Patents by Inventor Atsushi Gorai

Atsushi Gorai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering target and producing method thereof
    Patent number: 11591687
    Abstract: An object of the present invention is to provide a sputtering target that can suppress a generation amount of fine nodules which lead to an increase in substrate particles during sputtering, and a method for producing the same. A ceramic sputtering target, the sputtering target having a surface roughness Ra on a sputtering surface of 0.5 ?m or less and an Svk value measured with a laser microscope on the sputtering surface of 1.1 ?m or less.
    Type: Grant
    Filed: January 14, 2020
    Date of Patent: February 28, 2023
    Assignee: JX Nippon Mining & Metals Corporation
    Inventors: Tomoji Mizuguchi, Hidetoshi Sasaoka, Haruhi Nakamura, Atsushi Gorai
  • Sputtering Target And Producing Method Thereof
    Publication number: 20200283888
    Abstract: An object of the present invention is to provide a sputtering target that can suppress a generation amount of fine nodules which lead to an increase in substrate particles during sputtering, and a method for producing the same. A ceramic sputtering target, the sputtering target having a surface roughness Ra on a sputtering surface of 0.5 ?m or less and an Svk value measured with a laser microscope on the sputtering surface of 1.1 ?m or less.
    Type: Application
    Filed: January 14, 2020
    Publication date: September 10, 2020
    Inventors: Tomoji Mizuguchi, Hidetoshi Sasaoka, Haruhi Nakamura, Atsushi Gorai