Patents by Inventor Aurelien Philippe Jean Maclou Botman

Aurelien Philippe Jean Maclou Botman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9044781
    Abstract: Methods of dispensing a small amount of liquid onto a work piece includes in some embodiments known providing a microscopic channel for the liquid to flow from the nanodispenser. In some embodiments, dispensing the liquid includes dispensing the liquid using a nanodispenser have at least one slit extending to the tip. Some methods include controlling the rate of evaporation or the rate of liquid flow to establish an equilibrium producing a bubble of a desired size.
    Type: Grant
    Filed: December 4, 2012
    Date of Patent: June 2, 2015
    Assignee: FEI COMPANY
    Inventors: Aurélien Philippe Jean Maclou Botman, Steven Randolph, Mark W. Utlaut
  • Publication number: 20150099071
    Abstract: Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
    Type: Application
    Filed: October 6, 2014
    Publication date: April 9, 2015
    Applicant: FEI Company
    Inventors: Aurélien Philippe Jean Maclou Botman, Steven Randolph, Milos Toth
  • Publication number: 20150028205
    Abstract: Vapor is provided locally at a sample surface to allow fluorescence of the fluorescent markers in a vacuum chamber. For example, a nanocapillary can dispense a liquid near a region of interest, the liquid evaporating to increase the vapor pressure near the fluorescent markers. The increase in vapor pressure at the fluorescent marker is preferably sufficiently great to prevent deactivation or to reactivate the fluorescent marker, while the overall pressure in the vacuum chamber is preferably sufficiently low to permit charged particle beam operation with little or no additional evacuation pumping.
    Type: Application
    Filed: September 25, 2014
    Publication date: January 29, 2015
    Inventors: Aurélien Philippe Jean Maclou Botman, Cameron James Zachreson
  • Patent number: 8872105
    Abstract: Vapor is provided locally at a sample surface to allow fluorescence of the fluorescent markers in a vacuum chamber. For example, a nanocapillary can dispense a liquid near a region of interest, the liquid evaporating to increase the vapor pressure near the fluorescent markers. The increase in vapor pressure at the fluorescent marker is preferably sufficiently great to prevent deactivation or to reactivate the fluorescent marker, while the overall pressure in the vacuum chamber is preferably sufficiently low to permit charged particle beam operation with little or no additional evacuation pumping.
    Type: Grant
    Filed: February 19, 2013
    Date of Patent: October 28, 2014
    Assignee: FEI Company
    Inventors: Aurélien Philippe Jean Maclou Botman, Cameron James Zachreson
  • Patent number: 8853078
    Abstract: Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
    Type: Grant
    Filed: January 30, 2011
    Date of Patent: October 7, 2014
    Assignee: FEI Company
    Inventors: Aurelien Philippe Jean Maclou Botman, Steven Randolph, Milos Toth
  • Publication number: 20130068611
    Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
    Type: Application
    Filed: September 19, 2011
    Publication date: March 21, 2013
    Applicant: FEI Company
    Inventors: Aurelien Philippe Jean Maclou Botman, Milos Toth, Steven Randolph, David H. Narum
  • Publication number: 20120196440
    Abstract: Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. One the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
    Type: Application
    Filed: January 30, 2011
    Publication date: August 2, 2012
    Applicant: FEI COMPANY
    Inventors: Aurelien Philippe Jean Maclou Botman, Steven Randolph, Milos Toth
  • Patent number: 8168948
    Abstract: The invention relates to a method for producing high-quality samples for e.g. TEM inspection. When thinning samples with e.g. a Focused Ion Beam apparatus (FIB), the sample often oxidizes when taken from the FIB due to the exposure to air. This results in low-quality samples, that may be unfit for further analysis. By forming a passivation layer, preferably a hydrogen passivation layer, on the sample in situ, that is: before taking the sample from the FIB, high quality TEM samples can be produced.
    Type: Grant
    Filed: August 7, 2009
    Date of Patent: May 1, 2012
    Assignee: FEI Company
    Inventors: Aurélien Philippe Jean Maclou Botman, Bert Henning Freitag, Johannes Jacobus Lambertus Mulders
  • Publication number: 20100032567
    Abstract: The invention relates to a method for producing high-quality samples for e.g. TEM inspection. When thinning samples with e.g. a Focused Ion Beam apparatus (FIB), the sample often oxidizes when taken from the FIB due to the exposure to air. This results in low-quality samples, that may be unfit for further analysis. By forming a passivation layer, preferably a hydrogen passivation layer, on the sample in situ, that is: before taking the sample from the FIB, high quality.
    Type: Application
    Filed: August 7, 2009
    Publication date: February 11, 2010
    Applicant: FEI COMPANY
    Inventors: Aurélien Philippe Jean Maclou Botman, Bert Henning Freitag, Johannes Jacobus Lambertus Mulders