Abstract: The invention provides a method for producing radiolabeled tyrosine derivatives with good purity and stability, by a safe method suitable for industrial production of pharmaceuticals. The invention relates to a method for producing Compound (5) and Radiolabeled Compound (6) as follows: wherein each symbol is as defined in the description.

Abstract: An information processing system includes a server, a client, and a tag reader. The server and the client are connected via a network. The tag reader includes: a reading unit that reads an endoscope ID assigned to a single-use endoscope; and a transmitting unit that transmits the endoscope ID read by the reading unit to the client. The client includes: a receiving unit that receives the endoscope ID transmitted from the transmitting unit; and a use information transmitting unit that transmits use information on the endoscope based on the endoscope ID received by the receiving unit. The server includes a use information acquisition unit that acquires the use information transmitted from the use information transmitting unit.

Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 ?m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Abstract: A device, system, and method that: acquires information that a sterilized endoscope, having reusable and non-reusable parts, is used; outputs an instruction for collecting the used endoscope from a medical institution; acquires information on the number of endoscopes scheduled for inspection, a predetermined number of endoscopes not scheduled for inspection, and the number of endoscopes in an endoscope inventory; outputs an instruction for delivering a non-used replaceable endoscope to the institution in response to the collection instruction; and outputs an instruction for delivering a non-used endoscope to the institution when equation (2) is not satisfied, equation (2) being: endoscope inventory quantity>number of endoscopes scheduled for inspection+predetermined number.

Abstract: The invention provides a method for producing a synthetic quartz glass substrate, the method includes arranging spacers to be in contact with outer peripheral side surfaces of a synthetic quartz glass substrate, arranging plate materials to be in contact with the outer peripheral side surfaces of the spacers in a state that the plates are protruded from the surface of the substrate, and sandblasting the surface of the substrate.

Abstract: To provide an information processing method that reduces the burden on a health-care personnel engaging in endoscopic examination. An information processing method includes acquiring use information indicating that a sterilized endoscope in which a reusable part that is able to be used repeatedly and a non-reusable part that is able to be used only once are combined is used, outputting a collection instruction for collecting the endoscope corresponding to the acquired use information from the medical institution, and outputting a delivery instruction for delivering a non-used replaceable endoscope to the medical institution.

Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 ?m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 ?m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Abstract: Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.

Abstract: There is furnished a working tool comprising a rotating shaft (6), a polishing plate (3) mounted on the shaft, an expandable elastomer sheet (4) attached to the polishing plate (3), an abrasive cloth (5) attached to the elastomer sheet (4), and means for pressing the elastomer sheet (4) at a plurality of positions under respective predetermined different pressures such that a lower surface of the abrasive cloth (5) is deformed to the desired inverted convex shape in accordance with differences of pressing force applied to the elastomer sheet (4) at the plurality of positions. A substrate is produced by bringing the inverted convexly deformed surface of the abrasive cloth (5) in contact with a substrate stock, and rotating and moving the working tool for polishing the substrate over a selected area.

Abstract: The invention provides a method for producing a synthetic quartz glass substrate, the method includes arranging spacers to be in contact with outer peripheral side surfaces of a synthetic quartz glass substrate, arranging plate materials to be in contact with the outer peripheral side surfaces of the spacers in a state that the plates are protruded from the surface of the substrate, and sandblasting the surface of the substrate.

Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 ?m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Abstract: A substrate is prepared by polishing a surface of the substrate using a polishing pad while feeding a slurry. The polishing pad has a porous nap layer which comes in contact with the substrate surface and is made of a base resin comprising at least three resins, typically an ether resin, ester resin, and polycarbonate resin. The polished substrate has a highly flat surface with a minimal number of defects.

Abstract: Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

Abstract: There is furnished a working tool comprising a rotating shaft (6), a polishing plate (3) mounted on the shaft, an expandable elastomer sheet (4) attached to the polishing plate (3), an abrasive cloth (5) attached to the elastomer sheet (4), and means for pressing the elastomer sheet (4) at a plurality of positions under respective predetermined different pressures such that a lower surface of the abrasive cloth (5) is deformed to the desired inverted convex shape in accordance with differences of pressing force applied to the elastomer sheet (4) at the plurality of positions. A substrate is produced by bringing the inverted convexly deformed surface of the abrasive cloth (5) in contact with a substrate stock, and rotating and moving the working tool for polishing the substrate over a selected area.

Abstract: Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.

Abstract: Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

Abstract: A large-size synthetic quartz glass substrate is produced by measuring a flatness and parallelism of front and back surfaces of a synthetic quartz glass substrate stock having a diagonal length of at least 1,000 mm, and partially removing raised portions and thick portions of the substrate stock on the basis of the measured data of flatness and parallelism. The removing step includes abrasive working by a first working tool having a diameter of 15-50% of the diagonal length, and abrasive working by a second working tool having a smaller diameter.

Abstract: A large-size synthetic quartz glass substrate is produced by measuring a flatness and parallelism of front and back surfaces of a synthetic quartz glass substrate stock having a diagonal length of at least 1,000 mm, and partially removing raised portions and thick portions of the substrate stock on the basis of the measured data of flatness and parallelism. The removing step includes abrasive working by a first working tool having a diameter of 15-50% of the diagonal length, and abrasive working by a second working tool having a smaller diameter.

Abstract: Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.