Patents by Inventor Atsushi Nozawa
Atsushi Nozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240114716Abstract: A first light-emitting element and a second light-emitting element that have a resonance structure that causes output light from a light-emission functional layer to resonate between a reflective layer and a semi-transmissive reflective layer, and a pixel definition layer, and in which an aperture part is formed to correspond to each of the first light-emitting element and the second light-emitting element, are formed on a base. A first interval between the reflective layer and the semi-transmissive reflective layer in the first light-emitting element and a second interval between the reflective layer and the semi-transmissive reflective layer in the second light-emitting element are different, and a film thickness of the pixel definition layer is less than a difference between the first interval and the second interval.Type: ApplicationFiled: December 6, 2023Publication date: April 4, 2024Applicant: SEIKO EPSON CORPORATIONInventors: Ryoichi NOZAWA, Atsushi AMANO, Takeshi KOSHIHARA, Akio FUKASE, Shinichi IWATA
-
Patent number: 11787891Abstract: The present invention provides a modified block copolymer composition comprising a modified block copolymer containing at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, and having at least one modified terminal modified with a compound having a silicon atom and an acrylic group and/or a methacrylic group.Type: GrantFiled: September 27, 2018Date of Patent: October 17, 2023Assignee: ZEON CORPORATIONInventors: Atsushi Nozawa, Sadaharu Hashimoto
-
Publication number: 20230212344Abstract: Provided is a thermoplastic elastomer composition for an impact-resistant material, comprising a block copolymer composition comprising a block copolymer (B) in which a functional group capable of noncovalent bonding is introduced into a block copolymer (A) including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.Type: ApplicationFiled: February 4, 2021Publication date: July 6, 2023Applicants: ZEON CORPORATION, National University Corporation Tokai National Higher Education and Research SystemInventors: Sadaharu HASHIMOTO, Atsushi NOZAWA, Atsushi NORO, Takato KAJITA, Haruka TANAKA, Yushu MATSUSHITA
-
Publication number: 20230111050Abstract: A block-copolymer pellet having 100 parts by weight of a pellet-shaped article of a block copolymer (A) and 0.01 to 5 parts by weight of a hydrocarbon-based dusting agent (B) is provided, wherein the block copolymer (A) has at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, the hydrocarbon-based dusting agent (B) has a BET specific surface area of 0.50 to 3.00 m2/g, a volume average particle size of 2.0 to 20 ?m, a bulk density of 0.10 to 0.34 g/cm3, and a melting point of 75° C. or higher, and the block-copolymer pellet has a Shore A hardness of 10 to 80, and a BET specific surface area of 0.001 to 0.05 m2/g measured by a Kr adsorption method.Type: ApplicationFiled: February 17, 2021Publication date: April 13, 2023Applicant: ZEON CORPORATIONInventors: Yuta ISHII, Atsushi NOZAWA
-
Publication number: 20230060226Abstract: Provided is an adhesive composition having high holding power. Provided is an adhesive composition comprising a ring-opened copolymer containing a structural unit derived from a monocyclic olefin and a structural unit derived from a polycyclic olefin; and a tackifying resin.Type: ApplicationFiled: January 21, 2021Publication date: March 2, 2023Applicant: ZEON CORPORATIONInventors: Takuro SAKURAI, Atsushi NOZAWA
-
Patent number: 11492452Abstract: A main purpose of the present invention is to provide a multi-block copolymer composition having good elasticity and excellent stress relaxation properties, as well as small tension set. The present invention achieves the purpose by providing a multi-block copolymer composition obtained by a modification treatment, the composition including a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond to a block copolymer A; wherein the block copolymer A includes a block copolymer A1 having a specific primary structure and a block copolymer A2 having a specific primary structure, and the mass ratio (A1/A2) of the block copolymer A1 and the block copolymer A2 is 100/0 to 50/50.Type: GrantFiled: August 23, 2018Date of Patent: November 8, 2022Assignees: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITYInventors: Kousuke Isobe, Sadaharu Hashimoto, Atsushi Nozawa, Atsushi Noro, Takato Kajita, Yushu Matsushita
-
Patent number: 11466150Abstract: A main object of the present invention is to provide a block copolymer composition which has good elasticity, while having excellent stress relaxation properties. The object is achieved by providing a block copolymer composition obtained by a modification treatment, the block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.Type: GrantFiled: May 1, 2018Date of Patent: October 11, 2022Assignees: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITYInventors: Kousuke Isobe, Sadaharu Hashimoto, Atsushi Nozawa, Ryoji Kameyama, Atsushi Noro, Takato Kajita, Yushu Matsushita
-
Publication number: 20210403631Abstract: There is provided a block copolymer A which is represented by a following general formula (I), wherein a ratio ((Ar1-D1)/D2) of a mass of a branched chain represented by Ar1-D1 to a mass of a branched chain represented by D2 is 1.0/0.15 to 1.0/1.75, (Ar1-D1)mX(D2)n??(I) where, in the formula (I), Ar1-D1 and D2 are each a branched chain bonded to X, Ar1 is an aromatic monovinyl polymer block, D1 and D2 are each a conjugated diene polymer block, “m” is an integer of 1 or more, “n” is an integer of 1 or more, “m”+“n” is an integer of 3 or more, and X is a residue of a polyfunctional coupling agent.Type: ApplicationFiled: November 20, 2019Publication date: December 30, 2021Applicant: ZEON CORPORATIONInventor: Atsushi NOZAWA
-
Patent number: 10815401Abstract: A main object of the present disclosure is to provide a block copolymer composition that allows a hot melt adhesive composition having excellent hot melt properties and heat resistance stability to be obtained. The object is achieved by providing a block copolymer composition comprising a block copolymer A including an Ar1-D1 diblock as a branched chain, the block copolymer A represented by the following general formula (I), characterized in that: a molecular weight distribution (Mw/Mn) of the block copolymer A is 1.20 or less; a content of the block copolymer A in the block copolymer composition is 10% by mass or more; a content of a block copolymer B corresponding to an Ar2-D2 diblock represented by the following general formula (II), in the block copolymer composition is 60% by mass or less, and a molecular weight distribution (Mw/Mn) of the block copolymer B is 1.Type: GrantFiled: September 16, 2016Date of Patent: October 27, 2020Assignee: ZEON CORPORATIONInventors: Atsushi Nozawa, Sadaharu Hashimoto
-
Publication number: 20200255650Abstract: The present invention provides a modified block copolymer composition comprising a modified block copolymer containing at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, and having at least one modified terminal modified with a compound having a silicon atom and an acrylic group and/or a methacrylic group.Type: ApplicationFiled: September 27, 2018Publication date: August 13, 2020Applicant: ZEON CORPORATIONInventors: Atsushi NOZAWA, Sadaharu HASHIMOTO
-
Publication number: 20200255607Abstract: A main purpose of the present invention is to provide a multi-block copolymer composition having good elasticity and excellent stress relaxation properties, as well as small tension set. The present invention achieves the purpose by providing a multi-block copolymer composition obtained by a modification treatment, the composition including a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond to a block copolymer A; wherein the block copolymer A includes a block copolymer A1 having a specific primary structure and a block copolymer A2 having a specific primary structure, and the mass ratio (A1/A2) of the block copolymer A1 and the block copolymer A2 is 100/0 to 50/50.Type: ApplicationFiled: August 23, 2018Publication date: August 13, 2020Applicants: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITYInventors: Kousuke ISOBE, Sadaharu HASHIMOTO, Atsushi NOZAWA, Atsushi NORO, Takato KAJITA, Yushu MATSUSHITA
-
Publication number: 20200062948Abstract: A main object of the present invention is to provide a block copolymer composition which has good elasticity, while having excellent stress relaxation properties. The object is achieved by providing a block copolymer composition obtained by a modification treatment, the block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.Type: ApplicationFiled: May 1, 2018Publication date: February 27, 2020Applicants: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITYInventors: Kousuke ISOBE, Sadaharu HASHIMOTO, Atsushi NOZAWA, Ryoji KAMEYAMA, Atsushi NORO, Takato KAJITA, Yushu MATSUSHITA
-
Publication number: 20180258328Abstract: A main object of the present disclosure is to provide a block copolymer composition that allows a hot melt adhesive composition having excellent hot melt properties and heat resistance stability to be obtained. The object is achieved by providing a block copolymer composition comprising a block copolymer A including an Ar1-D1 diblock as a branched chain, the block copolymer A represented by the following general formula (I), characterized in that: a molecular weight distribution (Mw/Mn) of the block copolymer A is 1.20 or less; a content of the block copolymer A in the block copolymer composition is 10% by mass or more; a content of a block copolymer B corresponding to an Ar2-D2 diblock represented by the following general formula (II), in the block copolymer composition is 60% by mass or less, and a molecular weight distribution (Mw/Mn) of the block copolymer B is 1.Type: ApplicationFiled: September 16, 2016Publication date: September 13, 2018Applicant: ZEON CORPORATIONInventors: Atsushi NOZAWA, Sadaharu HASHIMOTO
-
Patent number: 9073305Abstract: Provided is a recording method of discharging ink including resin and a solvent to a heated recording medium to record an image on the recording medium by an ink jet recording apparatus, in which an absorption amount of the ink per unit mass of the recording medium is equal to or less than 1.0, and a wetting index of the recording medium measured based on JIS K6768 is equal to or more than 46, and when the wetting index is set as x, and the absorption amount of the ink per unit mass of the recording medium is set as y, a relationship of y?0.002x?0.027 is satisfied.Type: GrantFiled: March 27, 2013Date of Patent: July 7, 2015Assignee: Seiko Epson CorporationInventor: Atsushi Nozawa
-
Publication number: 20140192120Abstract: Provided is a recording method of discharging ink including resin and a solvent to a heated recording medium to record an image on the recording medium by an ink jet recording apparatus, in which an absorption amount of the ink per unit mass of the recording medium is equal to or less than 1.0, and a wetting index of the recording medium measured based on JIS K6768 is equal to or more than 46, and when the wetting index is set as x, and the absorption amount of the ink per unit mass of the recording medium is set as y, a relationship of y?0.002x?0.027 is satisfied.Type: ApplicationFiled: March 27, 2013Publication date: July 10, 2014Inventor: Atsushi NOZAWA
-
Patent number: 4529916Abstract: In an alternating sweeping system for use in an oscilloscope of the type wherein a sweeping signal and a delayed sweeping signal are alternately supplied to a horizontal deflection circuit of the oscilloscope, and wherein a unblanking signal and a delayed unblanking signal are alternately supplied to a brightness modulation circuit, widths of the delayed sweeping signal and the delayed unblanking signal made to be less than one half of width of the sweeping signal and the unblanking signal so that the delayed blanking signal and the delayed unblanking signal are used a plurality of times during an interval in which the sweeping signal and the unblanking signal are used once.Type: GrantFiled: February 10, 1982Date of Patent: July 16, 1985Assignee: Hitachi Denshi Kabushiki KaishaInventor: Atsushi Nozawa