Patents by Inventor Atsuyo Yamazaki

Atsuyo Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PLASMA ETCHING GAS AND PLASMA ETCHING METHOD
    Publication number: 20140306146
    Abstract: The present invention is an etching gas comprising an unsaturated fluorohydrocarbon represented by CxHyFz (wherein x=3, 4, or 5, y+z?2x, and y>z) and a method comprising selectively etching a silicon nitride film relative to a silicon oxide film or a silicon film using the etching gas. According to the present invention, a silicon nitride film stacked on a silicon oxide film or a silicon film can be highly selectively etched.
    Type: Application
    Filed: March 27, 2012
    Publication date: October 16, 2014
    Applicant: ZEON CORPORATION
    Inventors: Azumi Ito, Atsuyo Yamazaki