Patents by Inventor Avanti M. Jain
Avanti M. Jain has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11796882Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.Type: GrantFiled: December 30, 2021Date of Patent: October 24, 2023Assignee: SAGE Electrochromics, Inc.Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
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Publication number: 20220128880Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.Type: ApplicationFiled: December 30, 2021Publication date: April 28, 2022Applicant: SAGE Electrochromics, Inc.Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
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Patent number: 11221535Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.Type: GrantFiled: April 9, 2018Date of Patent: January 11, 2022Assignee: SAGE Electrochromics, Inc.Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
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Patent number: 10596681Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.Type: GrantFiled: May 22, 2017Date of Patent: March 24, 2020Assignees: SAINT-GOBAIN ABRASIVES, INC., SAINT-GOBAIN ABRASIFSInventors: Yinggang Tian, Paul W. Rehrig, Arup K. Khaund, Avanti M. Jain, Wei Che, Susanne Liebelt, Vincent Tesi
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Patent number: 10580638Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.Type: GrantFiled: October 5, 2018Date of Patent: March 3, 2020Assignee: SAGE Electrochromics, Inc.Inventors: Avanti M. Jain, Jean-Christophe Giron
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Publication number: 20190051570Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.Type: ApplicationFiled: October 5, 2018Publication date: February 14, 2019Applicant: SAGE Electrochromics, Inc.Inventors: Avanti M. Jain, Jean-Christophe Giron
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Publication number: 20180299742Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.Type: ApplicationFiled: April 9, 2018Publication date: October 18, 2018Applicant: SAGE Electrochromics, Inc.Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
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Patent number: 10096533Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.Type: GrantFiled: November 17, 2015Date of Patent: October 9, 2018Assignee: SAGE Electrochromics, Inc.Inventors: Avanti M. Jain, Jean-Christophe Giron
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Patent number: 9939704Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.Type: GrantFiled: June 16, 2015Date of Patent: April 10, 2018Assignee: SAGE Electrochromics, Inc.Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
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Publication number: 20170252897Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.Type: ApplicationFiled: May 22, 2017Publication date: September 7, 2017Inventors: Yinggang TIAN, Paul W. REHRIG, Arup K. KHAUND, Avanti M. JAIN, Wei CHE, Susanne LIEBELT, Vincent TESI
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Patent number: 9687962Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.Type: GrantFiled: December 30, 2015Date of Patent: June 27, 2017Assignees: SAINT-GOBAIN ABRASIVES, INC., SAINT-GOBAIN ABRASIFSInventors: Yinggang Tian, Paul W. Rehrig, Arup K. Khaund, Avanti M. Jain, Wei Che, Susanne Liebelt, Vincent Tesi
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Publication number: 20160144481Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.Type: ApplicationFiled: December 30, 2015Publication date: May 26, 2016Inventors: Yinggang Tian, Paul W. Rehrig, Arup K. Khaund, Avanti M. Jain, Wei Che, Susanne Liebelt, Vincent Tesi
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Publication number: 20160141258Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.Type: ApplicationFiled: November 17, 2015Publication date: May 19, 2016Applicant: SAGE ELECTROCHROMICS, INC.Inventors: Avanti M. Jain, Jean-Christophe Giron
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Publication number: 20150362817Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.Type: ApplicationFiled: June 16, 2015Publication date: December 17, 2015Applicant: SAGE ELECTROCHROMICS, INC.Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar