Abstract: An object of the present invention is to provide a Brillouin optical sensing device and an optical sensing method capable of reducing introduction costs. The Brillouin optical sensing device according to the present invention includes: a sensing fiber 90 in which a plurality of optical fibers having Brillouin frequency shift characteristics different from each other are arranged in parallel; an optical measuring instrument 11 that launches an optical pulse into at least two of the optical fibers of the sensing fiber 90 to generate Brillouin scattering lights and measures a beat frequency of a beat signal between the Brillouin scattering lights at any position of the sensing fiber 90; and an arithmetic processing unit 12 that acquires a physical quantity of the sensing fiber 90 at said any position based on the beat frequency acquired by the optical measuring instrument 11.

Abstract: It is possible to estimate a slack level accurately in consideration of a shape of a deformed cable. A point cloud analysis device sets a plurality of regions of interest obtained by window-searching a wire model including a quadratic curve model representing a cable obtained from a point cloud consisting of three-dimensional points on an object, the region of interest being divided into a first region and a second region.

Abstract: By using a developer consisting essentially of one organic solvent selected from the group consisting of a ketone having 3 to 8 carbon atoms, a carboxylate ester having 3 to 8 carbon atoms, which may have an alkoxy group, and a dicarboxylate ester having 3 to 8 carbon atoms for developing a positive-type radiation resist containing a copolymer of an &agr;-methyl styrene compound and an &agr;-chloroacrylate ester compound as a base resin, there is provided a developing process and a process for forming a pattern (according to GHOST method in particular) which are used for preparing an excellent resist pattern profile, a process for preparing a photomask and a process for preparing a semiconductor device.

Abstract: By using a developer consisting essentially of one organic solvent selected from the group consisting of a ketone having 3 to 8 carbon atoms, a carboxylate ester having 3 to 8 carbon atoms, which may have an alkoxy group, and a dicarboxylate ester having 3 to 8 carbon atoms for developing a positive-type radiation resist containing a copolymer of an &agr;-methyl styrene compound and an &agr;-chloroacrylate ester compound as a base resin, there is provided a developing process and a process for forming a pattern (according to GHOST method in particular) which are used for preparing an excellent resist pattern profile, a process for preparing a photomask and a process for preparing a semiconductor device.