Patents by Inventor Atsushi Nozawa

Atsushi Nozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240114716
    Abstract: A first light-emitting element and a second light-emitting element that have a resonance structure that causes output light from a light-emission functional layer to resonate between a reflective layer and a semi-transmissive reflective layer, and a pixel definition layer, and in which an aperture part is formed to correspond to each of the first light-emitting element and the second light-emitting element, are formed on a base. A first interval between the reflective layer and the semi-transmissive reflective layer in the first light-emitting element and a second interval between the reflective layer and the semi-transmissive reflective layer in the second light-emitting element are different, and a film thickness of the pixel definition layer is less than a difference between the first interval and the second interval.
    Type: Application
    Filed: December 6, 2023
    Publication date: April 4, 2024
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Ryoichi NOZAWA, Atsushi AMANO, Takeshi KOSHIHARA, Akio FUKASE, Shinichi IWATA
  • Patent number: 11787891
    Abstract: The present invention provides a modified block copolymer composition comprising a modified block copolymer containing at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, and having at least one modified terminal modified with a compound having a silicon atom and an acrylic group and/or a methacrylic group.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: October 17, 2023
    Assignee: ZEON CORPORATION
    Inventors: Atsushi Nozawa, Sadaharu Hashimoto
  • Publication number: 20230212344
    Abstract: Provided is a thermoplastic elastomer composition for an impact-resistant material, comprising a block copolymer composition comprising a block copolymer (B) in which a functional group capable of noncovalent bonding is introduced into a block copolymer (A) including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.
    Type: Application
    Filed: February 4, 2021
    Publication date: July 6, 2023
    Applicants: ZEON CORPORATION, National University Corporation Tokai National Higher Education and Research System
    Inventors: Sadaharu HASHIMOTO, Atsushi NOZAWA, Atsushi NORO, Takato KAJITA, Haruka TANAKA, Yushu MATSUSHITA
  • Publication number: 20230111050
    Abstract: A block-copolymer pellet having 100 parts by weight of a pellet-shaped article of a block copolymer (A) and 0.01 to 5 parts by weight of a hydrocarbon-based dusting agent (B) is provided, wherein the block copolymer (A) has at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, the hydrocarbon-based dusting agent (B) has a BET specific surface area of 0.50 to 3.00 m2/g, a volume average particle size of 2.0 to 20 ?m, a bulk density of 0.10 to 0.34 g/cm3, and a melting point of 75° C. or higher, and the block-copolymer pellet has a Shore A hardness of 10 to 80, and a BET specific surface area of 0.001 to 0.05 m2/g measured by a Kr adsorption method.
    Type: Application
    Filed: February 17, 2021
    Publication date: April 13, 2023
    Applicant: ZEON CORPORATION
    Inventors: Yuta ISHII, Atsushi NOZAWA
  • Publication number: 20230060226
    Abstract: Provided is an adhesive composition having high holding power. Provided is an adhesive composition comprising a ring-opened copolymer containing a structural unit derived from a monocyclic olefin and a structural unit derived from a polycyclic olefin; and a tackifying resin.
    Type: Application
    Filed: January 21, 2021
    Publication date: March 2, 2023
    Applicant: ZEON CORPORATION
    Inventors: Takuro SAKURAI, Atsushi NOZAWA
  • Patent number: 11492452
    Abstract: A main purpose of the present invention is to provide a multi-block copolymer composition having good elasticity and excellent stress relaxation properties, as well as small tension set. The present invention achieves the purpose by providing a multi-block copolymer composition obtained by a modification treatment, the composition including a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond to a block copolymer A; wherein the block copolymer A includes a block copolymer A1 having a specific primary structure and a block copolymer A2 having a specific primary structure, and the mass ratio (A1/A2) of the block copolymer A1 and the block copolymer A2 is 100/0 to 50/50.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: November 8, 2022
    Assignees: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kousuke Isobe, Sadaharu Hashimoto, Atsushi Nozawa, Atsushi Noro, Takato Kajita, Yushu Matsushita
  • Patent number: 11466150
    Abstract: A main object of the present invention is to provide a block copolymer composition which has good elasticity, while having excellent stress relaxation properties. The object is achieved by providing a block copolymer composition obtained by a modification treatment, the block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: October 11, 2022
    Assignees: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kousuke Isobe, Sadaharu Hashimoto, Atsushi Nozawa, Ryoji Kameyama, Atsushi Noro, Takato Kajita, Yushu Matsushita
  • Publication number: 20210403631
    Abstract: There is provided a block copolymer A which is represented by a following general formula (I), wherein a ratio ((Ar1-D1)/D2) of a mass of a branched chain represented by Ar1-D1 to a mass of a branched chain represented by D2 is 1.0/0.15 to 1.0/1.75, (Ar1-D1)mX(D2)n??(I) where, in the formula (I), Ar1-D1 and D2 are each a branched chain bonded to X, Ar1 is an aromatic monovinyl polymer block, D1 and D2 are each a conjugated diene polymer block, “m” is an integer of 1 or more, “n” is an integer of 1 or more, “m”+“n” is an integer of 3 or more, and X is a residue of a polyfunctional coupling agent.
    Type: Application
    Filed: November 20, 2019
    Publication date: December 30, 2021
    Applicant: ZEON CORPORATION
    Inventor: Atsushi NOZAWA
  • Patent number: 10815401
    Abstract: A main object of the present disclosure is to provide a block copolymer composition that allows a hot melt adhesive composition having excellent hot melt properties and heat resistance stability to be obtained. The object is achieved by providing a block copolymer composition comprising a block copolymer A including an Ar1-D1 diblock as a branched chain, the block copolymer A represented by the following general formula (I), characterized in that: a molecular weight distribution (Mw/Mn) of the block copolymer A is 1.20 or less; a content of the block copolymer A in the block copolymer composition is 10% by mass or more; a content of a block copolymer B corresponding to an Ar2-D2 diblock represented by the following general formula (II), in the block copolymer composition is 60% by mass or less, and a molecular weight distribution (Mw/Mn) of the block copolymer B is 1.
    Type: Grant
    Filed: September 16, 2016
    Date of Patent: October 27, 2020
    Assignee: ZEON CORPORATION
    Inventors: Atsushi Nozawa, Sadaharu Hashimoto
  • Publication number: 20200255650
    Abstract: The present invention provides a modified block copolymer composition comprising a modified block copolymer containing at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, and having at least one modified terminal modified with a compound having a silicon atom and an acrylic group and/or a methacrylic group.
    Type: Application
    Filed: September 27, 2018
    Publication date: August 13, 2020
    Applicant: ZEON CORPORATION
    Inventors: Atsushi NOZAWA, Sadaharu HASHIMOTO
  • Publication number: 20200255607
    Abstract: A main purpose of the present invention is to provide a multi-block copolymer composition having good elasticity and excellent stress relaxation properties, as well as small tension set. The present invention achieves the purpose by providing a multi-block copolymer composition obtained by a modification treatment, the composition including a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond to a block copolymer A; wherein the block copolymer A includes a block copolymer A1 having a specific primary structure and a block copolymer A2 having a specific primary structure, and the mass ratio (A1/A2) of the block copolymer A1 and the block copolymer A2 is 100/0 to 50/50.
    Type: Application
    Filed: August 23, 2018
    Publication date: August 13, 2020
    Applicants: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kousuke ISOBE, Sadaharu HASHIMOTO, Atsushi NOZAWA, Atsushi NORO, Takato KAJITA, Yushu MATSUSHITA
  • Publication number: 20200062948
    Abstract: A main object of the present invention is to provide a block copolymer composition which has good elasticity, while having excellent stress relaxation properties. The object is achieved by providing a block copolymer composition obtained by a modification treatment, the block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.
    Type: Application
    Filed: May 1, 2018
    Publication date: February 27, 2020
    Applicants: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kousuke ISOBE, Sadaharu HASHIMOTO, Atsushi NOZAWA, Ryoji KAMEYAMA, Atsushi NORO, Takato KAJITA, Yushu MATSUSHITA
  • Publication number: 20180258328
    Abstract: A main object of the present disclosure is to provide a block copolymer composition that allows a hot melt adhesive composition having excellent hot melt properties and heat resistance stability to be obtained. The object is achieved by providing a block copolymer composition comprising a block copolymer A including an Ar1-D1 diblock as a branched chain, the block copolymer A represented by the following general formula (I), characterized in that: a molecular weight distribution (Mw/Mn) of the block copolymer A is 1.20 or less; a content of the block copolymer A in the block copolymer composition is 10% by mass or more; a content of a block copolymer B corresponding to an Ar2-D2 diblock represented by the following general formula (II), in the block copolymer composition is 60% by mass or less, and a molecular weight distribution (Mw/Mn) of the block copolymer B is 1.
    Type: Application
    Filed: September 16, 2016
    Publication date: September 13, 2018
    Applicant: ZEON CORPORATION
    Inventors: Atsushi NOZAWA, Sadaharu HASHIMOTO
  • Patent number: 9073305
    Abstract: Provided is a recording method of discharging ink including resin and a solvent to a heated recording medium to record an image on the recording medium by an ink jet recording apparatus, in which an absorption amount of the ink per unit mass of the recording medium is equal to or less than 1.0, and a wetting index of the recording medium measured based on JIS K6768 is equal to or more than 46, and when the wetting index is set as x, and the absorption amount of the ink per unit mass of the recording medium is set as y, a relationship of y?0.002x?0.027 is satisfied.
    Type: Grant
    Filed: March 27, 2013
    Date of Patent: July 7, 2015
    Assignee: Seiko Epson Corporation
    Inventor: Atsushi Nozawa
  • Publication number: 20140192120
    Abstract: Provided is a recording method of discharging ink including resin and a solvent to a heated recording medium to record an image on the recording medium by an ink jet recording apparatus, in which an absorption amount of the ink per unit mass of the recording medium is equal to or less than 1.0, and a wetting index of the recording medium measured based on JIS K6768 is equal to or more than 46, and when the wetting index is set as x, and the absorption amount of the ink per unit mass of the recording medium is set as y, a relationship of y?0.002x?0.027 is satisfied.
    Type: Application
    Filed: March 27, 2013
    Publication date: July 10, 2014
    Inventor: Atsushi NOZAWA
  • Patent number: 4529916
    Abstract: In an alternating sweeping system for use in an oscilloscope of the type wherein a sweeping signal and a delayed sweeping signal are alternately supplied to a horizontal deflection circuit of the oscilloscope, and wherein a unblanking signal and a delayed unblanking signal are alternately supplied to a brightness modulation circuit, widths of the delayed sweeping signal and the delayed unblanking signal made to be less than one half of width of the sweeping signal and the unblanking signal so that the delayed blanking signal and the delayed unblanking signal are used a plurality of times during an interval in which the sweeping signal and the unblanking signal are used once.
    Type: Grant
    Filed: February 10, 1982
    Date of Patent: July 16, 1985
    Assignee: Hitachi Denshi Kabushiki Kaisha
    Inventor: Atsushi Nozawa