Patents by Inventor Audrey Brown

Audrey Brown has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12013330
    Abstract: An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: June 18, 2024
    Assignees: Illumina, Inc., Illumina Cambridge Limited
    Inventors: Timothy J. Merkel, Wayne N. George, Andrew A. Brown, Audrey Zak, Gianluca Andrea Artioli, Julia Morrison, Nikolai Romanov, Lorenzo Berti, Graham Boud
  • Publication number: 20240132954
    Abstract: An example of a resin composition includes a free radical curable resin matrix including an acrylate and a siloxane, and a free radical photoinitiator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
    Type: Application
    Filed: December 29, 2023
    Publication date: April 25, 2024
    Inventors: Timothy J. Merkel, Wayne N. George, Andrew A. Brown, Audrey Zak, Gianluca Andrea Artioli, Julia Morrison, Nikolai Romanov, Lorenzo Berti, Graham Boud
  • Patent number: 11932900
    Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
    Type: Grant
    Filed: October 25, 2022
    Date of Patent: March 19, 2024
    Assignees: Illumina, Inc., Illumina Cambridge Limited
    Inventors: Wayne N. George, Alexandre Richez, M. Shane Bowen, Andrew A. Brown, Dajun Yuan, Audrey Rose Zak, Sean M. Ramirez, Raymond Campos
  • Publication number: 20120137408
    Abstract: A neck protecting scarf having a central elastic section that contracts to provide a secure grip around a person's neck. The upper and lower portions of the neck protecting scarf flare to accommodate the person's face and shoulders. The neck protecting scarf is secured via fasteners, such as buttons and loops, with the top button/loop being placed such that it provides for a closer fit to the person's face than the lower button/loop, which allows wider flaring at the bottom for the person's shoulders. The neck protecting scarf may include a fixed or removable shawl, or may include a fixed or removable hood, thereby protecting a person's neck and torso from cold conditions.
    Type: Application
    Filed: December 6, 2010
    Publication date: June 7, 2012
    Inventor: Audrey Brown