Patents by Inventor Avner Karpol

Avner Karpol has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7463352
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: January 21, 2005
    Date of Patent: December 9, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Patent number: 7133548
    Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.
    Type: Grant
    Filed: May 8, 2001
    Date of Patent: November 7, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
  • Patent number: 6924891
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: April 29, 2004
    Date of Patent: August 2, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20050128473
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: January 21, 2005
    Publication date: June 16, 2005
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20040201842
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: April 29, 2004
    Publication date: October 14, 2004
    Applicant: APPLIED MATERIALS, INC
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel ElYasaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6798505
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: September 28, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elyasaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6735331
    Abstract: A method and apparatus for early detection and classification of retinal pathologies, especially glaucoma and macular edema. The method comprises; (a) illuminating predetermined locations on the retina; (b) receiving light returning from predetermined locations; (c) generating a series of primary graphs corresponding to the light intensity with respect to retinal depth of predetermined locations on the retina; (d) separating the component curves of said graphs; (e) analyzing said component curves to produce data including data corresponding to the front slope and/or the back slope, and/or the area of at least one of said component curves; (f) comparing said data to analogous pre-specified data.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: May 11, 2004
    Assignee: Talia Technology Ltd.
    Inventors: Emanuel Binnun, Avner Karpol
  • Publication number: 20030197858
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: May 12, 2003
    Publication date: October 23, 2003
    Applicant: APPLIED MATERIALS, INC
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6587194
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: July 1, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6556294
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: April 29, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6466315
    Abstract: A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.
    Type: Grant
    Filed: September 3, 1999
    Date of Patent: October 15, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Boaz Kenan
  • Patent number: 6429931
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: August 6, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20020080348
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: January 11, 2002
    Publication date: June 27, 2002
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20020067478
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: January 11, 2002
    Publication date: June 6, 2002
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20020057427
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: January 11, 2002
    Publication date: May 16, 2002
    Applicant: APPLIED MATERIALS, INC
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6369888
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: April 9, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20010019625
    Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.
    Type: Application
    Filed: May 8, 2001
    Publication date: September 6, 2001
    Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
  • Patent number: 6267477
    Abstract: Disclosed is a three dimensional imaging scanning apparatus for retinal thickness and structure non-invasive analysis. The apparatus includes an optical path having a light source, common focusing optic and beam deflector for both incident and reflected beams going to and returning from the retina of an eye, and an imaging device. The apparatus further includes separate optical paths for imaging the fundus and iris of the eye. The speckles caused by retina non-uniformity can be removed by vibrating the common beam deflector during the image acquisition time. An eye model is obtained by spatially integrating images of the retina, the fundus and the iris.
    Type: Grant
    Filed: August 21, 1998
    Date of Patent: July 31, 2001
    Assignee: Talia Technology Ltd.
    Inventors: Avner Karpol, Ran Zeimer
  • Patent number: 6268093
    Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.
    Type: Grant
    Filed: October 13, 1999
    Date of Patent: July 31, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
  • Patent number: 5311111
    Abstract: A method for calibrating a microstep motor comprising a step motor having a plurality of stator coils, a pair of drivers for applying respective driving voltages to the stator coils. Amplitude adjustment means are coupled to each of the drivers for adjusting the amplitudes of the respective driving voltages and offset adjustment means are coupled to each of the drivers for adjusting the d.c. offsets of the respective driving voltages. The method permits compensation for non-linearities associated with the stator coils, and comprises the steps of adjusting at least one of the amplitude adjustment means a predetermined amount, so as to produce a signal having a specified amplitude, measuring an imbalance of the motor, adjusting the offset and amplitude adjustment means as required in order to reduce the measured imbalance, and iteratively repeating the offset and amplitude adjustments as required until no further reduction in the measured imbalance is possible.
    Type: Grant
    Filed: May 29, 1991
    Date of Patent: May 10, 1994
    Assignee: Orbotech Ltd.
    Inventors: Avner Karpol, Amnon Ganot