Abstract: A thermal interface material for transferring heat by interposing between two materials may include a graphite film. The graphite film may have a thickness of 1 ?m to 50 ?m, a density of 1.40 g/cm3 to 2.26 g/cm3, a thermal conductivity of 500 W/mK to 2000 W/mK in a film plane direction, and an arithmetic average roughness Ra of 0.1 ?m to 10 ?m on a surface of the graphite film.

Abstract: A thermal interlace material for transferring heat by interposing between two materials may include a graphite film. The graphite film may have a thickness T of 200 nm to 3 ?m, and a ratio Ra/T of an arithmetic average roughness Ra on a surface of the graphite film to the thickness T of the graphite film, may be 0.1 to 30.

Abstract: An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25° C., and a film thickness of the carbon film is more than 3 ?m and less than 10 ?m.

Abstract: Provided is a target plate for radioisotope production that has sufficient durability and sufficient heat resistance for use in radioisotope production and that is capable of reducing the extent of radioactivation. In a target plate for radioisotope production, a support substrate, which supports a target, includes a graphite film(s). The thermal conductivity in a surface direction of the graphite film(s) is 1200 W/(m·K) or greater, and the thickness of the graphite film(s) is 0.05 ?m or greater and 100 ?m or less.

Abstract: A beam intensity converting film that has sufficient shielding property, sufficient durability, and sufficient heat resistance and that can reduce the extent of radioactivation. An attenuator is constituted by a graphite film placed such that a surface thereof intersects the beam axis of a charged particle beam, the graphite film has a thickness of 1 ?m or greater, and the thermal conductivity in a surface direction of the graphite film is equal to or greater than 20 times the thermal conductivity in the thickness direction of the graphite film.

Abstract: In order to attain an object to achieve a graphite sheet processed product which is made of high quality graphite and which has a smooth cut surface even after being subjected to a cut process, a graphite sheet processed product of the present invention has a thickness of not less than 10 nm and not more than 20 ?m, has a cross-sectional area 90% or more of which is occupied by graphite layers each extending continuously or discontinuously in a horizontal direction, the cross-sectional area being observed with use of a scanning electron microscope (SEM), includes therein graphite crystal having an average crystal grain size of not less than 0.35 ?m and not more than 25 ?m, and has, on a cut surface thereof, a burr having a size that is not more than 15% of a line width thereof, the line width being less than 400 ?m.

Abstract: An object of the present invention is to realize a target, for neutron-beam or proton-beam irradiation, that can withstand prolonged beam irradiation. A target for proton-beam or neutron-beam, comprising a graphite film (A) having a thermal conductivity of 500 W/mK or more in a direction parallel to an a-b plane of a graphite layer at 25° C.; and a layer (B) of a starting material for producing a radioactive substance, and being a laminate of the graphite film (A) and the layer (B). A density of the graphite film (A) is preferably 1.8 to 2.26 g/cm3. A tensile strength of the graphite film (A) is preferably 5 MPa or more.

Abstract: A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25° C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 ?m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 1×10?5/K, and an area of at least 4 cm2.

Abstract: A thermal interface material under a high vacuum condition includes a graphite sheet having a thickness of from 9.6 ?m to 50 nm and a thermal conductivity in an a-b surface direction at 25° C. of not less than 1000 W/mK.

Abstract: A thermal interface material for transferring heat by interposing between two materials may include a graphite film and a fluid substance. The graphite film may have a thickness of 100 nm to 15 ?m, and a weight ratio of the fluid substance to the graphite film may be 0.08 to 25.

Abstract: A thermal interface material for transferring heat by interposing between two materials may include a graphite film. The graphite film may have a thickness of 1 ?m to 50 ?m, a density of 1.40 g/cm3 to 2.26 g/cm3, a thermal conductivity of 500 W/mK to 2000 W/mK in a film plane direction, and an arithmetic average roughness Ra of 0.

Abstract: A thermal interlace material for transferring heat by interposing between two materials may include a graphite film. The graphite film may have a thickness T of 200 nm to 3 ?m, and a ratio Ra/T of an arithmetic average roughness Ra on a surface of the graphite film to the thickness T of the graphite film, may be 0.1 to 30.

Abstract: In order to attain an object to achieve a graphite sheet processed product which is made of high quality graphite and which has a smooth cut surface even after being subjected to a cut process, a graphite sheet processed product of the present invention has a thickness of not less than 10 nm and not more than 20 ?m, has a cross-sectional area 90% or more of which is occupied by graphite layers each extending continuously or discontinuously in a horizontal direction, the cross-sectional area being observed with use of a scanning electron microscope (SEM), includes therein graphite crystal having an average crystal grain size of not less than 0.35 ?m and not more than 25 ?m, and has, on a cut surface thereof, a burr having a size that is not more than 15% of a line width thereof, the line width being less than 400 ?m.

Abstract: Provided is an energy degrader including an attenuation member that becomes radioactive only to a lesser extent than conventional attenuation members. An attenuation member (11) is a graphite film, the graphite film has a thermal conductivity, in a surface direction, of 1200 W/(m·K) or greater, and the graphite film has a thickness of 0.1 ?m or greater and 50 ?m or less.

Abstract: An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25° C., and a film thickness of the carbon film is more than 3 ?m and less than 10 ?m.

Abstract: A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 ?m to 150 ?m, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and has a film thickness of 10 ?m to 150 ?m, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%.

Abstract: A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25° C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 ?m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 1×10?5/K, and an area of at least 4 cm2.

Abstract: Provided is a target that is sufficiently durable and sufficiently heat-resistant for use as a target for an accelerator and that can reduce the extent of radioactivation. A target (A) of the present invention includes: a metal film (3); and a substrate constituted by a graphite film (4). The graphite film (4) has a thermal conductivity in a surface direction of 1600 W/(m·K) or greater, the thermal conductivity in the surface direction of the graphite film (4) is equal to or greater than 100 times a thermal conductivity in a thickness direction of the graphite film (4), and the graphite film (4) has a thickness of 1 ?m or greater and 100 ?m or less.

Abstract: Provided is a beam intensity converting film that has sufficient shielding property, sufficient durability, and sufficient heat resistance and that can reduce the extent of radioactivation. An attenuator is constituted by a graphite film placed such that a surface thereof intersects the beam axis of a charged particle beam, the graphite film has a thickness of 1 ?m or greater, and the thermal conductivity in a surface direction of the graphite film is equal to or greater than 20 times the thermal conductivity in the thickness direction of the graphite film.

Abstract: Provided is a target plate for radioisotope production that has sufficient durability and sufficient heat resistance for use in radioisotope production and that is capable of reducing the extent of radioactivation. In a target plate (10) for radioisotope production, a support substrate (2), which supports a target (1), includes a graphite film(s). The thermal conductivity in a surface direction of the graphite film(s) is 1200 W/(m·K) or greater, and the thickness of the graphite film(s) is 0.05 ?m or greater and 100 ?m or less.