Patents by Inventor Atsutoshi Yamada

Atsutoshi Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask for sputtering
    Patent number: 6555233
    Abstract: In a sputtering process of forming a transparent electrode film (13) on a color filter (14), the dielectric breakdown of a peripheral portion of the color pattern film (10) due to abnormal discharge is prevented. A metal mask (8) has a mask body (8b) provided with openings (8a) having a shape corresponding to that of the color pattern films (10) formed on a glass substrate (9) Stepped portions (8d) are formed by recessing brim portions (8c) of the openings (8a) facing the color filters (14). Gaps (11) are formed between the mask body (8b) and peripheral portions of the color pattern films (10) of the color filters (14). The mask body (8b) is provided on the stepped portions (8d) with conductive projections (12). The conductive projections (12) come into electrical contact with black shading strips (10b) formed in the peripheral portions of the color pattern films (10) of the color filters (14).
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: April 29, 2003
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Akira Shishido, Atsutoshi Yamada
  • Mask for sputtering
    Publication number: 20020011406
    Abstract: In a sputtering process of forming a transparent electrode film (13) on a color filter (14), the dielectric breakdown of a peripheral portion of the color pattern film (10) due to abnormal discharge is prevented. A metal mask (8) has a mask body (8b) provided with openings (8a) having a shape corresponding to that of the color pattern films (10) formed on a glass substrate (9) Stepped portions (8d) are formed by recessing brim portions (8c) of the openings (8a) facing the color filters (14). Gaps (11) are formed between the mask body (8b) and peripheral portions of the color pattern films (10) of the color filters (14). The mask body (8b) is provided on the stepped portions (8d) with conductive projections (12). The conductive projections (12) come into electrical contact with black shading strips (10b) formed in the peripheral portions of the color pattern films (10) of the color filters (14).
    Type: Application
    Filed: October 5, 2001
    Publication date: January 31, 2002
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Akira Shishido, Atsutoshi Yamada
  • Mask for sputtering
    Patent number: 6325902
    Abstract: In a sputtering process of forming a transparent electrode film (13) on a color filter (14), the dielectric breakdown of a peripheral portion of the color pattern film (10)due to abnormal discharge is prevented. A metal mask (8) has a mask body (8b) provided with openings (8a) having a shape corresponding to that of the color pattern films (10) formed on a glass substrate (9) Stepped portions (8d) are formed by recessing brim portions (8c) of the openings (8a) facing the color filters (14). Gaps (11) are formed between the mask body (8b) and peripheral portions of the color pattern films (10) of the color filters (14). The mask body (8b) is provided on the stepped portions (8d) with conductive projections (12). The conductive projections (12) come into electrical contact with black shading strips (10b) formed in the peripheral portions of the color pattern films (10) of the color filters (14).
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: December 4, 2001
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Akira Shishido, Atsutoshi Yamada