolocarbazole derivative [I] by treating a compound [V] with a base in an inert solvent to prepare a compound [IV], reacting the obtained compound [IV] with a compound [III] to prepare a compound [II] and then removing the protective groups of the compound [II], the preparation intermediates compound [II], compound [III] and compound [IV], and processes for preparation of the compound [III].
    Type: Application
    Filed: August 6, 2002
    Publication date: March 27, 2003
    Inventors: Shouichi Hiraga, Masashi Kawasaki, Atsushi Akao, Asayuki Kamatani, Masayuki Hagiwara, Toshiaki Mase, Fumio Nakano