Patents by Inventor Axel Klauck-Jacobs

Axel Klauck-Jacobs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7241904
    Abstract: Disclosed are monomers of the formula:
    Type: Grant
    Filed: May 23, 2006
    Date of Patent: July 10, 2007
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steffen Zahn, Andrew Francis Nordquist, Kristen Elaine Minnich, Guari Sankar Lal, William Franklin Burgoyne, Jr., Axel Klauck-Jacobs
  • Publication number: 20060208233
    Abstract: Thienothiophene monomers having an SF5 group and conducting oligomers and polymers formed by the polymerization of such monomers and their use as hole injection materials, charge transport materials, or as semiconductors. The compound may be of the formula: where X and X? are independently H, halogen atoms (e.g., F, Cl, Br, and 1), MgCl, MgBr, Mgl, Sn(R?)3, where R? comprises C1-6 alkyl or —OC16 alkyl, boronic acid, boronic ester, -CH=CHR? (where R? comprises H or C1-6 alkyl), —OC1-6 alkyl, —COOC1-6 alkyl, —S—COR?? and —COR ? (where R ? comprises H or c1-6 alkyl), —C?CH, or polymerizable aromatic rings (such as phenyl, naphthalene, pyrrole, dithiophene, thienothiophene, thiophene and so forth).
    Type: Application
    Filed: May 23, 2006
    Publication date: September 21, 2006
    Inventors: Steffen Zahn, Andrew Nordquist, Kristen Minnich, Guari Lal, William Burgoyne, Axel Klauck-Jacobs
  • Patent number: 7094365
    Abstract: Thienothiophene monomers having an SF5 group and conducting oligomers and polymers formed by the polymerization of such monomers and their use as hole injection materials, charge transport materials, or as semiconductors. The compound may be of the formula: where X and X? are independently H, halogen atoms (e.g., F, Cl, Br, and I), MgCl, MgBr, MgI, Sn(R?)3, where R? is C1-6 alkyl or —OC1-6 alkyl, boronic acid, boronic ester, —CH?CHR? (where R? is H or C1-6 alkyl), —OC1-6 alkyl, —COOC1-6 alkyl, —S—COR?? and —COR?? (where R?? is H or C1-6 alkyl), —C?CH, or polymerizable aromatic rings (such as phenyl, naphthalene, pyrrole, dithiophene, thienothiophene, thiophene and so forth.
    Type: Grant
    Filed: October 4, 2004
    Date of Patent: August 22, 2006
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steffen Zahn, Andrew Francis Nordquist, Kristen Elaine Minnich, Gauri Sankar Lal, William Franklin Burgoyne, Jr., Axel Klauck-Jacobs
  • Patent number: 7060846
    Abstract: Thienothiophene monomers having an SF5 group and conducting oligomers and polymers formed by the polymerization of such monomers and their use as hole injection materials, charge transport materials, or as semiconductors. The compound may be of the formula: where X and X? are independently H, halogen atoms (e.g., F, Cl, Br, and I), MgCl, MgBr, Mgl, Sn(R?)3, where R? comprises C1-6 alkyl or —OC1-6 alkyl, boronic acid, boronic ester, —CH?CHR? (where R? comprises H or C1-6 alkyl), —OC1-6 alkyl, —COOC1-6 alkyl, —S—COR?? and —COR?? (where R?? comprises H or C1-6 alkyl), —C?CH, or polymerizable aromatic rings (such as phenyl, naphthalene, pyrrole, dithiophene, thienothiophene, thiophene and so forth).
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: June 13, 2006
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steffen Zahn, Andrew Francis Nordquist, Kristen Elaine Minnich, Guari Sankar Lal, William Franklin Burgoyne, Jr., Axel Klauck-Jacobs
  • Publication number: 20060071199
    Abstract: Thienothiophene monomers having an SF5 group and conducting oligomers and polymers formed by the polymerization of such monomers and their use as hole injection materials, charge transport materials, or as semiconductors. The compound may be of the formula: where X and X? are independently H, halogen atoms (e.g., F, Cl, Br, and I), MgCl, MgBr, MgI, Sn(R?)3, where R? is C1-6 alkyl or —OC1-6 alkyl, boronic acid, boronic ester, —CH=CHR? (where R? is H or C1-6 alkyl), —OC1-6 alkyl, —COOC1-6 alkyl, —S—COR?? and —COR?? (where R?? is H or C1-6 alkyl), —C?CH, or polymerizable aromatic rings (such as phenyl, naphthalene, pyrrole, dithiophene, thienothiophene, thiophene and so forth.
    Type: Application
    Filed: October 4, 2004
    Publication date: April 6, 2006
    Inventors: Steffen Zahn, Andrew Nordquist, Kristen Minnich, Gauri Lal, William Burgoyne, Axel Klauck-Jacobs
  • Publication number: 20060074250
    Abstract: Thienothiophene monomers having an SF5 group and conducting oligomers and polymers formed by the polymerization of such monomers and their use as hole injection materials, charge transport materials, or as semiconductors. The compound may be of the formula: where X and X? are independently H, halogen atoms (e.g., F, Cl, Br, and I), MgCl, MgBr, MgI, Sn(R?)3, where R? comprises C1-6 alkyl or —OC1-6 alkyl, boronic acid, boronic ester, —CH?CHR? (where R? comprises H or C1-6 alkyl), —OC1-6 alkyl, —COOC1-6 alkyl, —S—COR?? and —COR?? (where R?? comprises H or C1-6 alkyl), —C?CH, or polymerizable aromatic rings (such as phenyl, naphthalene, pyrrole, dithiophene, thienothiophene, thiophene and so forth).
    Type: Application
    Filed: September 20, 2005
    Publication date: April 6, 2006
    Inventors: Steffen Zahn, Andrew Nordquist, Kristen Minnich, Gauri Lal, William Burgoyne, Axel Klauck-Jacobs
  • Patent number: 6894200
    Abstract: A method of preparing vicinal difluoro aromatic compounds in high yield from hydroxy aromatic compounds using various bases and a method of preparing intermediates thereof. A method for making a vicinal difluoro halogenated aromatic compound including providing a tetrafluoro derivative of a halogen substituted aromatic compound, wherein the tetrafluoro derivative has two fluorine atoms on each of two adjacent carbons and at least one additional halogen substituent; reacting the tetrafluoro derivative with a reducing agent in presence of a base for a reaction time sufficient to form the vicinal difluoro halogenated aromatic compound containing two vicinal fluorine substituents and the at least one additional halogen substituent, wherein the reducing agent is used in a reducing agent effective amount sufficient to retain the at least one additional halogen substituent.
    Type: Grant
    Filed: February 3, 2003
    Date of Patent: May 17, 2005
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Axel Klauck-Jacobs, Kathryn Sue Hayes, Reiner Taege, William Casteel, Gauri Sankar Lal
  • Publication number: 20030149315
    Abstract: A method of preparing vicinal difluoro aromatic compounds in high yield from hydroxy aromatic compounds using various bases and a method of preparing intermediates thereof. A method for making a vicinal difluoro halogenated aromatic compound including providing a tetrafluoro derivative of a halogen substituted aromatic compound, wherein the tetrafluoro derivative has two fluorine atoms on each of two adjacent carbons and at least one additional halogen substituent; reacting the tetrafluoro derivative with a reducing agent in presence of a base for a reaction time sufficient to form the vicinal difluoro halogenated aromatic compound containing two vicinal fluorine substituents and the at least one additional halogen substituent, wherein the reducing agent is used in a reducing agent effective amount sufficient to retain the at least one additional halogen substituent.
    Type: Application
    Filed: February 3, 2003
    Publication date: August 7, 2003
    Inventors: Axel Klauck-Jacobs, Kathryn Sue Hayes, Reiner Taege, William Casteel, Gauri Sankar Lal
  • Publication number: 20020058198
    Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention contain a polymer that has fluorinated phenolic units and photoacid-labile groups. Resists of the invention can be effectively imaged at short wavelengths such as sub-200 nm, particularly 157 nm.
    Type: Application
    Filed: September 8, 2001
    Publication date: May 16, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Axel Klauck-Jacobs, Anthony Zampini, Sungseo Cho, Shintaro Yamada