Patents by Inventor Atsushi Igari

Atsushi Igari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11850665
    Abstract: Provided is a nickel powder in which growth of the nickel hydroxide component into a plate-shaped crystal is suppressed in the oxide film, and the content of coarse particles containing plate-shaped nickel hydroxide is small, and provided is a method for manufacturing the nickel powder by a wet process in which the nickel powder can be produced further simply and easily. A nickel powder including: particles having a substantially spherical shape and a number average size of 0.03 ?m to 0.4 ?m; and an oxide film, on the particle surface, containing a basic salt of nickel hydroxide, wherein the content of coarse particles having a particle size of more than 0.8 ?m is 200 mass ppm or less, and the content of coarse particles having a particle size of more than 1.2 ?m is 100 mass ppm or less.
    Type: Grant
    Filed: July 30, 2020
    Date of Patent: December 26, 2023
    Assignee: SUMITOMO METAL MINING CO., LTD.
    Inventors: Yuki Kumagai, Atsushi Igari, Minseob Shin, Shingo Suto, Masaya Yukinobu
  • Publication number: 20220250144
    Abstract: Provided is a nickel powder in which growth of the nickel hydroxide component into a plate-shaped crystal is suppressed in the oxide film, and the content of coarse particles containing plate-shaped nickel hydroxide is small, and provided is a method for manufacturing the nickel powder by a wet process in which the nickel powder can be produced further simply and easily. A nickel powder including: particles having a substantially spherical shape and a number average size of 0.03 ?m to 0.4 ?m; and an oxide film, on the particle surface, containing a basic salt of nickel hydroxide, wherein the content of coarse particles having a particle size of more than 0.8 ?m is 200 mass ppm or less, and the content of coarse particles having a particle size of more than 1.2 ?m is 100 mass ppm or less.
    Type: Application
    Filed: July 30, 2020
    Publication date: August 11, 2022
    Applicant: SUMITOMO METAL MINING CO., LTD.
    Inventors: Yuki Kumagai, Atsushi Igari, Minseob Shin, Shingo Suto, Masaya Yukinobu
  • Patent number: 8864350
    Abstract: The present invention is provided with a first lamp unit 4 and a second lamp unit 5. The first lamp unit 4 is provided with a semiconductor-type light source 14, a reflector 15, a shade 16, and a driving mechanism 17. The reflector 15 has a first reflection surface 21 and a second reflection surface 22. The first reflection surface 21 is adapted to emit lateral light distribution patterns CPL and CPR. The second reflection surface 22 is adapted to emit a light distribution pattern HP for high beam. As a result, according to the present invention, it becomes possible to obtain an arbitrary auxiliary light distribution pattern, such as a light distortion pattern for spot or a light distribution pattern for scattering other than the lateral light distribution patterns CPL and CPR.
    Type: Grant
    Filed: July 19, 2012
    Date of Patent: October 21, 2014
    Assignee: Ichikoh Industries, Ltd.
    Inventors: Yasuhiro Okubo, Toshiya Abe, Kei Onoma, Atsushi Igari
  • Publication number: 20130027957
    Abstract: The present invention is provided with a first lamp unit 4 and a second lamp unit 5. The first lamp unit 4 is provided with a semiconductor-type light source 14, a reflector 15, a shade 16, and a driving mechanism 17. The reflector 15 has a first reflection surface 21 and a second reflection surface 22. The first reflection surface 21 is adapted to emit lateral light distribution patterns CPL and CPR. The second reflection surface 22 is adapted to emit a light distribution pattern HP for high beam. As a result, according to the present invention, it becomes possible to obtain an arbitrary auxiliary light distribution pattern, such as a light distortion pattern for spot or a light distribution pattern for scattering other than the lateral light distribution patterns CPL and CPR.
    Type: Application
    Filed: July 19, 2012
    Publication date: January 31, 2013
    Inventors: Yasuhiro OKUBO, Toshiya Abe, Kei Onoma, Atsushi Igari