Patents by Inventor Avanti M. Jain

Avanti M. Jain has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11796882
    Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.
    Type: Grant
    Filed: December 30, 2021
    Date of Patent: October 24, 2023
    Assignee: SAGE Electrochromics, Inc.
    Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
  • Publication number: 20220128880
    Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.
    Type: Application
    Filed: December 30, 2021
    Publication date: April 28, 2022
    Applicant: SAGE Electrochromics, Inc.
    Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
  • Patent number: 11221535
    Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: January 11, 2022
    Assignee: SAGE Electrochromics, Inc.
    Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
  • Patent number: 10596681
    Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.
    Type: Grant
    Filed: May 22, 2017
    Date of Patent: March 24, 2020
    Assignees: SAINT-GOBAIN ABRASIVES, INC., SAINT-GOBAIN ABRASIFS
    Inventors: Yinggang Tian, Paul W. Rehrig, Arup K. Khaund, Avanti M. Jain, Wei Che, Susanne Liebelt, Vincent Tesi
  • Patent number: 10580638
    Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.
    Type: Grant
    Filed: October 5, 2018
    Date of Patent: March 3, 2020
    Assignee: SAGE Electrochromics, Inc.
    Inventors: Avanti M. Jain, Jean-Christophe Giron
  • Publication number: 20190051570
    Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.
    Type: Application
    Filed: October 5, 2018
    Publication date: February 14, 2019
    Applicant: SAGE Electrochromics, Inc.
    Inventors: Avanti M. Jain, Jean-Christophe Giron
  • Publication number: 20180299742
    Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.
    Type: Application
    Filed: April 9, 2018
    Publication date: October 18, 2018
    Applicant: SAGE Electrochromics, Inc.
    Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
  • Patent number: 10096533
    Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: October 9, 2018
    Assignee: SAGE Electrochromics, Inc.
    Inventors: Avanti M. Jain, Jean-Christophe Giron
  • Patent number: 9939704
    Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: April 10, 2018
    Assignee: SAGE Electrochromics, Inc.
    Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar
  • Publication number: 20170252897
    Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.
    Type: Application
    Filed: May 22, 2017
    Publication date: September 7, 2017
    Inventors: Yinggang TIAN, Paul W. REHRIG, Arup K. KHAUND, Avanti M. JAIN, Wei CHE, Susanne LIEBELT, Vincent TESI
  • Patent number: 9687962
    Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.
    Type: Grant
    Filed: December 30, 2015
    Date of Patent: June 27, 2017
    Assignees: SAINT-GOBAIN ABRASIVES, INC., SAINT-GOBAIN ABRASIFS
    Inventors: Yinggang Tian, Paul W. Rehrig, Arup K. Khaund, Avanti M. Jain, Wei Che, Susanne Liebelt, Vincent Tesi
  • Publication number: 20160144481
    Abstract: An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, and a first type of abrasive particle overlying the tacking layer and defining a first abrasive particle concentration at least about 10 particles per mm of substrate.
    Type: Application
    Filed: December 30, 2015
    Publication date: May 26, 2016
    Inventors: Yinggang Tian, Paul W. Rehrig, Arup K. Khaund, Avanti M. Jain, Wei Che, Susanne Liebelt, Vincent Tesi
  • Publication number: 20160141258
    Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.
    Type: Application
    Filed: November 17, 2015
    Publication date: May 19, 2016
    Applicant: SAGE ELECTROCHROMICS, INC.
    Inventors: Avanti M. Jain, Jean-Christophe Giron
  • Publication number: 20150362817
    Abstract: An electrochromic device is structured to restrict moisture permeation between an electrochromic stack in the device and an external environment. The electrochromic device includes conductive layers and one or more encapsulation layers, where the encapsulation layers and conductive layers collectively isolate the electrochromic stack from the ambient environment. The encapsulation layers resist moisture permeation, and at least the outer portions of the conductive layers resist moisture permeation. The moisture-resistant electrochromic device can be fabricated based at least in part upon selective removal of one or more outer portions of at least the EC stack, so that at least the encapsulation layer extends over one or more edge portions of the EC stack to isolate the edge portions of the EC stack from the ambient environment. The encapsulation layer can include one or more of an anti-reflective layer, infrared cut-off filter, etc.
    Type: Application
    Filed: June 16, 2015
    Publication date: December 17, 2015
    Applicant: SAGE ELECTROCHROMICS, INC.
    Inventors: Zachary Richard Patterson, Erik Jon Bjornard, Avanti M. Jain, Jean-Christophe Giron, Neil L. Sbar