Abstract: A method for etching a layer of assembled block copolymer including first and second polymer phases, the etching method including a first step of etching by a first plasma formed from carbon monoxide or a first gas mixture including a fluorocarbon gas and a depolymerising gas, the first etching step being carried out so as to partially etch the first polymer phase and to deposit a carbon layer on the second polymer phase, and a second step of etching by a second plasma formed from a second gas mixture including a depolymerising gas and a gas selected among the carbon oxides and the fluorocarbon gases, the second etching step being carried out so as to etch the first polymer phase and the carbon layer on the second polymer phase.

Abstract: A method for etching a layer of assembled block copolymer including first and second polymer phases, the etching method including a first step of etching by a first plasma formed from carbon monoxide or a first gas mixture including a fluorocarbon gas and a depolymerising gas, the first etching step being carried out so as to partially etch the first polymer phase and to deposit a carbon layer on the second polymer phase, and a second step of etching by a second plasma formed from a second gas mixture including a depolymerising gas and a gas selected among the carbon oxides and the fluorocarbon gases, the second etching step being carried out so as to etch the first polymer phase and the carbon layer on the second polymer phase.

Abstract: A method for etching an assembled block copolymer layer including first and second polymer phases, in which the etching method includes exposing the assembled block copolymer layer to a plasma so as to etch the first polymer phase and simultaneously to deposit a carbon layer on the second polymer phase, wherein the plasma is formed from a gas mixture including a depolymerising gas and an etching gas selected among the hydrocarbons.