Patents by Inventor Atsushi Hirokawa

Atsushi Hirokawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10877102
    Abstract: A voltage detection device is provided which includes: a plurality of wires that are connected to a plurality of battery cells of a battery; a voltage detection circuit that operates with supply of electric power from the battery and detects voltages of the plurality of battery cells via the plurality of wires; an overvoltage protection circuit that electrically connects one or more wires of the plurality of wires to a minus terminal of the battery when the voltage of the one or more wires is higher than a predetermined threshold value; and a breaker circuit that irreversibly breaks electrical connection between the minus terminal and the voltage detection circuit using a current flowing from the one or more wires to the minus terminal.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: December 29, 2020
    Assignee: KEIHIN CORPORATION
    Inventors: Shingo Tsuchiya, Seiji Kamata, Atsushi Hirokawa, Seigo Imai
  • Publication number: 20190293725
    Abstract: A voltage detection device is provided which includes: a plurality of wires that are connected to a plurality of battery cells of a battery; a voltage detection circuit that operates with supply of electric power from the battery and detects voltages of the plurality of battery cells via the plurality of wires; an overvoltage protection circuit that electrically connects one or more wires of the plurality of wires to a minus terminal of the battery when the voltage of the one or more wires is higher than a predetermined threshold value; and a breaker circuit that irreversibly breaks electrical connection between the minus terminal and the voltage detection circuit using a current flowing from the one or more wires to the minus terminal.
    Type: Application
    Filed: February 14, 2019
    Publication date: September 26, 2019
    Inventors: Shingo TSUCHIYA, Seiji KAMATA, Atsushi HIROKAWA, Seigo IMAI
  • Patent number: 9828766
    Abstract: A construction block and a wall face structure with high durability and versatility are provided. The construction block including: a front face wall and a rear face wall being parallel to each other; a top face wall with a horizontal groove formed for inserting a horizontal reinforcement; side face walls formed with at least one vertical groove for inserting a vertical reinforcement; at least one vertical hole formed between both of the side face walls and closed off by the top face wall and opened at a bottom face; a plurality of protrusions formed on the bottom face in a shape to engage with the horizontal groove; and recessed slits respectively formed in vertical direction on each side face of the front face wall and the rear face wall, is used.
    Type: Grant
    Filed: July 1, 2015
    Date of Patent: November 28, 2017
    Assignee: IIDA GROUP HOLDINGS CO., LTD.
    Inventors: Kazuhiko Mori, Yoichi Nishikawa, Ayumu Watanabe, Masahiro Kikuchi, Yusuke Minagawa, Atsushi Hirokawa
  • Publication number: 20170145687
    Abstract: A construction block and a wall face structure with high durability and versatility are provided. The construction block including: a front face wall and a rear face wall being parallel to each other; a top face wall with a horizontal groove formed for inserting a horizontal reinforcement; side face walls formed with at least one vertical groove for inserting a vertical reinforcement; at least one vertical hole formed between both of the side face walls and closed off by the top face wall and opened at a bottom face; a plurality of protrusions formed on the bottom face in a shape to engage with the horizontal groove; and recessed slits respectively formed in vertical direction on each side face of the front face wall and the rear face wall, is used.
    Type: Application
    Filed: July 1, 2015
    Publication date: May 25, 2017
    Applicant: IIDA GROUP HOLDINGS CO., LTD.
    Inventors: Kazuhiko MORI, Yoichi NISHIKAWA, Ayumu WATANABE, Masahiro KIKUCHI, Yusuke MINAGAWA, Atsushi HIROKAWA
  • Patent number: 5637445
    Abstract: A base film having dimensional stability and high transparency, which comprises (A) a plastic film having on either one or both sides thereof (B) a thin film layer comprising (1) an oxide of silicon and (2) a fluoride of alkaline earth metal, or comprising (1) an oxide of silicon, (2) a fluoride of alkaline earth metal, and (3) an oxide of magnesium, the thin film layer (B) being formed by a vacuum film forming process. A photographic light-sensitive material comprising the base film having dimensional stability and high transparency, having on either one or both sides thereof (C) a photographic layer.
    Type: Grant
    Filed: November 21, 1995
    Date of Patent: June 10, 1997
    Assignee: Toyo Ink Manufacturing Co., Ltd.
    Inventors: Toshinori Machida, Atsushi Hirokawa, Fusao Ito
  • Patent number: 5496690
    Abstract: A base film having dimensional stability and high transparency, which comprises (A) a plastic film having on either one or both sides thereof (B) a thin film layer comprising (1) an oxide of silicon and (2) a fluoride of alkaline earth metal, or comprising (1) an oxide of silicon, (2) a fluoride of alkaline earth metal, and (3) an oxide of magnesium, the thin film layer (B) being formed by a vacuum film forming process. A photographic light-sensitive material comprising the base film having dimensional stability and high transparency, having on either one or both sides thereof (C) a photographic layer.
    Type: Grant
    Filed: April 28, 1994
    Date of Patent: March 5, 1996
    Assignee: Toyo Ink Manufacturing Co., Ltd.
    Inventors: Toshinori Machida, Atsushi Hirokawa, Fusao Ito
  • Patent number: 5230923
    Abstract: A process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a traveling flexible plastic film. The process comprises evaporating a deposition material composed mainly of silicon and silicon oxide or silicon oxide alonem by heating to continuously form a deposition layer composed mainly of silicon oxide and having a thickness of from 100 to 3,000 .ANG. on the surface(s) of a travelling flexible plastic film, wherein a material shaped from the above deposition material is evaporated by heating while the material is supplied to a heat evaporating portion substantially continuously, and an evaporation residue is discharged from the heat evaporating portion substantially continuously.
    Type: Grant
    Filed: October 9, 1991
    Date of Patent: July 27, 1993
    Assignee: Toyo Ink Manufacturing Co., Ltd.
    Inventors: Atsushi Hirokawa, Kunihiko Ozaki
  • Patent number: 5107791
    Abstract: An apparatus for use in a process for the substantially continuous manufacture of a silicon oxide deposition film by evaporating a deposition material composed mainly of a combination of silicon and silicon oxide or silicon oxide alone by heating the material to continuously form a deposition layer composed mainly of silicon oxide and having a thickness of from 100 to 3,000 .ANG. on the surface of a travelling flexible plastic film.
    Type: Grant
    Filed: May 22, 1990
    Date of Patent: April 28, 1992
    Assignee: Toyo Ink Manufacturing Co., Ltd.
    Inventors: Atsushi Hirokawa, Kunihiko Ozaki
  • Patent number: 4772348
    Abstract: The disclosed laminate includes a layer of a saponified copolymer of ethylene and vinyl acetate thermally bonded directly (without use of an adhesive) to a layer of thermoplastic with a high interlayer adhesive strength therebetween. The laminate is produced by pretreating the surface of the thermoplastic layer to be bonded with a low temperature plasma and then thermally bonding the two layers together.
    Type: Grant
    Filed: July 20, 1987
    Date of Patent: September 20, 1988
    Assignee: Toyo Ink Mfg. Co.
    Inventors: Atsushi Hirokawa, Keisuke Kaiho