Patents by Inventor Atsushi Mukai
Atsushi Mukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11825859Abstract: A coffee extract with increased coffee-specific aroma and reduced off-flavors is provided. The ratio of (A) the peak area ratio of 2,3-butanedione to (B) the sum of the peak area ratio of guaiacol and the peak area ratio of 4-ethylguaiacol [(A)/(B)] in the coffee extract is adjusted to a specific range. Alternatively, the ratio of (a) the concentration (ppb) of 2,3-butanedione to (b) the total concentration (ppb) of guaiacol and 4-ethylguaiacol [(a)/(b)] in the coffee extract is adjusted to a specific range.Type: GrantFiled: December 25, 2019Date of Patent: November 28, 2023Assignee: SUNTORY HOLDINGS LIMITEDInventors: Toshihiro Nishiumi, Nao Kamezawa, Atsushi Mukai, Takashi Mukai
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Patent number: 11805786Abstract: A method for producing a coffee extract with increased coffee-specific aroma and reduced off-flavors is provided. A coffee extract prepared by extraction at low temperature (70 to 120° C.) in the first extraction step is mixed with a coffee extract prepared by an evaporative concentration treatment after the second extraction step, in which roasted and ground coffee beans used in the first extraction step is used for extraction at high temperature (125 to 150° C.).Type: GrantFiled: June 4, 2019Date of Patent: November 7, 2023Assignee: SUNTORY HOLDINGS LIMITEDInventors: Toshihiro Nishiumi, Nao Kamezawa, Atsushi Mukai, Takashi Mukai
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Publication number: 20220322726Abstract: In order to solve a conventional problem that it is difficult to reproduce a taste, a flavor, and the like of food, a food manufacturing support apparatus includes: an ingredient information storage unit in which two or more pieces of ingredient information are stored, the ingredient information each having one or more pieces of feature value specifying information for specifying an amount of each of one or more feature values contained in an ingredient of food, and an ingredient identifier for specifying the ingredient; a feature value recipe identifier information accepting unit that accepts feature value recipe identifier information for specifying two or more pieces of feature value specifying information respectively associated with two or more feature values; a determining unit that determines two or more ingredients and amounts of the ingredients that satisfy two or more pieces of feature value specifying information of the two or more feature values specified with the feature value recipe identifier iType: ApplicationFiled: July 10, 2020Publication date: October 13, 2022Applicant: SUNTORY HOLDINGS LIMITEDInventor: Atsushi Mukai
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Patent number: 11376547Abstract: A process for separating a feed gas comprising a polar gas and a non-polar gas into a permeate gas and a retentate gas, one of which is enriched in the polar gas and the other of which is depleted in the polar gas, the process comprising passing the feed gas through a gas separation module comprising: (i) a feed carrier comprising a membrane envelope and a feed spacer located within the membrane envelope; and (ii) a permeate carrier comprising: (a) a macroporous sheet; and (b) a protective sheet; and wherein: i) the feed gas is fed along the feed spacer of the feed carrier and a part of the feed gas passes through the membrane envelope and into the permeate carrier to give the permeate gas and a part of the feed gas is rejected by the membrane to give the retentate gas; ii) the protective sheet shields at least a part of the membrane envelope from contact with the macroporous sheet; and iii) the protective sheet comprises a non-woven material.Type: GrantFiled: July 5, 2018Date of Patent: July 5, 2022Assignees: Fujifilm Manufacturing Europe B.V., Fujifilm CorporationInventors: Atsushi Mukai, Anton Van Der Pluijm, Nori Miyagishima, Kazuomi Inoue, Davide Bocciardo, Yujiro Itami
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Publication number: 20220030903Abstract: A method for producing a coffee extract with increased coffee-specific aroma and reduced off-flavors is provided. A coffee extract prepared by extraction at low temperature (70 to 120° C.) in the first extraction step is mixed with a coffee extract prepared by an evaporative concentration treatment after the second extraction step, in which roasted and ground coffee beans used in the first extraction step is used for extraction at high temperature (125 to 150° C.).Type: ApplicationFiled: June 4, 2019Publication date: February 3, 2022Applicant: SUNTORY HOLDINGS LIMITEDInventors: Toshihiro Nishiumi, Nao Kamezawa, Atsushi Mukai, Takashi Mukai
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Publication number: 20210337822Abstract: A coffee extract with increased coffee-specific aroma and reduced off-flavors is provided. The ratio of (A) the peak area ratio of 2,3-butanedione to (B) the sum of the peak area ratio of guaiacol and the peak area ratio of 4-ethylguaiacol [(A)/(B)] in the coffee extract is adjusted to a specific range. Alternatively, the ratio of (a) the concentration (ppb) of 2,3-butanedione to (b) the total concentration (ppb) of guaiacol and 4-ethylguaiacol [(a)/(b)] in the coffee extract is adjusted to a specific range.Type: ApplicationFiled: December 25, 2019Publication date: November 4, 2021Applicant: SUNTORY HOLDINGS LIMITEDInventors: Toshihiro Nishiumi, Nao Kamezawa, Atsushi Mukai, Takashi Mukai
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Patent number: 11071953Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.63??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: GrantFiled: June 14, 2019Date of Patent: July 27, 2021Assignee: FUJIFILM CorporationInventors: Yusuke Mochizuki, Makoto Sawada, Takeshi Narita, Shigehide Itou, Hiroyuki Noda, Atsushi Mukai
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Patent number: 10974207Abstract: A gas separation membrane, the gas separation membrane module, and the gas separation device each have a support, a resin layer, a separation layer, and a protective layer in this order, in which the resin layer includes a compound having a siloxane bond, the protective layer is in direct contact with the separation layer, a composition of the protective layer is different from a composition of the resin layer, the composition of the protective layer is different from a composition of the separation layer, and the separation layer has a maximum value of a silicon atom content of 2 atomic % or less in a composition of a half area on a side of the protective layer in a thickness direction.Type: GrantFiled: November 28, 2018Date of Patent: April 13, 2021Assignee: FUJIFILM CorporationInventors: Atsushi Mukai, Yusuke Mochizuki
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Publication number: 20200156000Abstract: A process for separating a feed gas comprising a polar gas and a non-polar gas into a permeate gas and a retentate gas, one of which is enriched in the polar gas and the other of which is depleted in the polar gas, the process comprising passing the feed gas through a gas separation module comprising: (i) a feed carrier comprising a membrane envelope and a feed spacer located within the membrane envelope; and (ii) a permeate carrier comprising: (a) a macroporous sheet; and (b) a protective sheet; and wherein: i) the feed gas is fed along the feed spacer of the feed carrier and a part of the feed gas passes through the membrane envelope and into the permeate carrier to give the permeate gas and a part of the feed gas is rejected by the membrane to give the retentate gas; ii) the protective sheet shields at least a part of the membrane envelope from contact with the macroporous sheet; and iii) the protective sheet comprises a non-woven material.Type: ApplicationFiled: July 5, 2018Publication date: May 21, 2020Inventors: Atsushi Mukai, Anton Van Der Pluijm, Nori Miyagishima, Kazuomi Inoue, Davide Bocciardo, Yujiro Itami
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Patent number: 10486101Abstract: A gas separation membrane, the gas separation membrane module, and the gas separation device include a first separation layer, and a second separation layer, the first separation layer has an Si/C ratio of 0.3 or less, the Si/C ratio being a ratio of the number of silicon atoms to the number of carbon atoms at the interface of the first separation layer on the second separation layer side, the second separation layer has a maximum value of an F/C ratio of 0.20 or more, the F/C ratio being a ratio of the number of fluorine atoms to the number of carbon atoms, and an Si/C ratio of 0.3 or less in a portion where the F/C ratio is maximum.Type: GrantFiled: November 12, 2018Date of Patent: November 26, 2019Assignee: FUJIFILM CorporationInventors: Yusuke Mochizuki, Atsushi Mukai, Motoi Harada, Makoto Sawada
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Patent number: 10442139Abstract: A technique for accurately detecting a temperature of a sealing surface which is not affected by sealing conditions or the like is provided. A seal bar (1) is a rod-shaped seal bar having a sealing surface (11a) and includes a heater (13) and a temperature sensor (14). The heater (13) is provided in a main body of the seal bar (1) and extends in an extending direction (D1) of the main body (11). The temperature sensor (14) is provided at a position between the sealing surface (11a) and the heater (13) in the main body (11) of the seal bar (1) and is inserted into the main body (11) of the seal bar (1) from an end surface (upper end surface (112) or the like) which intersects a long side of the sealing surface (11a).Type: GrantFiled: October 5, 2017Date of Patent: October 15, 2019Assignee: OMRON CorporationInventors: Hironori Ogawa, Norihiro Ueda, Yuki Tarumoto, Takaaki Yamada, Masahiro Ozaki, Morihisa Ohta, Akira Takaishi, Hiroyuki Togawa, Atsushi Mukai
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Patent number: 10427111Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.55??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: GrantFiled: March 14, 2017Date of Patent: October 1, 2019Assignee: FUJIFILM CorporationInventors: Yusuke Mochizuki, Makoto Sawada, Takeshi Narita, Shigehide Itou, Hiroyuki Noda, Atsushi Mukai
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Publication number: 20190291060Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.63??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: ApplicationFiled: June 14, 2019Publication date: September 26, 2019Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Makoto SAWADA, Takeshi NARITA, Shigehide ITOU, Hiroyuki NODA, Atsushi MUKAI
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Publication number: 20190091635Abstract: A gas separation membrane, the gas separation membrane module, and the gas separation device each have a support, a resin layer, a separation layer, and a protective layer in this order, in which the resin layer includes a compound having a siloxane bond, the protective layer is in direct contact with the separation layer, a composition of the protective layer is different from a composition of the resin layer, the composition of the protective layer is different from a composition of the separation layer, and the separation layer has a maximum value of a silicon atom content of 2 atomic % or less in a composition of a half area on a side of the protective layer in a thickness direction.Type: ApplicationFiled: November 28, 2018Publication date: March 28, 2019Applicant: FUJIFILM CorporationInventors: Atsushi MUKAI, Yusuke MOCHIZUKI
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Publication number: 20190076777Abstract: A gas separation membrane, the gas separation membrane module, and the gas separation device include a first separation layer, and a second separation layer, the first separation layer has an Si/C ratio of 0.3 or less, the Si/C ratio being a ratio of the number of silicon atoms to the number of carbon atoms at the interface of the first separation layer on the second separation layer side, the second separation layer has a maximum value of an F/C ratio of 0.20 or more, the F/C ratio being a ratio of the number of fluorine atoms to the number of carbon atoms, and an Si/C ratio of 0.3 or less in a portion where the F/C ratio is maximum.Type: ApplicationFiled: November 12, 2018Publication date: March 14, 2019Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Atsushi MUKAI, Motoi HARADA, Makoto SAWADA
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Patent number: 10017854Abstract: A gas barrier film includes a substrate film and an inorganic layer, in which the inorganic layer includes Si, N, H, and O, the inorganic layer includes a uniform region having a thickness of more than 5 nm at the center in a thickness direction, in the uniform region, a ratio of Si, N, H, and O is uniform and an O proportion is low, and either or both interface-contact regions of the inorganic layer are oxygen-containing regions in which the O proportion represented by the expression “O Proportion: (Number of O/Total Number of Si, N, and O)×100%” increases in a direction from the uniform region side to an interface and in which a variation of the O proportion per unit thickness is 2%/nm to 8%/nm.Type: GrantFiled: September 20, 2016Date of Patent: July 10, 2018Assignee: FUJIFILM CorporationInventors: Seigo Nakamura, Yoshihiko Mochizuki, Atsushi Mukai
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Publication number: 20180178456Abstract: A technique for accurately detecting a temperature of a sealing surface which is not affected by sealing conditions or the like is provided. A seal bar (1) is a rod-shaped seal bar having a sealing surface (11a) and includes a heater (13) and a temperature sensor (14). The heater (13) is provided in a main body of the seal bar (1) and extends in an extending direction (D1) of the main body (11). The temperature sensor (14) is provided at a position between the sealing surface (11a) and the heater (13) in the main body (11) of the seal bar (1) and is inserted into the main body (11) of the seal bar (1) from an end surface (upper end surface (112) or the like) which intersects a long side of the sealing surface (11a).Type: ApplicationFiled: October 5, 2017Publication date: June 28, 2018Applicant: OMRON CorporationInventors: Hironori OGAWA, Norihiro UEDA, Yuki TARUMOTO, Takaaki YAMADA, Masahiro OZAKI, Morihisa OHTA, Akira TAKAISHI, Hiroyuki TOGAWA, Atsushi MUKAI
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Publication number: 20170182469Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.55??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: ApplicationFiled: March 14, 2017Publication date: June 29, 2017Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Makoto SAWADA, Takeshi NARITA, Shigehide ITOU, Hiroyuki NODA, Atsushi MUKAI
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Publication number: 20170009339Abstract: A gas barrier film includes a substrate film and an inorganic layer, in which the inorganic layer includes Si, N, H, and O, the inorganic layer includes a uniform region having a thickness of more than 5 nm at the center in a thickness direction, in the uniform region, a ratio of Si, N, H, and O is uniform and an O proportion is low, and either or both interface-contact regions of the inorganic layer are oxygen-containing regions in which the O proportion represented by the expression “O Proportion: (Number of O/Total Number of Si, N, and O)×100%” increases in a direction from the uniform region side to an interface and in which a variation of the 0 proportion per unit thickness is 2%/nm to 8%/nm.Type: ApplicationFiled: September 20, 2016Publication date: January 12, 2017Applicant: FUJIFILM CorporationInventors: Seigo NAKAMURA, Yoshihiko MOCHIZUKI, Atsushi MUKAI
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Patent number: 9458852Abstract: A centrifugal fan includes an impeller, a motor portion, and a housing. The housing includes an upper plate portion, a lower plate portion arranged to have the motor portion fixed thereto; and a side wall portion. A flow control member is arranged to extend in a line along a boundary between an inside surface of the side wall portion and one of a lower surface of the upper plate portion and an upper surface of the lower plate portion. The flow control member includes a flow control surface arranged to extend radially outward from the one of the lower surface of the upper plate portion and the upper surface of the lower plate portion to the inside surface of the side wall portion while becoming more distant from the one of the lower surface of the upper plate portion and the upper surface of the lower plate portion.Type: GrantFiled: March 11, 2013Date of Patent: October 4, 2016Assignee: NIDEC CORPORATIONInventors: Seung-sin Yoo, Tomohiro Hasegawa, Shunji Matsumoto, Kazuo Tanaka, Takuro Kawano, Yuji Katsurayama, Atsushi Mukai, Noriaki Yamamoto