Patents by Inventor Aurelie Marie Andree Brizard
Aurelie Marie Andree Brizard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10240250Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.Type: GrantFiled: October 2, 2012Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventors: Thanh Trung Nguyen, Jozef Maria Finders, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Eddy Cornelis Antonius Van der Heijden, Hieronymus Johannus Christiaan Meessen, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Tamara Druzhinina, Jessica Margaretha De Ruiter
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Patent number: 9285676Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.Type: GrantFiled: June 7, 2012Date of Patent: March 15, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Aurelie Marie Andree Brizard, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Henri Marie Joseph Boots, Thanh Trung Nguyen
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Patent number: 9235125Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition including a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.Type: GrantFiled: February 6, 2013Date of Patent: January 12, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Emiel Peeters, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Thanh Trung Nguyen, Oktay Yildirim
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Patent number: 8956804Abstract: A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.Type: GrantFiled: June 7, 2012Date of Patent: February 17, 2015Assignee: ASML Netherlands B.V.Inventors: Aurelie Marie Andree Brizard, Sander Frederik Wuister, Roelof Koole, Emiel Peeters
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Publication number: 20150010869Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition including a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.Type: ApplicationFiled: February 6, 2013Publication date: January 8, 2015Applicant: ASML Netherlands B.V.Inventors: Emiel Peeters, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Thanh Trung Nguyen, Oktay Yildirim
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Publication number: 20140346141Abstract: A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains.Type: ApplicationFiled: December 18, 2012Publication date: November 27, 2014Applicant: ASML Netherlands B.V.Inventors: Aurelie Marie Andree Brizard, Roelof Koole, Emiel Peeters
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Publication number: 20140299575Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.Type: ApplicationFiled: June 7, 2012Publication date: October 9, 2014Applicant: ASML Netherlands B.V.Inventors: Aurelie Marie Andree Brizard, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Henri Marie Joseph Boots, Thanh Trung Nguyen
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Publication number: 20140245948Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.Type: ApplicationFiled: October 2, 2012Publication date: September 4, 2014Applicant: ASML Netherlands B.V.Inventors: Thanh Trung Nguyen, Jozef Maria Finders, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Eddy Cornelis Antonius Van Der Heijden, Hieronymus Johannus Christiaan Meessen, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Tamara Druzhinina, Jessica Marggaretha De Ruiter
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Publication number: 20140113232Abstract: A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.Type: ApplicationFiled: June 7, 2012Publication date: April 24, 2014Applicant: ASML Netherlands B.V.Inventors: Aurelie Marie Andree Brizard, Sander Frederik Wuister, Roel Koole, Emiel Peeters