Patents by Inventor Austin Casey FAUCETT

Austin Casey FAUCETT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Amorphous carbon layer opening process
    Patent number: 11037784
    Abstract: A method for opening an amorphous carbon layer mask below a hardmask is provided. The opening an amorphous carbon layer mask comprises performing one or more cycles, where each cycle comprises an amorphous carbon layer mask opening phase and a cleaning phase. The amorphous carbon layer mask opening phase comprises flowing an opening gas into a plasma processing chamber, wherein the opening gas comprises an oxygen containing component, creating a plasma from the opening gas, which etches features in the amorphous carbon layer mask, and stopping the flow of the opening gas. The cleaning phase comprises flowing a cleaning gas into the plasma processing chamber, wherein the cleaning gas comprises a hydrogen containing component, a carbon containing component, and a halogen containing component, creating a plasma from the cleaning gas; and stopping the flow of the cleaning gas into the plasma processing chamber.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: June 15, 2021
    Assignee: Lam Research Corporation
    Inventors: Ce Qin, Zhongkui Tan, Yisha Mao, Yansha Jin, Austin Casey Faucett
  • AMORPHOUS CARBON LAYER OPENING PROCESS
    Publication number: 20210035796
    Abstract: A method for opening an amorphous carbon layer mask below a hardmask is provided. The opening an amorphous carbon layer mask comprises performing one or more cycles, where each cycle comprises an amorphous carbon layer mask opening phase and a cleaning phase. The amorphous carbon layer mask opening phase comprises flowing an opening gas into a plasma processing chamber, wherein the opening gas comprises an oxygen containing component, creating a plasma from the opening gas, which etches features in the amorphous carbon layer mask, and stopping the flow of the opening gas. The cleaning phase comprises flowing a cleaning gas into the plasma processing chamber, wherein the cleaning gas comprises a hydrogen containing component, a carbon containing component, and a halogen containing component, creating a plasma from the cleaning gas; and stopping the flow of the cleaning gas into the plasma processing chamber.
    Type: Application
    Filed: January 28, 2019
    Publication date: February 4, 2021
    Inventors: Ce QIN, Zhongkui TAN, Yisha MAO, Yansha JIN, Austin Casey FAUCETT