Patents by Inventor Austin Joseph Akey

Austin Joseph Akey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing thin layers of crystalline or polycrystalline materials
    Patent number: 8969183
    Abstract: Method for making thin crystalline or polycrystalline layers. The method includes electrochemically etching a crystalline silicon template to form a porous double layer thereon, the double layer including a highly porous deeper layer and a less porous shallower layer. The shallower layer is irradiated with a short laser pulse selected to recrystallize the shallower layer resulting in a crystalline layer. Silicon is deposited on the recrystallized shallower layer and the silicon is irradiated with a short laser pulse selected to crystalize the silicon leaving a layer of crystallized silicon on the template. Thereafter, the layer of crystallized silicon is separated from the template. The process of the invention can be used to make optoelectronic devices.
    Type: Grant
    Filed: October 25, 2012
    Date of Patent: March 3, 2015
    Assignees: President and Fellows of Harvard College, Massachusetts Institute of Technology
    Inventors: Mark T. Winkler, Tonio Buonassisi, Riley E. Brandt, Michael J. Aziz, Austin Joseph Akey
  • METHOD FOR PRODUCING THIN LAYERS OF CRYSTALLINE OR POLYCRYSTALLINE MATERIALS
    Publication number: 20130288463
    Abstract: Method for making thin crystalline or polycrystalline layers. The method includes electrochemically etching a crystalline silicon template to form a porous double layer thereon, the double layer including a highly porous deeper layer and a less porous shallower layer. The shallower layer is irradiated with a short laser pulse selected to recrystallize the shallower layer resulting in a crystalline layer. Silicon is deposited on the recrystallized shallower layer and the silicon is irradiated with a short laser pulse selected to crystalize the silicon leaving a layer of crystallized silicon on the template. Thereafter, the layer of crystallized silicon is separated from the template. The process of the invention can be used to make optoelectronic devices.
    Type: Application
    Filed: October 25, 2012
    Publication date: October 31, 2013
    Inventors: Mark T. Winkler, Tonio Buonassisi, Riley E. Brandt, Michael J. Aziz, Austin Joseph Akey
  • ORDERED ASSEMBLY OF NANOPARTICLES IN SPATIALLY DEFINED REGIONS
    Publication number: 20120171448
    Abstract: The disclosed subject matter relates to a method for forming an ordered assembly of nanoparticles in spatially defined regions. The method is based on migration of a dispersion of nanoparticles from a reservoir to a microchannel and controlled evaporation of the solvent in the dispersion to facilitate the formation of the ordered assembly in the microchannel. The disclosed subject matter also relates to an apparatus for preparing ordered assembly of nanoparticles, use of the ordered assembly of nanoparticles in the manufacture of materials and devices, and materials and devices based on or including such ordered assembly of nanoparticles.
    Type: Application
    Filed: November 8, 2011
    Publication date: July 5, 2012
    Inventors: Austin Joseph Akey, Irving Philip Herman, Chenguang Lu