Abstract: An exposure apparatus includes a droplet supplier to supply a target droplet inside a vacuum chamber, an irradiator irradiating a pulsed laser onto the target droplet, a condensing mirror installed inside the vacuum chamber and configured to condense a light emitted from the target droplet by irradiation of the pulsed laser onto the target droplet, a gas supplier to flow a hydrogen gas along a surface of the condensing mirror, a controller to change a supply condition of the target droplet and an irradiation condition of the pulsed laser to conditions different from conditions during an exposure operation to increase an amount of production of hydrogen radicals in the vacuum chamber, and an exhaust pump to exhaust a gas from an inside of the vacuum chamber.

Abstract: A problem to be solved is to provide a method for processing zirconia without producing a monoclinic crystal. The solution is a method for processing zirconia, including the step of irradiating the zirconia with a laser with a pulse duration of 10?12 seconds to 10?15 seconds at an intensity of 1013 to 1015 W/cm2.

Abstract: A target shell monitoring device 4 that monitors an attitude and a position of the target shell Tg1, a compression laser output device 5a that irradiates the target shell Tg1 with a compression laser light LS1, and a heating laser output device 6 that irradiates the target shell Tg1 with a heating laser light LS3 following the compression laser light LS1 are provided. The target shell Tg1 has a hollow spherical shell shape, includes an approximately spherical space Sp on an inner side thereof, includes at least one through hole H1 connecting an outer side thereof and the space Sp, and includes, on an outer surface Sf1 thereof, irradiation areas Ar1 and Ar2 to be irradiated with compression laser lights.

Abstract: An extreme ultraviolet light generation system may comprise a chamber, a target supply unit configured to supply, to a predetermined region in the chamber, a target having an atomic density of 8.0×1017 atoms/cm3 or higher and 1.3×1018 atoms/cm3 or lower, and a laser apparatus configured to irradiate the predetermined region with a pulse laser beam having an energy density of 10.5 J/cm2 or higher and 52.3 J/cm2 or lower in the predetermined region.

Abstract: A target shell monitoring device 4 that monitors an attitude and a position of the target shell Tg1, a compression laser output device 5a that irradiates the target shell Tg1 with a compression laser light LS1, and a heating laser output device 6 that irradiates the target shell Tg1 with a heating laser light LS3 following the compression laser light LS1 are provided. The target shell Tg1 has a hollow spherical shell shape, includes an approximately spherical space Sp on an inner side thereof, includes at least one through hole H1 connecting an outer side thereof and the space Sp, and includes, on an outer surface Sf1 thereof, irradiation areas Ar1 and Ar2 to be irradiated with compression laser lights.

Abstract: An EUV light generation method includes: (1) a step of supplying a target material into a chamber; and (b) a step of generating EUV light from plasma generated by irradiating the target material with a laser beam. The spatial light intensity distribution of the laser beam may be arranged so as to provide a low intensity region with a light intensity lower than a light intensity at a position away from the beam axis by a predetermined distance is present within an area extending for the predetermined distance from the beam axis.

Abstract: An object of the present invention is to provide an extreme ultraviolet light source target which can emits extreme ultraviolet light with high emission efficiency. A solid target made of heavy metal or heavy-metal compound and having a density 0.5 to 80% that of the crystal density is used. When the target is irradiated with a laser beam, plasma of the heavy metal contained in the target is generated, and extreme ultraviolet light having a predetermined wavelength which corresponds to the kind of the heavy metal is emitted from the plasma. When the density of the target is made to be smaller than the crystal density as described above, space distribution of the density of the generated plasma can be controlled, and the region in which plasma absorbs energy of the laser beam overlaps the region in which the plasma emits the extreme ultraviolet light. Thus, emission efficiency can be improved, preventing energy loss.

Abstract: An object of the present invention is to provide an extreme ultraviolet light source target which can emits extreme ultraviolet light with high emission efficiency. A solid target made of heavy metal or heavy-metal compound and having a density 0.5 to 80% that of the crystal density is used. When the target is irradiated with a laser beam, plasma of the heavy metal contained in the target is generated, and extreme ultraviolet light having a predetermined wavelength which corresponds to the kind of the heavy metal is emitted from the plasma. When the density of the target is made to be smaller than the crystal density as described above, space distribution of the density of the generated plasma can be controlled, and the region in which plasma absorbs energy of the laser beam overlaps the region in which the plasma emits the extreme ultraviolet light. Thus, emission efficiency can be improved, preventing energy loss.