Abstract: In a liquid crystal display device, auxiliary lines are formed under pixel electrodes so as to be parallel to signal or scanning lines. The auxiliary lines are connected to the signal or scanning lines at one point for each pixel. This permits a voltage to be applied to a signal or scanning line if a disconnection defect occurs in the signal or scanning line. The auxiliary line is connected to the signal or scanning line at opposite sides of the defect to form a circuit around the defect. Moreover, if a leakage defect occurs at a crossing point between the scanning line and the signal line, the signal or scanning line may be cut off at both sides of the scanning or signal line, and the auxiliary line forms a circuit that avoids the line leak. Thus, a voltage may be applied to the signal or scanning line by the auxiliary line.

Abstract: A liquid crystal display device according to the present invention includes a first substrate, a second substrate, and a liquid crystal layer interposed between the first substrate and the second substrate. The first substrate includes: a plurality of gate lines; a plurality of source lines arranged to cross with the plurality of gate lines; a plurality of switching elements disposed in the vicinity of crossings of the plurality of gate lines and the plurality of source lines; and a plurality of pixel electrodes connected to the plurality of switching elements. The second substrate includes a counter electrode. A plurality of pixel regions are defined by the plurality of pixel electrodes, the counter electrode, and the liquid crystal layer interposed between the plurality of pixel electrodes and the counter electrode, and each of the plurality of pixel regions includes a reflection region and a transmission region.

Abstract: The invention provides a liquid crystal display device having a structure in which light reflection on lines can be suppressed and reduction in contrast of the liquid crystal display device can be prevented without providing a shielding film on a color filter of an opposite substrate portion. In the liquid crystal display device according to the invention, a shielding film is not provided in a color filter provided on a substrate on the opposite substrate portion side. A signal line is formed of a transparent conductive material such as ITO, amorphous ITO or the like. Consequently, light incident from the surface of the liquid crystal display device passes through the back face of the liquid crystal display device without causing surface reflection even if the light hits upon the signal line in an interval between pixel electrodes. Consequently, it is possible to prevent reduction in contrast caused by the light reflected on the signal line.

Abstract: An active matrix substrate includes base substrate, gate lines, data lines, thin-film transistors and pixel electrodes. The gate lines are formed on the base substrate. The data lines are formed over the gate lines. Each of the data lines crosses all of the gate lines with an insulating film interposed therebetween. The thin-film transistors are formed over the base substrate. Each of the thin-film transistors is associated with one of the gate lines and operates responsive to a signal on the associated gate line. Each of the pixel electrodes is associated with one of the data lines and one of the thin-film transistors and is electrically connectable to the associated data line by way of the associated thin-film transistor. Each of the pixel electrodes and the associated thin-film transistor are connected together by way of a conductive member.

Abstract: Pseudo-impulse display for reducing after-images during display of moving images in an active matrix type display apparatus. Liquid crystal capacitors are formed at intersections of signal lines and scanning lines to display images. Auxiliary capacitors are provided for keeping a potential difference across the liquid crystal capacitors during display. One of the two electrodes of the auxiliary capacitors is connected to a switching element together with a pixel electrode. After the liquid crystal capacitor and the auxiliary capacitor have been charged with a video signal on the signal lines while the switching element is selectively put into the conducting state with the scanning lines, and after a predetermined time has passed, an auxiliary capacitor driver applies a signal to the other electrode of the auxiliary capacitor, such that the display luminance due to the liquid crystal capacitor is reduced.

Abstract: In an active matrix type liquid crystal display apparatus, each of pixel electrodes has overhanging portions at its opposite side edges. These overhanging portions of the pixel electrode cover two signal lines placed on opposite sides of the pixel electrode, respectively.

Abstract: A liquid crystal display device includes a first substrate; a second substrate; a liquid crystal layer interposed between the first substrate and the second substrate; a first polarizer provided on a surface of the first substrate which is on the opposite side to the liquid crystal layer; a second polarizer provided on a surface of the second substrate which is on the opposite side to the liquid crystal layer; a first phase compensation element provided between the first polarizer and the liquid crystal layer; and a second phase compensation element provided between the second polarizer and the liquid crystal layer. A plurality of pixel areas are provided for display. The first substrate includes at least one transmissive electrode, and the second substrate includes a reflective electrode region and a transmissive electrode region in correspondence with each of the plurality of pixel areas.

Abstract: A liquid crystal display device includes a first substrate, a second substrate, and a liquid crystal layer interposed between the first and second substrates, a plurality of pixel regions being defined by respective pairs of electrodes for applying a voltage to the liquid crystal layer, wherein each of the plurality of pixel regions includes a reflection region and a transmission region, and the first substrate includes, a transmission electrode through which light from a light source passes within the transmission region, and a reflection electrode by which ambient light is reflected within the reflection region, wherein the transmission electrode and the reflection electrode are electrically connected to each other in an interface area between the transmission region and the reflection region.

Abstract: A liquid crystal display device includes a first substrate; a second substrate; a liquid crystal layer interposed between the first substrate and the second substrate; a first polarizer provided on a surface of the first substrate which is on the opposite side to the liquid crystal layer; a second polarizer provided on a surface of the second substrate which is on the opposite side to the liquid crystal layer; a first phase compensation element provided between the first polarizer and the liquid crystal layer; and a second phase compensation element provided between the second polarizer and the liquid crystal layer. A plurality of pixel areas are provided for display. The first substrate includes at least one transmissive electrode, and the second substrate includes a reflective electrode region and a transmissive electrode region in correspondence with each of the plurality of pixel areas.

Abstract: A liquid crystal display device according to the present invention includes a first substrate, a second substrate, and a liquid, crystal layer interposed between the first substrate and the second substrate. The first substrate includes: a plurality of gate lines; a plurality of source lines arranged to cross with the plurality of gate lines; a plurality of switching elements disposed in the vicinity of crossings of the plurality of gate lines and the plurality of source lines; and a plurality of pixel electrodes connected to the plurality of switching elements. The second substrate includes a counter electrode. A plurality of pixel regions are defined by the plurality of pixel electrodes, the counter electrode, and the liquid crystal layer interposed between the plurality of pixel electrodes and the counter electrode, and each of the plurality of pixel regions includes a reflection region and a transmission region.

Abstract: A thin-film transistor of the reversed stagger type is provided with a gate electrode, first and second gate insulating films, a semiconductor layer, separated contact layers, and source electrodes and drain electrodes, all of which are stacked on a substrate. Upon manufacturing the thin-film transistor of this type, a gap section is pattered in a single contact-material layer. In this case, the contact-material layer is patterned by a dry etching with etching gases including HCl+SF6 or CF4+O2+HCl by the use of the source electrode and drain electrode as direct masks. Upon patterning a gap section in the contact-material layer between the source electrode and the drain electrode, no dedicated resist pattern is required; therefore, it is possible to reduce the number of the processes as compared with conventional manufacturing methods. Consequently, it becomes possible to reduce the production cost of thin-film transistors and also to improve the yield of desired products.

Abstract: A liquid crystal display device according to the present invention includes a first substrate, a second substrate, and a liquid crystal layer interposed between the first substrate and the second substrate. The first substrate includes: a plurality of gate lines; a plurality of source lines arranged to cross with the plurality of gate lines; a plurality of switching elements disposed in the vicinity of crossings of the plurality of gate lines and the plurality of source lines; and a plurality of pixel electrodes connected to the plurality of switching elements. The second substrate includes a counter electrode. A plurality of pixel regions are defined by the plurality of pixel electrodes, the counter electrode, and the liquid crystal layer interposed between the plurality of pixel electrodes and the counter electrode, and each of the plurality of pixel regions includes a reflection region and a transmission region.

Abstract: A method for producing a substrate of a reflection type liquid crystal display device is provided. The method includes the steps of: forming the input portion for inputting a signal from outside and the connecting electrode on the substrate on which the reflective electrode is formed; forming a protective film on the connecting electrode; forming an interlayer insulator under the condition that the protective film on the connecting electrode is exposed; patterning the interlayer insulator; forming a reflective electrode film on the interlayer insulator; patterning the reflective electrode film to form the reflective electrode; and removing the protective film on the connecting electrode to expose the connecting electrode.

Abstract: Auxiliary lines are formed under pixel electrodes so as to be parallel to signal lines. The auxiliary lines are connected to the signal lines at one point for each pixel. This permits a voltage to be kept applying to a signal line even if a disconnection defect occurs in the signal line by making a circuit around a disconnected portion by the auxiliary line. Moreover, if a leakage defect occurs at a crossing point between the scanning line and the signal line, the signal line would be cut off on both sides of the scanning line. This also permits a voltage to be kept applying to the signal line by the auxiliary line. By setting the auxiliary lines narrower than the signal line, a reduction in aperture ratio can be suppressed, and by adopting the auxiliary lines made of a transparent electrically conductive material such as ITO, etc., it is possible to prevent the reduction in aperture ratio due to the auxiliary lines.

Abstract: In a method for selectively etching a second silicon layer of a multilayer structure which includes a first silicon layer and the second silicon layer formed on the first silicon layer and doped with impurities according to the present invention, the second silicon layer is selectively etched by using an etching gas including freon-14 gas and a gas selected from a group composed of hydrogen chloride gas and chloride gas.

Abstract: An active matrix substrate provided with a dielectric substrate, on which a gate wire multi-short-circuit group composed of gate wire multi-short-circuit wires and a data wire multi-short-circuit group composed of gate wire multi-short-circuit wires are formed at either ends of the gate wires and data wires, respectively. The gate wires and gate wire multi-short-circuit wires are connected in such a manner that adjacent gate wires are short-circuited with different gate wire multi-short-circuit wires. It has become possible with the present active matrix substrate to conduct electrical inspections such that can detect leakage defects among the gate wires and those among the data wires, correct the revealed defects, and confirm the corrections easier at a low cost. Moreover, the present active matrix substrate can prevent static electricity in a sufficient manner.

Abstract: The active matrix display device of this invention includes: a substrate and a scanning line running in a first direction formed in a first layer located above the substrate. The display device also includes a signal line running in a second direction formed in a second layer located above the substrate; a switching element connected with the scanning line and the signal line; an insulating film formed above the scanning line, the signal line, and the switching element; and a pixel electrode formed above the insulating film so as to connect with the switching element, wherein the active matrix display device further comprises an extension line connected with an electrode of the switching element, the extension line being formed in the second layer so as not to intersect the signal line.

Abstract: An active matrix substrate includes a gate line, a source line, and a thin film transistor provided in the vicinity of an intersection between the gate line and the source line. The thin film transistor includes a gate electrode connected to the gate line, a source electrode connected to the source line, and a drain electrode connected to a pixel electrode. An interlayer insulating film is provided over the thin film transistor, the gate line, and the source line. The pixel electrode is provided on the interlayer insulating film, and is connected to the drain electrode via a contact hole formed in the interlayer insulating film. A conductive layer extends over a channel region of the thin film transistor via the interlayer insulating film.

Abstract: An active matrix substrate of a Pixel on Passivation structure includes TFTs and pixel electrodes on an interlayer insulating film over bus lines. The interlayer insulating film is formed of an organic insulating film, and the contact layer of the TFT has a double layer structure of a fine crystal silicon (n.sup.+) layer and an amorphous silicon (n.sup.+) layer the crystal silicon (n.sup.+) layer being placed on the side closer to the source electrode and the drain electrode, and the amorphous silicon (n.sup.+) layer being placed on the opposite side. This improves both the ON characteristics and the OFF characteristics of the TFT are improved, and the stable operative region of the active matrix substrate and the margin to accommodate to variations in threshold value due to aging are expanded, without substantial additional production costs and a decrease in productivity.

Abstract: A thin-film transistor of the reversed stagger type is provided with a gate electrode, first and second gate insulating films, a semiconductor layer, separated contact layers, and source electrodes and drain electrodes, all of which are stacked on a substrate. Upon manufacturing the thin-film transistor of this type, a gap section is pattered in a single contact-material layer. In this case, the contact-material layer is patterned by carrying out etching by the use of the source electrode and drain electrode as direct masks or by the use of a resist pattern that was used for forming the respective electrodes. Upon patterning a gap section in the contact-material layer between the source electrode and the drain electrode, no dedicated resist pattern is required; therefore, it is possible to reduce the number of the processes as compared with conventional manufacturing methods.