Patents by Inventor Avner Karpol
Avner Karpol has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7463352Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: January 21, 2005Date of Patent: December 9, 2008Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Patent number: 7133548Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.Type: GrantFiled: May 8, 2001Date of Patent: November 7, 2006Assignee: Applied Materials, Inc.Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
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Patent number: 6924891Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: April 29, 2004Date of Patent: August 2, 2005Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Publication number: 20050128473Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: January 21, 2005Publication date: June 16, 2005Applicant: APPLIED MATERIALS, INC.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Publication number: 20040201842Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: April 29, 2004Publication date: October 14, 2004Applicant: APPLIED MATERIALS, INCInventors: Avner Karpol, Silviu Reinhorn, Emanuel ElYasaf, Shimon Yalov, Boaz Kenan
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Patent number: 6798505Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: May 12, 2003Date of Patent: September 28, 2004Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elyasaf, Shimon Yalov, Boaz Kenan
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Patent number: 6735331Abstract: A method and apparatus for early detection and classification of retinal pathologies, especially glaucoma and macular edema. The method comprises; (a) illuminating predetermined locations on the retina; (b) receiving light returning from predetermined locations; (c) generating a series of primary graphs corresponding to the light intensity with respect to retinal depth of predetermined locations on the retina; (d) separating the component curves of said graphs; (e) analyzing said component curves to produce data including data corresponding to the front slope and/or the back slope, and/or the area of at least one of said component curves; (f) comparing said data to analogous pre-specified data.Type: GrantFiled: September 5, 2000Date of Patent: May 11, 2004Assignee: Talia Technology Ltd.Inventors: Emanuel Binnun, Avner Karpol
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Publication number: 20030197858Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: May 12, 2003Publication date: October 23, 2003Applicant: APPLIED MATERIALS, INCInventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Patent number: 6587194Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: January 11, 2002Date of Patent: July 1, 2003Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Patent number: 6556294Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: January 11, 2002Date of Patent: April 29, 2003Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Patent number: 6466315Abstract: A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.Type: GrantFiled: September 3, 1999Date of Patent: October 15, 2002Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Boaz Kenan
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Patent number: 6429931Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: January 11, 2002Date of Patent: August 6, 2002Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Publication number: 20020080348Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: January 11, 2002Publication date: June 27, 2002Applicant: APPLIED MATERIALS, INC.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Publication number: 20020067478Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: January 11, 2002Publication date: June 6, 2002Applicant: APPLIED MATERIALS, INC.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Publication number: 20020057427Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: January 11, 2002Publication date: May 16, 2002Applicant: APPLIED MATERIALS, INCInventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Patent number: 6369888Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: November 17, 1999Date of Patent: April 9, 2002Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
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Publication number: 20010019625Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.Type: ApplicationFiled: May 8, 2001Publication date: September 6, 2001Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
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Patent number: 6267477Abstract: Disclosed is a three dimensional imaging scanning apparatus for retinal thickness and structure non-invasive analysis. The apparatus includes an optical path having a light source, common focusing optic and beam deflector for both incident and reflected beams going to and returning from the retina of an eye, and an imaging device. The apparatus further includes separate optical paths for imaging the fundus and iris of the eye. The speckles caused by retina non-uniformity can be removed by vibrating the common beam deflector during the image acquisition time. An eye model is obtained by spatially integrating images of the retina, the fundus and the iris.Type: GrantFiled: August 21, 1998Date of Patent: July 31, 2001Assignee: Talia Technology Ltd.Inventors: Avner Karpol, Ran Zeimer
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Patent number: 6268093Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.Type: GrantFiled: October 13, 1999Date of Patent: July 31, 2001Assignee: Applied Materials, Inc.Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
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Patent number: 5311111Abstract: A method for calibrating a microstep motor comprising a step motor having a plurality of stator coils, a pair of drivers for applying respective driving voltages to the stator coils. Amplitude adjustment means are coupled to each of the drivers for adjusting the amplitudes of the respective driving voltages and offset adjustment means are coupled to each of the drivers for adjusting the d.c. offsets of the respective driving voltages. The method permits compensation for non-linearities associated with the stator coils, and comprises the steps of adjusting at least one of the amplitude adjustment means a predetermined amount, so as to produce a signal having a specified amplitude, measuring an imbalance of the motor, adjusting the offset and amplitude adjustment means as required in order to reduce the measured imbalance, and iteratively repeating the offset and amplitude adjustments as required until no further reduction in the measured imbalance is possible.Type: GrantFiled: May 29, 1991Date of Patent: May 10, 1994Assignee: Orbotech Ltd.Inventors: Avner Karpol, Amnon Ganot