Abstract: A spintronic device may include at least one superlattice and at least one electrical contact coupled thereto, with the at least one superlattice including a plurality of groups of layers. Each group of layers may include a plurality of stacked base semiconductor monolayers defining a base semiconductor portion having a crystal lattice, at least one non-semiconductor monolayer constrained within the crystal lattice of adjacent base semiconductor portions, and a spintronic dopant. The spintronic dopant may be constrained within the crystal lattice of the base semiconductor portion by the at least one non-semiconductor monolayer. In some embodiments, the repeating structure of a superlattice may not be needed.

Abstract: A semiconductor device may include a first monocrystalline layer comprising a first material having a first lattice constant. A second monocrystalline layer may include a second material having a second lattice constant different than the first lattice constant. The device may also include a lattice matching layer between the first and second monocrystalline layers and comprising a superlattice. The superlattice may include a plurality of groups of layers, and each group of layers may include a plurality of stacked semiconductor monolayers defining a semiconductor base portion and at least one non-semiconductor monolayer thereon. The at least one non-semiconductor monolayer may be constrained within a crystal lattice of adjacent base semiconductor portions, and at least some semiconductor atoms from opposing base semiconductor portions may be chemically bound together through the at least one non-semiconductor monolayer therebetween.

Abstract: A method for making an electronic device may include forming a selectively polable superlattice comprising a plurality of stacked groups of layers. Each group of layers of the selectively polable superlattice may include a plurality of stacked semiconductor monolayers defining a semiconductor base portion and at least one non-semiconductor monolayer thereon. The at least one non-semiconductor monolayer may be constrained within a crystal lattice of adjacent silicon portions, and at least some semiconductor atoms from opposing base semiconductor portions may be chemically bound together through the at least one non-semiconductor monolayer therebetween. The method may further include coupling at least one electrode to the selectively polable superlattice for selective poling thereof.

Abstract: A method for making an electronic device may include forming a poled superlattice comprising a plurality of stacked groups of layers and having a net electrical dipole moment. Each group of layers of the poled superlattice may include a plurality of stacked semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer thereon. The at least one non-semiconductor monolayer may be constrained within a crystal lattice of adjacent base semiconductor portions, and at least some semiconductor atoms from opposing base semiconductor portions may be chemically bound together through the at least one non-semiconductor monolayer therebetween. The method may further include coupling at least one electrode to the poled superlattice.

Abstract: An electronic device may include a poled superlattice comprising a plurality of stacked groups of layers and having a net electrical dipole moment. Each group of layers of the poled superlattice may include a plurality of stacked semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer thereon. The at least one non-semiconductor monolayer may be constrained within a crystal lattice of adjacent base semiconductor portions, and at least some semiconductor atoms from opposing base semiconductor portions may be chemically bound together through the at least one non-semiconductor monolayer therebetween. The electronic device may further include at least one electrode coupled to the poled superlattice.

Abstract: A method for making a semiconductor device may include forming a superlattice comprising a plurality of stacked groups of layers adjacent a substrate. Each group of layers of the superlattice may include a plurality of stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The method may further include forming a high-K dielectric layer on the electrode layer, and forming an electrode layer on the high-K dielectric layer and opposite the superlattice.

Abstract: A laser device, in particular a semiconductor laser, emitting optical radiation with a defined mode pattern can be produced from a standard Fabry-Perot (FP) laser by post-processing at the wafer level, i.e. before the wafer is separated into individual dies by cleaving/dicing. A sub-cavity is formed within the FP laser cavity. The sub-cavity has a predetermined length and is located between the FP facets. An aperiodic grating composed of a small number of contrast elements, typically less than 10, with predetermined inter-element separations and predetermined spacings relative to the sub-cavity is formed on or in the optical waveguide. The inter-element separations and the spacings relative to the sub-cavity produce a filtering function of the aperiodic grating for optical radiation propagating in the waveguide. The laser device is suitable for telecommunications applications due to its high side-mode-suppression ratio and narrow-linewidth.

Abstract: A laser device, in particular a semiconductor laser, emitting optical radiation with a defined mode pattern can be produced from a standard Fabry-Perot (FP) laser by post-processing at the wafer level, i.e. before the wafer is separated into individual dies by cleaving/dicing. A sub-cavity is formed within the FP laser cavity. The sub-cavity has a predetermined length and is located between the FP facets. An aperiodic grating composed of a small number of contrast elements, typically less than 10, with predetermined inter-element separations and predetermined spacings relative to the sub-cavity is formed on or in the optical waveguide. The inter-element separations and the spacings relative to the sub-cavity produce a filtering function of the aperiodic grating for optical radiation propagating in the waveguide. The laser device is suitable for telecommunications applications due to its high side-mode-suppression ratio and narrow-linewidth.