Patents by Inventor Atul Chaudhari

Atul Chaudhari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HALOGEN RESISTANT COATINGS AND METHODS OF MAKING AND USING THEREOF
    Publication number: 20230279541
    Abstract: Described herein are articles, systems and methods where a halogen resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The halogen resistant coating has an optional amorphous seed layer and a transition metal-containing layer. The halogen resistant coating uniformly covers features of the chamber component, such as those having an aspect ratio of about 3:1 to about 300:1.
    Type: Application
    Filed: March 16, 2023
    Publication date: September 7, 2023
    Inventors: Prerna Goradia, Jennifer Y. Sun, Xiaowei Wu, Geetika Bajaj, Atul Chaudhari, Ankur Kadam
  • Halogen resistant coatings and methods of making and using thereof
    Patent number: 11639547
    Abstract: Described herein are articles, systems and methods where a halogen resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The halogen resistant coating has an optional amorphous seed layer and a transition metal-containing layer. The halogen resistant coating uniformly covers features of the chamber component, such as those having an aspect ratio of about 3:1 to about 300:1.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: May 2, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Prerna Goradia, Jennifer Y. Sun, Xiaowei Wu, Geetika Bajaj, Atul Chaudhari, Ankur Kadam
  • HALOGEN RESISTANT COATINGS AND METHODS OF MAKING AND USING THEREOF
    Publication number: 20190338418
    Abstract: Described herein are articles, systems and methods where a halogen resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The halogen resistant coating has an optional amorphous seed layer and a transition metal-containing layer. The halogen resistant coating uniformly covers features of the chamber component, such as those having an aspect ratio of about 3:1 to about 300:1.
    Type: Application
    Filed: May 2, 2019
    Publication date: November 7, 2019
    Inventors: Prerna Goradia, Jennifer Y. Sun, Xiaowei Wu, Geetika Bajaj, Atul Chaudhari, Ankur Kadam