Patents by Inventor Atsushi Kobaru

Atsushi Kobaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10840070
    Abstract: An ion beam device according to the present invention suppresses the fluctuation of an ion emission current by cleaning the inside of a chamber without entailing wear damage to an emitter electrode. The ion beam device includes a GFIS including an emitter electrode having a needle-shaped tip; an extraction electrode having an opening at a position spaced apart from the tip of the emitter electrode; and a chamber encapsulating the emitter electrode therein. The GFIS includes an ionizable gas introduction path for introducing an ionizable gas into the chamber in a state where a voltage equal to or more than a beam generating voltage is applied to the emitter electrode; and a cleaning gas introduction path for introducing a cleaning gas into the chamber in either a state where a voltage less than the beam generating voltage is applied to the emitter electrode or a state where no voltage is applied to the emitter electrode.
    Type: Grant
    Filed: August 20, 2015
    Date of Patent: November 17, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Yoshimi Kawanami, Atsushi Kobaru, Tomihiro Hashizume, Hiroyasu Shichi, Shinichi Matsubara
  • Publication number: 20200294776
    Abstract: An ion beam device according to the present invention suppresses the fluctuation of an ion emission current by cleaning the inside of a chamber without entailing wear damage to an emitter electrode. The ion beam device includes a GFIS including an emitter electrode having a needle-shaped tip; an extraction electrode having an opening at a position spaced apart from the tip of the emitter electrode; and a chamber encapsulating the emitter electrode therein. The GFIS includes an ionizable gas introduction path for introducing an ionizable gas into the chamber in a state where a voltage equal to or more than a beam generating voltage is applied to the emitter electrode; and a cleaning gas introduction path for introducing a cleaning gas into the chamber in either a state where a voltage less than the beam generating voltage is applied to the emitter electrode or a state where no voltage is applied to the emitter electrode.
    Type: Application
    Filed: August 20, 2015
    Publication date: September 17, 2020
    Inventors: Yoshimi KAWANAMI, Atsushi KOBARU, Tomihiro HASHIZUME, Hiroyasu SHICHI, Shinichi MATSUBARA
  • Patent number: 8362426
    Abstract: The SEM has a dynamic range reference value setting unit for setting dynamic range reference values, a dynamic range adjustment unit for receiving an observation image signal delivered out of a secondary electron detector, adjusting the dynamic range of the observation image signal on the basis of the dynamic range reference values and outputting the thus adjusted observation image signal as an observation image signal after adjustment, a display image generation unit for determining luminous intensity levels of individual pixels of an image to be displayed based on the observation image signal after adjustment to generate a display image, a histogram generation unit for generating a histogram of luminous intensity levels of the display image and extracting, as a luminous intensity peak value, at which the frequency of luminous intensity is maximized, and a display unit for displaying the generated histogram and the extracted luminous intensity peak value.
    Type: Grant
    Filed: September 14, 2006
    Date of Patent: January 29, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Kobaru, Katsuhiro Sasada, Hiroki Kawada
  • Patent number: 8335397
    Abstract: In a method and apparatus for removing artifacts from an image generated a charged partial beam scanning device, a scanning method is determined, and the frequency of an artifact appearing on an image can then be determined, based on scanning method. A step 703, a frequency domain for removing an artifact can be determined from the vertical and horizontal widths determined by experimentation in advance with respect to the frequency position Photography is performed to obtain an image, which is Fourier transformed and the determined frequency domain is replaced, for example, by “0.” The resulting image is subjected to inverse Fourier transformation, and displayed and stored. The flow of such processing enables decreasing an artifact appearing on an image, depending on a scanning method.
    Type: Grant
    Filed: May 21, 2008
    Date of Patent: December 18, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Takane, Mitsuji Ikeda, Atsushi Kobaru
  • Patent number: 8274048
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Grant
    Filed: June 25, 2010
    Date of Patent: September 25, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideyuki Kazumi, Koichiro Takeuchi, Atsushi Kobaru, Seiko Oomori
  • Patent number: 8203504
    Abstract: An image forming method and a charged particle beam apparatus suitable for suppressing the inclination of charging when scanning a two-dimensional area with a charged particle beam. A third scanning line located between a first scanning line and a second scanning line is scanned. After the first, second and third scanning lines have been scanned, a plurality of scanning lines are scanned between the first and third scanning lines and between the second and third scanning lines.
    Type: Grant
    Filed: October 19, 2010
    Date of Patent: June 19, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Kobaru, Hidetoshi Morokuma, Hiroki Kawada, Sho Takami, Katsuhiro Sasada, Kouichi Yamamoto, Norio Satou, Kunio Nakanishi
  • Patent number: 8000939
    Abstract: An object of the present invention is to provide a synthesized signal forming method and an apparatus thereof for realizing both noise reduction and dosage reduction when synthesizing signals detected based on scans performed on a charged particle beam. In order to achieve the above object, with a method that synthesizes signals detected based on a plurality of scans performed on a charged particle beam to form a synthesized signal, a multiplication is performed among a plurality of signals obtained by the plurality of scans and, at the same time, for a multiplied signal, a calculation is performed in which an inverse of the number of previous scans is used as an exponent.
    Type: Grant
    Filed: January 29, 2008
    Date of Patent: August 16, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventor: Atsushi Kobaru
  • Publication number: 20110032176
    Abstract: An image forming method and a charged particle beam apparatus suitable for suppressing the inclination of charging when scanning a two-dimensional area with a charged particle beam. A third scanning line located between a first scanning line and a second scanning line is scanned. After the first, second and third scanning lines have been scanned, a plurality of scanning lines are scanned between the first and third scanning lines and between the second and third scanning lines.
    Type: Application
    Filed: October 19, 2010
    Publication date: February 10, 2011
    Inventors: Atsushi KOBARU, Hidetoshi Morokuma, Hiroki Kawada, Sho Takami, Katsuhiro Sasada, Kouichi Yamamoto, Norio Satou, Kunio Nakanishi
  • Patent number: 7838840
    Abstract: A charged particle beam apparatus for measuring and inspecting a sample having some parts in focus and other parts out of focus in an image due to the effect of the roughness of the sample surface is disclosed, in which in order to acquire a clear image of the whole or a predetermined area in the image, the focus adjustment conditions for each point in the area to be scanned by the charged particle beam are determined in advance, and the focus adjustment conditions thus determined are applied selectively to the patterns formed under the same fabrication conditions as the sample for which the focus adjustment conditions are determined.
    Type: Grant
    Filed: June 27, 2008
    Date of Patent: November 23, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventor: Atsushi Kobaru
  • Patent number: 7817105
    Abstract: An image forming method and a charged particle beam apparatus suitable for suppressing the inclination of charging when scanning a two-dimensional area with a charged particle beam. A third scanning line located between a first scanning line and a second scanning line is scanned. After the first, second and third scanning lines have been scanned, a plurality of scanning lines are scanned between the first and third scanning lines and between the second and third scanning lines.
    Type: Grant
    Filed: March 5, 2007
    Date of Patent: October 19, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Kobaru, Hidetoshi Morokuma, Hiroki Kawada, Sho Takami, Katsuhiro Sasada, Kouichi Yamamoto, Norio Satou, Kunio Nakanishi
  • Publication number: 20100258723
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Application
    Filed: June 25, 2010
    Publication date: October 14, 2010
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Akira IKEGAMI, Hideyuki KAZUMI, Koichiro TAKEUCHI, Atsushi KOBARU, Seiko OOMORI
  • Patent number: 7763852
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: July 27, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideyuki Kazumi, Koichiro Takeuchi, Atsushi Kobaru, Seiko Oomori
  • Publication number: 20090194692
    Abstract: A magnetic shield with which a high magnetic field suppression effect is realized in a restricted space and a charged particle radiation apparatus using the magnetic shield are described below. To achieve the above-described object, a scanning electron microscope wherein a shield for shielding against an external magnetic field is formed of a plurality of plate portions made of a magnetic material, the plate portions being disposed on the circumference of a circle whose center corresponds to a center of the space so that each plate portion has a surface direction set different from a line tangent to the circle, is proposed (see FIG. 1).
    Type: Application
    Filed: January 29, 2009
    Publication date: August 6, 2009
    Inventor: Atsushi KOBARU
  • Publication number: 20090001279
    Abstract: A charged particle beam apparatus for measuring and inspecting a sample having some parts in focus and other parts out of focus in an image due to the effect of the roughness of the sample surface is disclosed, in which in order to acquire a clear image of the whole or a predetermined area in the image, the focus adjustment conditions for each point in the area to be scanned by the charged particle beam are determined in advance, and the focus adjustment conditions thus determined are applied selectively to the patterns formed under the same fabrication conditions as the sample for which the focus adjustment conditions are determined.
    Type: Application
    Filed: June 27, 2008
    Publication date: January 1, 2009
    Inventor: Atsushi KOBARU
  • Publication number: 20080292199
    Abstract: In step 701, the scanning method is determined. In step 702, according to the scanning method determined in step 701, the frequency of an artifact appearing on an image can be determined based on the relation depicted with reference to FIG. 5. In step 703, a frequency domain for removing an artifact is determined from the vertical and horizontal widths determined by such as experimental in advance with respect to the frequency position of step 702. In steps 704 and 705, photography is performed to obtain an image. An image obtained is Fourier transformed in step 706 and the frequency domain determined in step 703 is replaced, for example, by “0.” Its image is subjected to inverse Fourier transformation in step 708, and then displayed and stored in step 709. The flow of such processing enables decreasing an artifact appearing on an image, depending on a scanning method.
    Type: Application
    Filed: May 21, 2008
    Publication date: November 27, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Atsushi Takane, Mitsuji Ikeda, Atsushi Kobaru
  • Publication number: 20080215260
    Abstract: An object of the present invention is to provide a synthesized signal forming method and an apparatus thereof for realizing both noise reduction and dosage reduction when synthesizing signals detected based on scans performed on a charged particle beam. In order to achieve the above object, with a method that synthesizes signals detected based on a plurality of scans performed on a charged particle beam to form a synthesized signal, a multiplication is performed among a plurality of signals obtained by the plurality of scans and, at the same time, for a multiplied signal, a calculation is performed in which an inverse of the number of previous scans is used as an exponent.
    Type: Application
    Filed: January 29, 2008
    Publication date: September 4, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventor: Atsushi KOBARU
  • Publication number: 20080116375
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Application
    Filed: November 7, 2007
    Publication date: May 22, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideyuki Kazumi, Koichiro Takeuchi, Atsushi Kobaru, Seiko Oomori
  • Patent number: 7288763
    Abstract: A scanning method for a scanning electron microscope is provided which minimizes a degradation in dimension measuring accuracy caused by a shrink of a specimen. A time between the first and the second scan over the same location on the specimen is shortened by changing the scanning order of scan lines to enable the scanning to be performed successively while the shrink is small.
    Type: Grant
    Filed: April 18, 2006
    Date of Patent: October 30, 2007
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Ikeda, Hiroki Kawada, Atsushi Kobaru
  • Publication number: 20070200947
    Abstract: A focus adjustment method and a focus adjustment apparatus suited to realize both higher precision and faster speed of focus adjustment are provided. More specifically, the focus adjustment method and apparatus of this invention determine a focus adjustment quantity based on a relation between a change in a focus position value and a change in a focus evaluation value or a relation between the focus position value and the focus evaluation value, namely, a gradient of the focus evaluation value in a focus position direction. As one example, an excitation current to be supplied to an objective lens (or a voltage to be applied to a specimen) is calculated based on the relation between a change in the excitation current (or voltage applied to the specimen) and a change in the focus evaluation value.
    Type: Application
    Filed: January 29, 2007
    Publication date: August 30, 2007
    Inventors: Atsushi Kobaru, Hiroki Kawada
  • Publication number: 20070159662
    Abstract: An image forming method and a charged particle beam apparatus suitable for suppressing the inclination of charging when scanning a two-dimensional area with a charged particle beam. A third scanning line located between a first scanning line and a second scanning line is scanned. After the first, second and third scanning lines have been scanned, a plurality of scanning lines are scanned between the first and third scanning lines and between the second and third scanning lines.
    Type: Application
    Filed: March 5, 2007
    Publication date: July 12, 2007
    Inventors: Atsushi Kobaru, Hidetoshi Morokuma, Hiroki Kawada, Sho Takami, Katsuhiro Sasada, Kouichi Yamamoto, Norio Satou, Kunio Nakanishi