Patents by Inventor Aviv Frommer
Aviv Frommer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230408791Abstract: In one method, a display source aligned with an illumination prism assembly is displaced along a displacement axis to adjust the distance between the display source and a collimating prism assembly. The display source, the illumination prism assembly, and an illumination module are translationally moved in unison in a plane normal to the displacement axis. In another method, a component of an optical device is coupled to a mechanical assembly at a known orientation. The mechanical assembly has a test pattern at a known orientation. An image sensor is aligned with the test pattern, and the image sensor captures an image of the test pattern. The captured image is analyzed to determine an estimated orientation of the test pattern. An orientation parameter of the image sensor is adjusted based on a comparison between the known orientation of the test pattern and the estimated orientation of the test pattern.Type: ApplicationFiled: August 30, 2023Publication date: December 21, 2023Inventors: Lilya LOBACHINSKY, Naamah LEVIN, Aviv FROMMER
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Patent number: 11762169Abstract: In one method, a display source aligned with an illumination prism assembly is displaced along a displacement axis to adjust the distance between the display source and a collimating prism assembly. The display source, the illumination prism assembly, and an illumination module are translationally moved in unison in a plane normal to the displacement axis. In another method, a component of an optical device is coupled to a mechanical assembly at a known orientation. The mechanical assembly has a test pattern at a known orientation. An image sensor is aligned with the test pattern, and the image sensor captures an image of the test pattern. The captured image is analyzed to determine an estimated orientation of the test pattern. An orientation parameter of the image sensor is adjusted based on a comparison between the known orientation of the test pattern and the estimated orientation of the test pattern.Type: GrantFiled: December 2, 2018Date of Patent: September 19, 2023Assignee: LUMUS LTD.Inventors: Lilya Lobachinsky, Naamah Levin, Aviv Frommer
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Publication number: 20230139649Abstract: A vehicular head-up display (HUD) for displaying an image to a user of a vehicle having a windshield (15) includes an image projector (14) outputting a collimated image and an optical aperture expander. The optical aperture expander includes a light-guide optical element (LOE) (10) having two major external surfaces (30a, 30b). The image projector (14) injects the collimated image so as to propagate within the LOE by internal reflection at the major external surfaces. The LOE also has a set of parallel partially-reflecting internal surfaces (12) which progressively couple out the image illumination from the LOE. The optical aperture expander is deployed such that the image illumination coupled-out of the LOE (12) follows a light path including a reflection from a surface associated with the windshield (15) of the vehicle so as to be visible to the user while the user looks at a scene beyond the windshield.Type: ApplicationFiled: June 27, 2021Publication date: May 4, 2023Inventors: Eitan RONEN, Ari GROBMAN, Jonathan GELBERG, Aviv FROMMER, Eli GLIKMAN
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Publication number: 20200371311Abstract: In one method, a display source aligned with an illumination prism assembly is displaced along a displacement axis to adjust the distance between the display source and a collimating prism assembly. The display source, the illumination prism assembly, and an illumination module are translationally moved in unison in a plane normal to the displacement axis. In another method, a component of an optical device is coupled to a mechanical assembly at a known orientation. The mechanical assembly has a test pattern at a known orientation. An image sensor is aligned with the test pattern, and the image sensor captures an image of the test pattern. The captured image is analyzed to determine an estimated orientation of the test pattern. An orientation parameter of the image sensor is adjusted based on a comparison between the known orientation of the test pattern and the estimated orientation of the test pattern.Type: ApplicationFiled: December 2, 2018Publication date: November 26, 2020Inventors: Lilya LOBACHINSKY, Naamah LEVIN, Aviv FROMMER
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Publication number: 20180157057Abstract: An optical system (100) includes an image-collimating prism (102) having external surfaces which are associated with: a polarized source; reflective-display device (70); at least one light-wave collimating component (16) and a light-wave exit surface (20), respectively. A polarization-selective beam splitter configuration (10) is deployed within the prism (102) on a plane oblique to the light-wave entrance surface (8). The reflective-display device is illuminated by light reflected from the beam splitter configuration (10), and generates rotation of the polarization corresponding to bright regions of the image. An image from the reflective-display device (70) is selectively transmitted by the polarization-selective beam splitter configuration (10), is collimated by the collimating component (16), reflected from the polarization-selective beam splitter configuration (10) and is projected through the exit surface (20).Type: ApplicationFiled: January 25, 2018Publication date: June 7, 2018Inventors: Jonathan GELBERG, Mordechai GILO, Aviad BAR MEIR, Aviv FROMMER
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Patent number: 7684039Abstract: A method and tool for conducting NIR overlay metrology is disclosed. Such methods involve generating a filtered illumination beam including NIR radiation and directing that illumination beam onto an overlay target to produce an optical signal that is detected and used to generate overlay metrology measurements. The method is particularly suited to substrate applications having layers of opaque material that are transmissive in the NIR range (e.g., amorphous carbon) and where NIR imaging is used to obtain overlay measurements. A tool implementation includes a means for generating a filtered illumination beam extending into the NIR range and a detector for receiving NIR signal from an NIR illuminated target and a computer for processing the signal data to obtain overlay metrology measurements.Type: GrantFiled: November 8, 2006Date of Patent: March 23, 2010Assignee: KLA-Tencor Technologies CorporationInventors: Michael Adel, Aviv Frommer
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Patent number: 7528953Abstract: In one embodiment, a system includes a beam generator for directing at least one incident beam having a wavelength ? towards a periodic target having structures with a specific pitch p. A plurality of output beams are scattered from the periodic target in response to the at least one incident beam. The system further includes an imaging lens system for passing only a first and a second output beam from the target. The imaging system is adapted such that the angular separation between the captured beams, ?, and the pitch are selected to cause the first and second output beams to form a sinusoidal image. The system also includes a sensor for imaging the sinusoidal image or images, and a controller for causing the beam generator to direct the at least one incident beam towards the periodic target or targets, and for analyzing the sinusoidal image or images.Type: GrantFiled: February 27, 2006Date of Patent: May 5, 2009Assignee: KLA-Tencor Technologies Corp.Inventors: Aviv Frommer, Vladimir Levinski, Mark D. Smith, Jeffrey Byers, Chris A. Mack, Michael E. Adel
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Patent number: 7526749Abstract: Methods and apparatus for fabricating a semiconductor die including several target structures. A first layer is formed that includes one or more line or trench structures that extend in a first direction. A second layer is formed that includes one or more line or trench structures that extend in a second direction that is perpendicular to the first structure, such that a projection of the target structure along the first direction is independent of the second direction and a projection of the target structure along the second direction is independent of the first direction. A target structure and a method for generating a calibration curve are also described.Type: GrantFiled: January 10, 2006Date of Patent: April 28, 2009Assignee: KLA-Tencor Technologies CorporationInventors: Vladimir Levinski, Michael E. Adel, Aviv Frommer, Daniel Kandel
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Publication number: 20070187606Abstract: A method and tool for conducting NIR overlay metrology is disclosed. Such methods involve generating a filtered illumination beam including NIR radiation and directing that illumination beam onto an overlay target to produce an optical signal that is detected and used to generate overlay metrology measurements. The method is particularly suited to substrate applications having layers of opaque material that are transmissive in the NIR range (e.g., amorphous carbon) and where NIR imaging is used to obtain overlay measurements. A tool implementation includes a means for generating a filtered illumination beam extending into the NIR range and a detector for receiving NIR signal from an NIR illuminated target and a computer for processing the signal data to obtain overlay metrology measurements.Type: ApplicationFiled: November 8, 2006Publication date: August 16, 2007Inventors: Michael Adel, Aviv Frommer
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Publication number: 20070171749Abstract: An array of non-volatile memory cells and a method for altering a state of a non-volatile memory cell that comprises multiple terminals, a substrate, and a charge retainer surrounded by an insulator, the method includes: illuminating the substrate with light such as to create electron-hole pairs within a first portion of the substrate positioned deep within the substrate and to create electron-hole pairs within a second portion of the substrate located near an upper surface of the substrate; and applying at least one control voltage to at least one terminal of the non-volatile memory cell such as to cause charged particles created in the first portion and in the second portion to propagate towards the upper surface of the substrate and to be injected into the charge retainer.Type: ApplicationFiled: January 23, 2007Publication date: July 26, 2007Inventor: Aviv Frommer
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Publication number: 20070096094Abstract: Methods and apparatus for fabricating a semiconductor die including several target structures. A first layer is formed that includes one or more line or trench structures that extend in a first direction. A second layer is formed that includes one or more line or trench structures that extend in a second direction that is perpendicular to the first structure, such that a projection of the target structure along the first direction is independent of the second direction and a projection of the target structure along the second direction is independent of the first direction. A target structure and a method for generating a calibration curve are also described.Type: ApplicationFiled: January 10, 2006Publication date: May 3, 2007Inventors: Vladimir Levinski, Michael Adel, Aviv Frommer, Daniel Kandel
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Publication number: 20060197951Abstract: In one embodiment, a system for imaging an acquisition target or an overlay or alignment semiconductor target is disclosed. The system includes a beam generator for directing at least one incident beam having a wavelength ? towards a periodic target having structures with a specific pitch p. A plurality of output beams are scattered from the periodic target in response to the at least one incident beam. The system further includes an imaging lens system for passing only a first and a second output beam from the target. The imaging system is adapted such that the angular separation between the captured beams, ?, and the pitch are selected to cause the first and second output beams to form a sinusoidal image. The system also includes a sensor for imaging the sinusoidal image or images, and a controller for causing the beam generator to direct the at least one incident beam towards the periodic target or targets, and for analyzing the sinusoidal image or images.Type: ApplicationFiled: February 27, 2006Publication date: September 7, 2006Inventors: Aviv Frommer, Vladimir Levinski, Mark Smith, Jeffrey Byers, Chris Mack, Michael Adel
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Patent number: 6904189Abstract: Ultra fast, compact wavelength-selective 2×2 optical switches based on polarization splitters and preferably electro-optical polarization converters, and switch matrices based on such switches. The switches and switch matrices are preferably implemented on electro-optical substrates using planar light-wave circuit technology. Switch designs include switches comprised of two polarization splitters and two polarization converters, and a switch comprised of one polarization splitter and two polarization converters. In a preferred embodiment, a switch comprises a TE-barring polarization splitter, a TM-barring polarization splitter, and two electro-optical wavelength-selective polarization converters connected in parallel between the TE- and TM-barring polarization splitters, and is implemented on an electro-optical substrate such as InP, GaAs, LiNbO3 or LiTaO3 using planar lightwave circuit technology.Type: GrantFiled: February 22, 2002Date of Patent: June 7, 2005Assignee: Lynx Photonic Networks, Inc.Inventors: Aviv Frommer, Ben-Zion Kopelovitz
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Publication number: 20030235361Abstract: An architecture of, and a method for realizing polarization-independent symmetric optical networks, in particular multi-substrate PLC-implemented networks. The architecture includes, in various embodiments, at least one PM fiber performing mid-span polarization conversion in an optical path between two bi-refringement elements. At least one, and preferably two identical PM fiber sections perform the conversion by appropriate connections of their fast and slow axes to the ordinary and extraordinary axes of the bi-refringent elements.Type: ApplicationFiled: June 25, 2002Publication date: December 25, 2003Applicant: LYNX PHOTONIC NETWORKS INC.Inventor: Aviv Frommer
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Publication number: 20030161566Abstract: Ultra fast, compact wavelength-selective 2×2 optical switches based on polarization splitters and preferably electro-optical polarization converters, and switch matrices based on such switches. The switches and switch matrices are preferably implemented on electro-optical substrates using planar light-wave circuit technology. Switch designs include switches comprised of two polarization splitters and two polarization converters, and a switch comprised of one polarization splitter and two polarization converters. In a preferred embodiment, a switch comprises a TE-barring polarization splitter, a TM-barring polarization splitter, and two electro-optical wavelength-selective polarization converters connected in parallel between the TE- and TM-barring polarization splitters, and is implemented on an electro-optical substrate such as InP, GaAs, LiNbO3 or LiTaO3 using planar lightwave circuit technology.Type: ApplicationFiled: February 22, 2002Publication date: August 28, 2003Applicant: LYNX PHOTONIC NETWORKS INC.Inventors: Aviv Frommer, Ben-Zion Kopelovitz
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Patent number: 5939899Abstract: Logic devices of the present invention have one or more MOSFETs that are configured to operate in logic circuits, where voltages applied to the source and drain of each MOSFET are treated as logic inputs to the circuit and the resulting substrate current is treated as the logic output of the circuit. In one implementation, a MOSFET is configured in a circuit to operate as an XOR gate where a load resistor between the substrate and ground converts the substrate current into an output voltage. A sample-and-hold circuit samples and holds the output voltage to isolate the XOR gate thereby allowing DC power dissipation to be reduced. In another implementation, three MOSFETs are configured to operate as an "ORNAND" logic device that performs the logical addition of the OR function and the NAND function.Type: GrantFiled: April 23, 1997Date of Patent: August 17, 1999Assignee: Lucent Technologies Inc.Inventors: Aviv Frommer, Mark R. Pinto