Patents by Inventor Atsuyo Watanabe

Atsuyo Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma etching gas and plasma etching method
    Patent number: 9296947
    Abstract: The present invention is an etching gas comprising an unsaturated fluorohydrocarbon represented by CxHyFz (wherein x=3, 4, or 5, y+z?2x, and y>z) and a method comprising selectively etching a silicon nitride film relative to a silicon oxide film or a silicon film using the etching gas. According to the present invention, a silicon nitride film stacked on a silicon oxide film or a silicon film can be highly selectively etched.
    Type: Grant
    Filed: March 27, 2012
    Date of Patent: March 29, 2016
    Assignee: ZEON CORPORATION
    Inventors: Azumi Ito, Atsuyo Watanabe