Abstract: An anti-reflection sheet includes a transparent substrate; and a resin layer formed on a surface of a transparent substrate. The resin layer includes a first surface that faces the surface of the transparent substrate; a second surface that faces away from the surface of the transparent substrate; and a plurality of projections arranged on the second surface of the resin layer so as to form a projection layer. Each of the plurality of projections has a cross section that includes an entire center axis perpendicular to the surface of the transparent substrate. Each of the plurality of projections has a cross section that is in a shape of quadratic function. An arranged pitch of each of the plurality of projections is not more than half of a wavelength of incident light. An aspect ratio of each of the plurality of projections is 1 or less. A difference between a refractive index n1 of the transparent substrate and a refractive index n2 of the resin layer satisfies the following expression: |n1?n2|?0.05.

Abstract: To provide a lamination method and a lamination system capable of excellently laminating a film-type laminate without damage even though the semiconductor is a brittle lamination target such as a foil-type semiconductor or a semiconductor made of highly brittle material. In a lamination method for laminating a film-type laminate to a brittle lamination target by overlapping the brittle lamination target and the film-type laminate and heating and pressing the brittle lamination target and the film-type laminate, with respect to the brittle lamination target mounted on a mount member and carried into a lamination device, an elastic film member is expanded into a vacuum chamber of the lamination device from the above to press and laminate the brittle lamination target and the film-type laminate.

Abstract: An anti-reflection sheet includes a transparent substrate; and a resin layer formed on a surface of a transparent substrate. The resin layer includes a first surface that faces the surface of the transparent substrate; a second surface that faces away from the surface of the transparent substrate; and a plurality of projections arranged on the second surface of the resin layer so as to form a projection layer. Each of the plurality of projections has a cross section that includes an entire center axis perpendicular to the surface of the transparent substrate. Each of the plurality of projections has a cross section that is in a shape of quadratic function. An arranged pitch of each of the plurality of projections is not more than half of a wavelength of incident light. An aspect ratio of each of the plurality of projections is 1 or less. A difference between a refractive index n1 of the transparent substrate and a refractive index n2 of the resin layer satisfies the following expression: |n1?n2|?0.05.

Abstract: To provide a lamination method and a lamination system capable of excellently laminating a film-type laminate without damage even though the semiconductor is a brittle lamination target such as a foil-type semiconductor or a semiconductor made of highly brittle material. In a lamination method for laminating a film-type laminate to a brittle lamination target by overlapping the brittle lamination target and the film-type laminate and heating and pressing the brittle lamination target and the film-type laminate, with respect to the brittle lamination target mounted on a mount member and carried into a lamination device, an eleastic film member is expanded into a vacuum chamber of the lamination device from the above to press and laminate the brittle lamination target and the film-type laminate.

Abstract: An anti-reflection sheet is formed in a manner of forming a resin layer, which has many fine projections 12, on a flat and smooth surface of a transparent substrate 11. Transparent resin is molded into the projections 12, the projections 12 have an almost quadratic function-shaped cross section including a center axis C perpendicular to the surface of the substrate 11, and a surface of the projection 12 is preferably a rotational paraboloid. A ratio (aspect ratio) b/a of a height b and width a of the projection 12 is 1 or less. Additionally, an arranged pitch P of the projections 12 is not more than half of a wavelength of incident light.