Abstract: An object of the present invention is to provide a sputtering target suitable for forming a semiconductor film having low carrier concentration and high mobility. Provided is a sputtering target containing zinc (Zn), tin (Sn), gallium (Ga) and oxygen (O), wherein the sputtering target contains Ga in an amount of 0.15 or more and 0.50 or less in terms of a Ga/(Zn+Sn+Ga) atomic ratio, contains Sn in an amount of 0.30 or more and 0.60 or less in terms of a Sn/(Zn+Sn) atomic ratio, and has a volume resistivity of 50 ?·cm or less.

Abstract: A medical device includes an extracorporeal unit including a power transmitting unit that transmits electric power from outside of a living body into the living body in a non-contact manner, and a medical instrument embedded in the living body. The medical instrument includes a power receiving unit that receives the electric power transmitted from the power transmitting unit, a soft portion through which an injection needle is inserted, and a plurality of light emitting units that are provided along an outer edge of the soft portion and are each configured to emit light using the electric power received by the power receiving unit. A light amount adjusting unit that adjusts a light amount of a light-irradiated region including one or more light-irradiated portions to be projected on a body surface from the plurality of light emitting units.

Abstract: A recording material conveying device includes: a first conveyor that constitutes a conveyance path of a recording material; a second conveyor that branches from the first conveyor and constitutes a conveyance path of the recording material different from the conveyance path of the first conveyor; and a detector that detects recording material characteristics of the recording material, the detector being arranged in the second conveyor on a downstream side in a conveyance direction of the recording material with respect to a branch portion where the first conveyor and the second conveyor branch.

Abstract: A potassium sodium niobate sputtering target having a relative density of 95% or higher. A method of producing a potassium sodium niobate sputtering target, including the steps of mixing a Nb2O5 powder, a K2CO3 powder, and a Na2Co3 powder, pulverizing the mixed powder to achieve a grain size d50 of 100 ?m or less, and performing hot press sintering to the obtained pulverized powder in an inert gas or vacuum atmosphere under conditions of a temperature of 900° C. or higher and less than 1150° C., and a load of 150 to 400 kgf/cm2. A high density potassium sodium niobate sputtering target capable of industrially depositing potassium sodium niobate films via the sputtering method is provided.

Abstract: A potassium sodium niobate sputtering target having a relative density of 95% or higher. A method of producing a potassium sodium niobate sputtering target, including the steps of mixing a Nb2O5 powder, a K2Co3 powder, and a Na2Co3 powder, pulverizing the mixed powder to achieve a grain size d50 of 100 ?m or less, and performing hot press sintering to the obtained pulverized powder in an inert gas or vacuum atmosphere under conditions of a temperature of 900° C. or higher and less than 1150° C., and a load of 150 to 400 kgf/cm2. The present invention aims to provide a high density potassium sodium niobate sputtering target capable of industrially depositing potassium sodium niobate films via the sputtering method.

Abstract: Provided is a speaker that allows compactization while achieving improvement in assembly readiness. The speaker includes a diaphragm having a vibration face portion vibrated to radiate a sound wave, a voice coil fixed to a back face of the vibration face portion, a frame supporting the diaphragm, a magnetic circuit vibrating the diaphragm and a mass adjustment member opposed to a surface of the diaphragm and configured to adjust the mass of the vibration face portion. The mass adjustment member includes a plate face portion fixed to the surface of the vibration face portion and a damper extending outwards from the plate face portion.

Abstract: In an electric connector, a waterproof member having an internal waterproof portion and an external waterproof portion is provided in a main body portion. The internal waterproof portion and the external waterproof portion are integrated. Accordingly, the internal waterproof portion covers exposed portions of an upper contact and a lower contact and prevents water intrusion along the upper contact and the lower contact. In addition, the external waterproof portion prevents water intrusion between the electric connector and an inner wall of an accommodating space of an electronic device by surrounding the entire circumference of the main body portion. Since the internal waterproof portion and the external waterproof portion are integrated in this manner, both internal waterproofing and external waterproofing can be realized with the simple configuration of the single waterproof member in the electric connector.

Abstract: A speaker includes a frame, a diaphragm supported by the frame, a rectangular tube-shaped coil that is wound into a rectangular shape and vibrates the diaphragm, and a pair of support dampers that support the coil and dampen vibrations of the coil. The pair of support dampers are arranged opposing each other across the coil. The support dampers each have a base portion that is supported by the frame and a support portion that supports the coil. The support portion has a first support portion that extends along and supports a surface of one side of the rectangular shape of the coil and a pair of second support portions that extend along and support surfaces of two sides respectively of the coil that are adjacent to the one side. The pair of second support portions extend from respective end portions of the first support portion.

Abstract: A potassium sodium niobate sputtering target having a relative density of 95% or higher. A method of producing a potassium sodium niobate sputtering target, including the steps of mixing a Nb2O5 powder, a K2Co3 powder, and a Na2Co3 powder, pulverizing the mixed powder to achieve a grain size d50 of 100 ?m or less, and performing hot press sintering to the obtained pulverized powder in an inert gas or vacuum atmosphere under conditions of a temperature of 900° C. or higher and less than 1150° C., and a load of 150 to 400 kgf/cm2. The present invention aims to provide a high density potassium sodium niobate sputtering target capable of industrially depositing potassium sodium niobate films via the sputtering method.

Abstract: In an electric connector, a waterproof member having an internal waterproof portion and an external waterproof portion is provided in a main body portion. The internal waterproof portion and the external waterproof portion are integrated. Accordingly, the internal waterproof portion covers exposed portions of an upper contact and a lower contact and prevents water intrusion along the upper contact and the lower contact. In addition, the external waterproof portion prevents water intrusion between the electric connector and an inner wall of an accommodating space of an electronic device by surrounding the entire circumference of the main body portion. Since the internal waterproof portion and the external waterproof portion are integrated in this manner, both internal waterproofing and external waterproofing can be realized with the simple configuration of the single waterproof member in the electric connector.

Abstract: A sintered compact essentially consisting of zinc (Zn), gallium (Ga), silicon (Si) and oxygen (O), wherein a Zn content expressed in terms of ZnO is 5 to 60 mol %, a Ga content expressed in terms of Ga2O3 is 8.5 to 90 mol %, and a Si content expressed in terms of SiO2 is 0 to 45 mol %, and the sintered compact satisfies a condition of A?(B+2C) when the Zn content expressed in terms of ZnO is A (mol %), the Ga content expressed in terms of Ga2O3 is B (mol %), and the Si content expressed in terms of SiO2 is C (mol %), and has a relative density of 90% or higher. An object of this invention is to efficiently obtain an amorphous film having high transmissivity and a low refractive index without having to introduce oxygen into the atmosphere during film deposition by DC sputtering.

Abstract: A sintered compact essentially consisting of zinc (Zn), gallium (Ga), silicon (Si) and oxygen (O), wherein a Zn content expressed in terms of ZnO is 5 to 60 mol %, a Ga content expressed in terms of Ga2O3 is 8.5 to 90 mol %, and a Si content expressed in terms of SiO2 is 0 to 45 mol %, and the sintered compact satisfies a condition of A?(B+2C) when the Zn content expressed in terms of ZnO is A (mol %), the Ga content expressed in terms of Ga2O3 is B (mol %), and the Si content expressed in terms of SiO2 is C (mol %), and has a relative density of 90% or higher. An object of this invention is to efficiently obtain an amorphous film having high transmissivity and a low refractive index without having to introduce oxygen into the atmosphere during film deposition by DC sputtering.

Abstract: A lubricating oil composition includes: a lubricating base oil; a component (A) that is a metal detergent having a base value of less than 100 mgKOH/g; a component (B) that is a metal detergent having a base value of 100 mgKOH/g or more; a component (C) that is a tertiary amine represented by a formula (1) below, in which R1 is a hydrocarbon group having 4 carbon atoms or more, and R2 and R3 each are a hydrocarbon group having 4 carbon atoms or less; and a component (D) that is at least one of acid phosphate and acid phosphite.

Abstract: An automatic transmission fluid contains: a base oil: a component (A) that is two or more succinimides each having an alkenyl group or an alkyl group, wherein a mass average molecular weight of the alkenyl group or the alkyl group is different in each of the succinimides; a component (B) that is a primary amine having a carbon chain having 12 to 24 carbon atoms; a component (C) that is an aliphatic amine alkylene oxide adduct having a carbon chain having 12 to 20 carbon atoms; and a component (D) that is an amide compound.

Abstract: A sputtering target for a magnetic recording film containing SiO2, wherein a peak strength ratio of a (011) plane of quartz relative to a background strength (i.e. quartz peak strength/background strength) in an X-ray diffraction is 1.40 or more. An object of this invention is to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, shortening the burn-in time, magnetically and finely separating the single-domain particles after deposition, and improving the recording density.

Abstract: A lubricating oil composition includes: a lubricating base oil; a component (A) that is a metal detergent having a base value of less than 100 mgKOH/g; a component (B) that is a metal detergent having a base value of 100 mgKOH/g or more; a component (C) that is a tertiary amine represented by a formula (1) below, in which R1 is a hydrocarbon group having 4 carbon atoms or more, and R2 and R3 each are a hydrocarbon group having 4 carbon atoms or less; and a component (D) that is at least one of acid phosphate and acid phosphite.

Abstract: Provided is a sputtering target containing SiO2 for a magnetic recording film, wherein a ratio of the peak intensity of cristobalites, which are crystallized SiO2, to the background intensity (cristobalite peak intensity/background intensity) in an X-ray diffraction is 1.40 or less. The present invention aims to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, and shortening the burn-in time.

Abstract: A sputtering target for a magnetic recording film containing SiO2, wherein a peak strength ratio of a (011) plane of quartz relative to a background strength (i.e. quartz peak strength/background strength) in an X-ray diffraction is 1.40 or more. An object of this invention is to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, shortening the burn-in time, magnetically and finely separating the single-domain particles after deposition, and improving the recording density.

Abstract: Provided is a sputtering target for a magnetic recording film containing SiO2, wherein the sputtering target for a magnetic recording film contains B (boron) in an amount of 10 to 1000 wtppm. An object of this invention is to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, shortening the burn-in time, and realizing a stable discharge with a magnetron sputtering device.

Abstract: Provided is a sputtering target containing SiO2 for a magnetic recording film, wherein a ratio of the peak intensity of cristobalites, which are crystallized SiO2, to the background intensity (cristobalite peak intensity/background intensity) in an X-ray diffraction is 1.40 or less. The present invention aims to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, and shortening the burn-in time.