Abstract: In order to reduce the adverse influence of contamination composed of silicon dioxide, hydrocarbons and/or metals within an EUV lithography apparatus on the reflectivity, a reflective optical element (50) for the extreme ultraviolet wavelength range having a reflective surface (59) is proposed, wherein the multilayer coating of the reflective surface (59) has a topmost layer (56) composed of a fluoride. The contaminations mentioned, which deposit on the reflective optical element (50) during the operation of the EUV lithography apparatus, are converted into volatile compounds by the addition of at least one of the substances mentioned hereinafter: atomic hydrogen, molecular hydrogen, perfluorinated alkanes such as e.g. tetrafluoromethane, oxygen, nitrogen and/or helium.

Abstract: The invention relates to a pyrotechnic active mass which is impenetrable in the visible spectrum, highly emissive in the infrared spectrum and used for camouflage and decoy purposes. As principal ingredients said mass contains red phosphorus and an alkali metal nitrate or mixture of alkali metal nitrates and as secondary ingredients at least one transition metal or a metal-rich compound or alloy thereof, at least one metalloid and a binder.

Abstract: The invention relates to a method of producing a screening smoke which is one-way transparent in the infrared spectrum (780 nm-14.0 &mgr;m) and opaque in the visible spectrum. According to the invention a known pyrotechnic screening smoke which is highly absorbent in the visible spectrum (380 nm-780 nm) is generated in the form of an aerosol, pyrotechnic scattered particles between 10 and 100 &mgr;m in size are simultaneously produced in said aerosol, and the resulting two-component smoke is irradiated by an infrared radiation source (spectrum: 780 nm-14.0 &mgr;m) from the smoke producer side.