Patents by Inventor Atul Bhaskar Chaudhari

Atul Bhaskar Chaudhari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12222543
    Abstract: Disclosed is a nanoimprintable resin for use in optical waveguide applications. The nanoimprintable resin includes a base resin, metal oxide nanoparticles, and a photoinitiator. A cured film of the nanoimprintable resin exhibits a refractive index greater than or equal to 1.8 (589 nm), such as 1.9 (599 nm), according to ASTM D1218-21 at 25° C.
    Type: Grant
    Filed: November 18, 2022
    Date of Patent: February 11, 2025
    Assignee: Microsoft Technology Licensing, LLC
    Inventors: Atul Bhaskar Chaudhari, Klaus Henrik Valtteri Kalima, Mervi Kaarina Ylä-Jarkko, Pasi Petteri Heinonen
  • Patent number: 12006442
    Abstract: A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: June 11, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Atul Bhaskar Chaudhari, Sivapackia Ganapathiappan, Srobona Sen
  • Publication number: 20240168227
    Abstract: Disclosed is a nanoimprintable resin for use in optical waveguide applications. The nanoimprintable resin includes a base resin, metal oxide nanoparticles, and a photoinitiator. A cured film of the nanoimprintable resin exhibits a refractive index greater than or equal to 1.8 (589 nm), such as 1.9 (599 nm), according to ASTM D1218-21 at 25° C.
    Type: Application
    Filed: November 18, 2022
    Publication date: May 23, 2024
    Inventors: Atul Bhaskar CHAUDHARI, Klaus Henrik Valtteri KALIMA, Mervi Kaarina YLÄ-JARKKO, Pasi Petteri HEINONEN
  • Publication number: 20210071017
    Abstract: A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.
    Type: Application
    Filed: November 12, 2019
    Publication date: March 11, 2021
    Inventors: Atul Bhaskar Chaudhari, Sivapackia Ganapathiappan, Srobona Sen
  • Publication number: 20210069860
    Abstract: A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.
    Type: Application
    Filed: November 12, 2019
    Publication date: March 11, 2021
    Inventors: Atul Bhaskar Chaudhari, Sivapackia Ganapathiappan, Srobona Sen