Abstract: A component comprises a film containing yttrium oxide. A cross section of the film has a first portion, a second portion, and a third portion, and the first to third portions are separated from each other by 0.5 mm or more. A Vickers hardness B1 measured in the first portion, a Vickers hardness B2 measured in the second portion, a Vickers hardness B3 measured in the third portion, and an average value A of the Vickers hardnesses B1 to B3 are numbers satisfying 0.8A?B1?1.2A, 0.8A?B2?1.2A, and 0.8A?B3?1.2A.

Abstract: A resonant pressure sensor includes a first substrate and a resonator. The first substrate includes a diaphragm and a projection disposed on the diaphragm. The resonator is disposed in the first substrate, a part of the resonator being included in the projection, and the resonator being disposed between a top of the projection and an intermediate level of the first substrate. The first substrate is an SOI substrate in which a silicon dioxide layer is inserted between a silicon substrate and a superficial silicon layer. The intermediate level of the first substrate is disposed in the silicon substrate, and the resonator is disposed in the projection included in the superficial silicon layer.

Abstract: A resonant pressure sensor with improved linearity includes: a substrate including a substrate-separated portion separated from a housing-fixed portion; a first resonator that: is disposed in the substrate-separated portion; and detects a change of a first resonance frequency based on a strain in the substrate caused by static pressure applied by a pressure-receiving fluid; a second resonator that: is disposed in the substrate; detects a change of a second resonance frequency based on the strain in the substrate; and has a pressure sensitivity of the second resonance frequency; and a processor that: measures the static pressure based on the detected change of the first resonance frequency; and corrects the static pressure according to internal temperature of the pressure sensor based on a difference between the second resonance frequency and the first resonance frequency.

Abstract: A resonant pressure sensor with improved linearity includes: a substrate including a substrate-separated portion separated from a housing-fixed portion; a first resonator that: is disposed in the substrate-separated portion; and detects a change of a first resonance frequency based on a strain in the substrate caused by static pressure applied by a pressure-receiving fluid; a second resonator that: is disposed in the substrate; detects a change of a second resonance frequency based on the strain in the substrate; and has a pressure sensitivity of the second resonance frequency; and a processor that: measures the static pressure based on the detected change of the first resonance frequency; and corrects the static pressure according to internal temperature of the pressure sensor based on a difference between the second resonance frequency and the first resonance frequency.

Abstract: A resonant pressure sensor with improved linearity includes a substrate including a substrate-fixed portion fixed to a housing-fixed portion and a substrate-separated portion separated from the housing-fixed portion in a first direction; a first resonator disposed in the substrate-separated portion to detect a change of a resonance frequency based on a strain caused by static pressure applied by a pressure-receiving fluid interposed in a gap between the housing-fixed portion and the substrate; a first electrode extending along a second direction to output an excitation signal to the first resonator; a second electrode that extends along the second direction and from which the first resonator outputs a signal having the resonance frequency; and a processor that measures the static pressure based on the detected change.

Abstract: An aluminum nitride film includes a polycrystalline aluminum nitride. A withstand voltage of the aluminum nitride film is 100 kV/mm or more.

Abstract: A resonant pressure sensor includes: a housing; a housing-fixed portion that is fixed to the housing; a substrate that comprises: a substrate-fixed portion that is fixed to the housing-fixed portion; and a substrate-separated portion that is separated from the housing-fixed portion in a first direction and extends from the substrate-fixed portion; a first resonator that is disposed in the substrate-separated portion and that detects a change of a resonance frequency based on a strain in the substrate caused by static pressure applied by a pressure-receiving fluid; a first electrode that extends along a second direction perpendicular to the first direction and that outputs an excitation signal to the first resonator to excite the first resonator; and a second electrode that extends along the second direction and from which the first resonator outputs a signal having the resonance frequency.

Abstract: A resonant pressure sensor has high linearity and includes: a housing; and a pressure sensing unit that detects a static pressure based on a change value of a resonance frequency and includes: a housing-fixed portion; a substrate that includes a substrate-fixed portion and a substrate-separated portion; the pressure-receiving fluid that is interposed in a gap between the housing-fixed portion and the substrate and envelops the substrate; and a first resonator that is disposed in the substrate-separated portion and detects the change value of the resonance frequency based on a strain in the substrate caused by the static pressure applied by the pressure-receiving fluid, wherein the first resonator is made of a semiconductor material including an impurity, a concentration of the impurity is 1×1020 (cm?3) or higher, and an atomic radius of the impurity is smaller than an atomic radius of the semiconductor material.

Abstract: A resonant pressure sensor includes a first substrate and a resonator. The first substrate includes a diaphragm and a projection disposed on the diaphragm. The resonator is disposed in the first substrate, a part of the resonator being included in the projection, and the resonator being disposed between a top of the projection and an intermediate level of the first substrate. The first substrate is an SOI substrate in which a silicon dioxide layer is inserted between a silicon substrate and a superficial silicon layer. The intermediate level of the first substrate is disposed in the silicon substrate, and the resonator is disposed in the projection included in the superficial silicon layer.

Abstract: A resonant pressure sensor includes a first substrate including a diaphragm and at least one projection disposed on the diaphragm, and at least one resonator disposed in the first substrate, at least a part of the resonator being included in the projection, and the resonator being disposed between a top of the projection and an intermediate level of the first substrate.

Abstract: A resonant transducer includes a resonant beam which is formed on a semiconductor substrate, a support beam of which one end is connected to a part of the resonant beam at a predetermined angle, a first electrode which is connected to the resonant beam via the support beam, a second electrode which is disposed adjacent to a center of one side surface of the resonant beam, and a conductor which is disposed between the support beam and the second electrode, the conductor being connected to the first electrode.

Abstract: An aluminum nitride film includes a polycrystalline aluminum nitride. A withstand voltage of the aluminum nitride film is 100 kV/mm or more.

Abstract: What is provided is a secondary cooling device for continuous casting that is configured to cool a slab, which is sent in a casting direction, by spraying cooling water to the slab surface. The secondary cooling device for continuous casting includes a plurality of rolls disposed side by side in the vertical direction along a casting direction and a spray nozzle configured to spray the cooling water to the slab surface from between the plurality of rolls.

Abstract: A sensor includes: a pressure vessel filled with an enclosed liquid; a diaphragm that seals the pressure vessel; a sensor body contained in the pressure vessel; an electric wire comprising a wiring electrically connected to the sensor body; a fixture that fixes the electric wire to the pressure vessel; a first fillet at a joining portion between the electric wire and the fixture, wherein the first fillet contacts the enclosed liquid; and a second fillet at a joining portion between the fixture and the pressure vessel, wherein the second fillet contacts the enclosed liquid.

Abstract: An resonant pressure sensor, includes: a housing; a housing-fixed portion that is fixed to the housing; a substrate that includes a substrate-fixed portion that is fixed to the housing-fixed portion and a substrate-separated portion that is separated from the housing-fixed portion and extends from the substrate-fixed portion; a first resonator that is disposed in the substrate-separated portion and that detects a change of a resonance frequency based on a strain in the substrate caused by static pressure applied by the pressure-receiving fluid; and a processor. A pressure-receiving fluid is interposed in a gap between the housing-fixed portion and the substrate and envelops the substrate. The processor measures the static pressure based on the detected change of the resonance frequency.

Abstract: A component comprises a film containing yttrium oxide. A cross section of the film has a first portion, a second portion, and a third portion, and the first to third portions are separated from each other by 0.5 mm or more. A Vickers hardness B1 measured in the first portion, a Vickers hardness B2 measured in the second portion, a Vickers hardness B3 measured in the third portion, and an average value A of the Vickers hardnesses B1 to B3 are numbers satisfying 0.8A?B1?1.2A, 0.8A?B2?1.2A, and 0.8A?B3?1.2A.

Abstract: The present invention relates to a cleaner for an endoscope, the cleaner being used inside a living body during an endoscopic, surgical procedure. In particular, an object of the present invention is to reduce the burden on a physician and the patient during an endoscopic surgical procedure. The present invention therefore relates to a cleaner for cleaning debris from an endoscope and/or endoscopic accessories, such as an endoscope lens and/or an endoscope hood (attachment), inside a living body. The present invention also relates to an antifoulant for antifouling treatment of an endoscope and/or endoscopic accessories. The antifoulant may comprise, for example, (i) a nonionic surfactant with an HLB of 1 to 11 and (ii) a nonionic surfactant with an HLB of 11 to 20.

Abstract: A sensor includes: a pressure vessel filled with an enclosed liquid; a diaphragm that seals the pressure vessel; a sensor body contained in the pressure vessel; an electric wire comprising a wiring electrically connected to the sensor body; a fixture that fixes the electric wire to the pressure vessel; a first fillet at a joining portion between the electric wire and the fixture, wherein the first fillet contacts the enclosed liquid; and a second fillet at a joining portion between the fixture and the pressure vessel, wherein the second fillet contacts the enclosed liquid.

Abstract: An aluminum nitride film includes a polycrystalline aluminum nitride. A withstand voltage of the aluminum nitride film is 100 kV/mm or more.

Abstract: A resonant transducer includes a resonant beam which is formed on a semiconductor substrate, a support beam of which one end is connected to a part of the resonant beam at a predetermined angle, a first electrode which is connected to the resonant beam via the support beam, a second electrode which is disposed adjacent to a center of one side surface of the resonant beam, and a conductor which is disposed between the support beam and the second electrode, the conductor being connected to the first electrode.