Abstract: A thin conductive film which excels in film strength, weather resistance, transparency, and electric field shielding effect is formed on a glass substrate at a low temperature as a multilayer film which is formed of an ITO-dispersed silicate layer and an overcoat silicate layer, or at least two layers of an ITO dispersed silicate and a high-conductivity oxide-dispersed silicate, and a topmost layer of an overcoat silicate. The ITO dispersed silicate layer includes ultra fine particles of indium tin oxide and a silicate-based glass matrix, and the high-conductivity oxide-dispersed silicate layer consists of includes ultra fine particles selected from the group of ruthenium dioxide, rhenium trioxide, iridium dioxide, rhodium dioxide and irridium-based pyrochlore and a silicate-based glass matrix.

Abstract: A coating solution for forming a transparent and electrically conductive film contains fine conductive metal or alloy particles dispersed in a polar solvent and having a diameter not exceeding 50 nm. The metal particles are of silver and at least one of palladium, copper and gold. The alloy particles are of an alloy of silver with at least one of palladium, copper and gold. The solution permits the use of a baking temperature which is as low as 150.degree.-450.degree. C.