Patents by Inventor Axel Wenzel

Axel Wenzel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8009299
    Abstract: The invention relates to a method of calibration of the beam position of a corpuscular beam. A calibration body with structures is used, wherein the structures have a structure period PS in the plain section and within each structure there is a position L intended for the measurement. For the calibration, at least one detection signal each at structures in the plain section of the calibration body is generated, wherein the corpuscular beam is deflected with deflectors on beam target positions L1 with the beam target period P1, which is larger than half of the structure period PS, whereby a basic calibration is used for the control of the deflectors, and wherein the beam target deflections deviate either in the beam target period P1 from the structure period PS and/or in the beam target position L1 from the position L.
    Type: Grant
    Filed: January 5, 2006
    Date of Patent: August 30, 2011
    Assignee: Applied Materials GmbH
    Inventors: Matthias Brunner, Ralf Schmid, Bernhard Mueller, Axel Wenzel
  • Publication number: 20100188666
    Abstract: The invention relates to a method of calibration of the beam position of a corpuscular beam. A calibration body with structures is used, wherein the structures have a structure period Ps in the plain section and within each structure there is a position L intended for the measurement. For the calibration, at least one detection signal each at structures in the plain section of the calibration body is generated, wherein the corpuscular beam is deflected with deflectors on beam target positions L1 with the beam target period P1, which is larger than half of the structure period Ps, whereby a basic calibration is used for the control of the deflectors, and wherein the beam target deflections intentionally deviate either in the beam target period P1 from the structure period Ps and/or in the beam target position L1 from the position L.
    Type: Application
    Filed: January 5, 2006
    Publication date: July 29, 2010
    Applicant: APPLIED MATERIALS GMBH
    Inventors: Matthias Brunner, Ralf Schmid, Bernhard Mueller, Axel Wenzel
  • Patent number: 7256606
    Abstract: The present invention provides a method of electron beam testing of liquid crystal displays comprising non-uniform electrodes having a conductive portion and a dielectric portion. In accordance with methods of the present invention, the diameter of the electron beam is increased so that the beam is less focused, i.e., enlarged or “blurred,” over a non-uniform electrode area. The diameter of the beam is increased so that the beam generates secondary electrons from the conductive portion of the non-uniform electrode area. The configured test beam may be circular, elliptical, or other suitable shapes.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: August 14, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Axel Wenzel, Ralf Schmid, Matthias Brunner
  • Publication number: 20060028230
    Abstract: The present invention provides a method of electron beam testing of liquid crystal displays comprising non-uniform electrodes having a conductive portion and a dielectric portion. In accordance with methods of the present invention, the diameter of the electron beam is increased so that the beam is less focused, i.e., enlarged or “blurred,” over a non-uniform electrode area. The diameter of the beam is increased so that the beam generates secondary electrons from the conductive portion of the non-uniform electrode area. The configured test beam may be circular, elliptical, or other suitable shapes.
    Type: Application
    Filed: October 29, 2004
    Publication date: February 9, 2006
    Inventors: Axel Wenzel, Ralf Schmid, Matthias Brunner