Patents by Inventor Atsusi Kurobe

Atsusi Kurobe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5985708
    Abstract: A semiconductor apparatus comprising a vertical type semiconductor device having a first conducting type semiconductor substrate, a drain layer formed on the surface of the semiconductor substrate, a drain electrode formed on the surface of the drain layer, a second conducting type base layer selectively formed on the surface of the semiconductor substrate opposite to the drain layer, a first conducting type source layer selectively formed on the surface of the second conducting type base layer, a source electrode formed on the first conducting type source layer and the second conducting type base layer, and a gate electrode formed in contact with the first conducting type source layer, the second conducting type base layer and the semiconductor substrate through a gate insulating film and a lateral semiconductor device having an insulating layer formed in a region of the surface of the semiconductor substrate different from the second conducting type base layer, and a polycrystalline semiconductor layer form
    Type: Grant
    Filed: March 13, 1997
    Date of Patent: November 16, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akio Nakagawa, Naoharu Sugiyama, Tomoko Matsudai, Norio Yasuhara, Atsusi Kurobe, Hideyuki Funaki, Yusuke Kawaguchi, Yoshihiro Yamaguchi