Patents by Inventor Atsushi Itakura

Atsushi Itakura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7692187
    Abstract: The present invention encompasses an organic field-effect transistor comprising an n-type organic semiconductor formed of a fullerene derivative having a fluorinated alkyl group which is expressed by the following chemical formula (wherein at least any one of R1, R2 and R3 is a perfluoro alkyl group or a partially-fluorinated semifluoro alkyl group each having a carbon number of 1 to 20), and a field-effect transistor production method comprising forming an organic semiconductor layer using the fullerene derivative by a solution process, and subjecting the organic semiconductor layer to a heat treatment in an atmosphere containing nitrogen or argon or in vacuum to provide enhanced characteristics to the organic semiconductor layer. The present invention makes it possible to form an organic semiconductor layer by a solution process and provide an organic field-effect transistor excellent in electron mobility and on-off ratio and capable of operating even in an ambient air atmosphere.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: April 6, 2010
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventors: Masayuki Chikamatsu, Atsushi Itakura, Tatsumi Kimura, Satoru Shimada, Yuji Yoshida, Reiko Azumi, Kiyoshi Yase
  • Publication number: 20070215872
    Abstract: The present invention encompasses an organic field-effect transistor comprising an n-type organic semiconductor formed of a fullerene derivative having a fluorinated alkyl group which is expressed by the following chemical formula (wherein at least any one of R1, R2 and R3 is a perfluoro alkyl group or a partially-fluorinated semifluoro alkyl group each having a carbon number of 1 to 20), and a field-effect transistor production method comprising forming an organic semiconductor layer using the fullerene derivative by a solution process, and subjecting the organic semiconductor layer to a heat treatment in an atmosphere containing nitrogen or argon or in vacuum to provide enhanced characteristics to the organic semiconductor layer. The present invention makes it possible to form an organic semiconductor layer by a solution process and provide an organic field-effect transistor excellent in electron mobility and on-off ratio and capable of operating even in an ambient air atmosphere.
    Type: Application
    Filed: March 20, 2007
    Publication date: September 20, 2007
    Inventors: Masayuki Chikamatsu, Atsushi Itakura, Tatsumi Kimura, Satoru Shimada, Yuji Yoshida, Reiko Azumi, Kiyoshi Yase
  • Patent number: D477288
    Type: Grant
    Filed: October 25, 2001
    Date of Patent: July 15, 2003
    Assignee: Koyo Electronics Industries Co., LTD
    Inventors: Toshiki Natsui, Atsushi Itakura, Kouichi Uchimura