Patents by Inventor Atsushi Murota

Atsushi Murota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11834642
    Abstract: A method for collecting a fine particle stored in a structure by suctioning the fine particle using a nozzle, in which, as the structure, a structure in which at least one communication portion that communicates a space storing the fine particle with one surface side and the other surface side of the structure is formed is used.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: December 5, 2023
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takashi Ohsaka, Yasuo Suzuki, Atsushi Murota
  • Patent number: 11612891
    Abstract: A filter film includes a through-hole and a recessed portion having a size capable of capturing one particle, in which the recessed portion is open to one face of the filter film, the through-hole in the one face has a shape or a size such that the one particle is not capable of passing through the through-hole, and the through-hole and the recessed portion are disposed close to each other.
    Type: Grant
    Filed: April 17, 2019
    Date of Patent: March 28, 2023
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasuo Suzuki, Atsushi Murota, Takashi Ohsaka, Toshiyuki Ogata
  • Patent number: 11384331
    Abstract: A particle capture device includes first and second substrates. The first substrate has recessed portions that have a size capable of capturing one particle. Each recessed portion has connection holes that have a size capable of allowing a dispersion medium of particles to move therethrough. A flow path that has the connection holes as an inlet port and an end portion of a first side of the first substrate as an outlet port is defined between the first substrate and the second substrate. A total opening area of the connection holes is 1 mm2 or more and less than 10 mm2, and a cross-sectional area of the flow path at the outlet port is 0.8 times or more the total opening area; or the total opening area is 10 mm2 or more and 1000 mm2 or less, and the cross-sectional area is 0.1 times or more the total opening area.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: July 12, 2022
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasuo Suzuki, Atsushi Murota, Takashi Ohsaka, Toshiyuki Ogata
  • Publication number: 20200362294
    Abstract: A particle capture device includes a first substrate; and a second substrate that is disposed parallel to and facing first side of the first substrate, in which the first substrate has a plurality of recessed portions that are open on the second side of the first substrate and that have a size capable of capturing one particle, the recessed portion has connection holes that connect the first side to the second side and that have a size allowing a dispersion medium of the particles to move therethrough, a flow path that has the connection holes of the first substrate as an inlet port of the dispersion medium and has an end portion of the first side of the first substrate as an outlet port of the dispersion medium is formed between the first substrate and the second substrate, the total opening area of the connection holes is 1 mm2 or more and less than 10 mm2, and a cross-sectional area of the flow path at the outlet port is 0.
    Type: Application
    Filed: December 5, 2017
    Publication date: November 19, 2020
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yasuo SUZUKI, Atsushi MUROTA, Takashi OHSAKA, Toshiyuki OGATA
  • Patent number: 10501627
    Abstract: A composition for optical imprint having excellent transferability of a mold shape and giving a pattern having excellent alkali resistance at high temperature by optical imprint and subsequent heating and a method for producing a pattern using the composition. The composition includes a polysiloxane including a structural unit 1 represented by Formula (a1) and a structural unit 2 represented by Formula (a2) and a polymerization initiator. The polysiloxane has a structural unit 1 content of 30% to 85% by mole and a structural unit 2 content of 15% to 70% by mole based on the entire structural units in the polysiloxane. In the formulae, R1 represents a group containing an ethylenic double bond, and R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent.
    Type: Grant
    Filed: January 16, 2015
    Date of Patent: December 10, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Atsushi Murota
  • Publication number: 20190344275
    Abstract: A filter film includes a through-hole and a recessed portion having a size capable of capturing one particle, in which the recessed portion is open to one face of the filter film, the through-hole in the one face has a shape or a size such that the one particle is not capable of passing through the through-hole, and the through-hole and the recessed portion are disposed close to each other.
    Type: Application
    Filed: April 17, 2019
    Publication date: November 14, 2019
    Inventors: Yasuo SUZUKI, Atsushi MUROTA, Takashi OHSAKA, Toshiyuki OGATA
  • Publication number: 20190225927
    Abstract: A method for collecting a fine particle stored in a structure by suctioning the fine particle using a nozzle, in which, as the structure, a structure in which at least one communication portion that communicates a space storing the fine particle with one surface side and the other surface side of the structure is formed is used.
    Type: Application
    Filed: September 21, 2017
    Publication date: July 25, 2019
    Inventors: Takashi OHSAKA, Yasuo SUZUKI, Atsushi MUROTA
  • Patent number: 9870924
    Abstract: A diffusion agent composition used in forming an impurity diffusion agent layer on a semiconductor substrate, and containing an impurity diffusion component, a silicon compound, and a solvent containing a solvent having a boiling point of 100° C. or less, a solvent having a boiling point of 120-180° C., and a solvent having a boiling point of 300° C.
    Type: Grant
    Filed: April 12, 2011
    Date of Patent: January 16, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Atsushi Murota, Takaaki Hirai
  • Publication number: 20170349877
    Abstract: Provided is a cell culture substrate for trait induction of a nerve cell, which has a pattern of unevenness on a surface to which a cell adheres, the width of the unevenness being 50 nm or more and 1,000 nm or less.
    Type: Application
    Filed: June 1, 2017
    Publication date: December 7, 2017
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Emi MAENO, Takahiro SENZAKI, Atsushi MUROTA, Yasuhiko TABATA
  • Publication number: 20170349882
    Abstract: Provided is a cell culture substrate for trait induction control of a macrophage, which has a pattern of unevenness on a surface to which a cell adheres, the width of the unevenness being 50 nm or more and less than 1,000 nm.
    Type: Application
    Filed: June 1, 2017
    Publication date: December 7, 2017
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Emi MAENO, Takahiro SENZAKI, Atsushi MUROTA, Yasuhiko TABATA
  • Patent number: 9620367
    Abstract: A diffusion agent composition including an impurity-diffusing component (A); a binder resin (B) that thermally decomposes and disappears below a temperature at which the impurity-diffusing component (A) begins to thermally diffuse; SiO2 fine particles (C); and an organic solvent (D) that contains an organic solvent (D1) having a boiling point of at least 100° C.
    Type: Grant
    Filed: August 18, 2010
    Date of Patent: April 11, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takaaki Hirai, Atsushi Murota, Katsuya Tanitsu
  • Publication number: 20150203683
    Abstract: A composition for optical imprint having excellent transferability of a mold shape and giving a pattern having excellent alkali resistance at high temperature by optical imprint and subsequent heating and a method for producing a pattern using the composition. The composition includes a polysiloxane including a structural unit 1 represented by Formula (a1) and a structural unit 2 represented by Formula (a2) and a polymerization initiator. The polysiloxane has a structural unit 1 content of 30% to 85% by mole and a structural unit 2 content of 15% to 70% by mole based on the entire structural units in the polysiloxane. In the formulae, R1 represents a group containing an ethylenic double bond, and R2 represents an aryl group having 6 to 15 carbon atoms which may have a substituent.
    Type: Application
    Filed: January 16, 2015
    Publication date: July 23, 2015
    Inventor: Atsushi Murota
  • Patent number: 8475690
    Abstract: An embodiment of the present invention relates to a diffusing agent composition used in printing an impurity-diffusing component onto a semiconductor substrate, wherein the diffusing agent composition contains: a hydrolysis product of alkoxysilane (A); a component (B) containing at least one selected from the group consisting of a hydrolysis product of alkoxy titanium, a hydrolysis product of alkoxy zirconium, titania fine particle, and zirconia fine particle; an impurity-diffusing component (C); and an organic solvent (D).
    Type: Grant
    Filed: October 4, 2010
    Date of Patent: July 2, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takashi Kamizono, Toshiro Morita, Atsushi Murota, Motoki Takahashi, Katsuya Tanitsu, Takaaki Hirai
  • Publication number: 20130061922
    Abstract: A diffusion agent composition used in forming an impurity diffusion agent layer on a semiconductor substrate, and containing an impurity diffusion component, a silicon compound, and a solvent containing a solvent having a boiling point of 100° C. or less, a solvent having a boiling point of 120-180° C., and a solvent having a boiling point of 300° C.
    Type: Application
    Filed: April 12, 2011
    Publication date: March 14, 2013
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Atsushi Murota, Takaaki Hirai
  • Publication number: 20120160306
    Abstract: A diffusion agent composition including an impurity-diffusing component (A); a binder resin (B) that thermally decomposes and disappears below a temperature at which the impurity-diffusing component (A) begins to thermally diffuse; SiO2 fine particles (C); and an organic solvent (D) that contains an organic solvent (D1) having a boiling point of at least 100° C.
    Type: Application
    Filed: August 18, 2010
    Publication date: June 28, 2012
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takaaki Hirai, Atsushi Murota, Katsuya Tanitsu
  • Publication number: 20110079262
    Abstract: An embodiment of the present invention relates to a diffusing agent composition used in printing an impurity-diffusing component onto a semiconductor substrate, wherein the diffusing agent composition contains: a hydrolysis product of alkoxysilane (A); a component (B) containing at least one selected from the group consisting of a hydrolysis product of alkoxy titanium, a hydrolysis product of alkoxy zirconium, titania fine particle, and zirconia fine particle; an impurity-diffusing component (C); and an organic solvent (D).
    Type: Application
    Filed: October 4, 2010
    Publication date: April 7, 2011
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi KAMIZONO, Toshiro MORITA, Atsushi MUROTA, Motoki TAKAHASHI, Katsuya TANITSU, Takaaki HIRAI
  • Publication number: 20100170735
    Abstract: A power source device mounted on a vehicle, having a battery pack (2). The battery pack (2) includes vertically Stacked cells. The battery pack (2) is placed under a front seat (120), positioned offset to the center in the lateral direction of the vehicle.
    Type: Application
    Filed: July 25, 2007
    Publication date: July 8, 2010
    Inventors: Yoshiyuki Nakamura, Atsushi Murota