Patents by Inventor Aya Imada

Aya Imada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8718228
    Abstract: A phase grating used for X-ray phase imaging is provided, in which a pitch can be narrowed by using a diffraction grating with a low aspect ratio. A phase grating used for X-ray phase imaging, characterized in that the phase grating includes a first diffraction grating in which a first projection part whose thickness is formed so that an in-coming X-ray transmits with a phase ?-shifted, and a first aperture part with the same aperture width as a width of the first projection part are cyclically arranged, and a second diffraction grating in which a second projection part with the same width as a width of the first projection part, and a second aperture part with the same aperture width as the aperture width of the first aperture part are cyclically arranged, and the second diffraction grating is formed as displaced on the first diffraction grating.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: May 6, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takashi Nakamura, Aya Imada, Hidenosuke Itoh
  • Patent number: 8351570
    Abstract: To provide a phase grating capable of acquiring, in photographing of an X-ray phase contrast image by use of X-ray with two wavelengths, an X-ray phase contrast image by a phase grating in the same size as when a single wavelength is used, provided is a phase grating used when an X-ray is directed to take an X-ray phase contrast image, the phase grating including a periodic structure for generating a phase difference between an X-ray transmitted through the structure and an X-ray not transmitted through the structure. The periodic structure has different periods in a plurality of directions in a same surface.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: January 8, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takashi Nakamura, Aya Imada
  • Patent number: 8293125
    Abstract: A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.
    Type: Grant
    Filed: September 5, 2006
    Date of Patent: October 23, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Toru Den, Takashi Nakamura
  • Patent number: 8243879
    Abstract: A source grating for X-rays and the like which can enhance spatial coherence and is used for X-ray phase contrast imaging is provided. The source grating for X-rays is disposed between an X-ray source and a test object and is used for X-ray phase contrast imaging. The source grating for X-rays includes a plurality of sub-gratings formed by periodically arranging projection parts each having a thickness shielding an X-ray at constant intervals. The plurality of sub-gratings are stacked in layers by being shifted.
    Type: Grant
    Filed: April 13, 2009
    Date of Patent: August 14, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidenosuke Itoh, Yoshikatsu Ichimura, Takashi Nakamura, Aya Imada
  • Patent number: 7976761
    Abstract: A process for producing a patterned structure comprises imprinting a first pattern by pressing a stamper having a projection-depression configuration on the surface against an imprint-work layer, and imprinting a second pattern by displacing relatively the stamper from the position of the first pattern to another position on the imprint-work layer and then pressing the stamper against the imprint-work layer.
    Type: Grant
    Filed: July 5, 2007
    Date of Patent: July 12, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Toru Den
  • Publication number: 20110085639
    Abstract: To provide a phase grating capable of acquiring, in photographing of an X-ray phase contrast image by use of X-ray with two wavelengths, an X-ray phase contrast image by a phase grating in the same size as when a single wavelength is used, provided is a phase grating used when an X-ray is directed to take an X-ray phase contrast image, the phase grating including a periodic structure for generating a phase difference between an X-ray transmitted through the structure and an X-ray not transmitted through the structure. The periodic structure has different periods in a plurality of directions in a same surface.
    Type: Application
    Filed: September 28, 2010
    Publication date: April 14, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Takashi Nakamura, Aya Imada
  • Publication number: 20110013743
    Abstract: A phase grating used for X-ray phase imaging is provided, in which a pitch can be narrowed by using a diffraction grating with a low aspect ratio. A phase grating used for X-ray phase imaging, characterized in that the phase grating includes a first diffraction grating in which a first projection part whose thickness is formed so that an in-coming X-ray transmits with a phase ?-shifted, and a first aperture part with the same aperture width as a width of the first projection part are cyclically arranged, and a second diffraction grating in which a second projection part with the same width as a width of the first projection part, and a second aperture part with the same aperture width as the aperture width of the first aperture part are cyclically arranged, and the second diffraction grating is formed as displaced on the first diffraction grating.
    Type: Application
    Filed: March 12, 2009
    Publication date: January 20, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Takashi Nakamura, Aya Imada, Hidenosuke Itoh
  • Publication number: 20100246764
    Abstract: A source grating for X-rays and the like which can enhance spatial coherence and is used for X-ray phase contrast imaging is provided. The source grating for X-rays is disposed between an X-ray source and a test object and is used for X-ray phase contrast imaging. The source grating for X-rays includes a plurality of sub-gratings formed by periodically arranging projection parts each having a thickness shielding an X-ray at constant intervals. The plurality of sub-gratings are stacked in layers by being shifted.
    Type: Application
    Filed: April 13, 2009
    Publication date: September 30, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hidenosuke Itoh, Yoshikatsu Ichimura, Takashi Nakamura, Aya Imada
  • Patent number: 7794861
    Abstract: To provide patterned media having novel structure. Plural convex members 2991 are provided in an array form on a substrate 2990. The convex member has a shape such that the cross section at each plane in parallel to the substrate tapers toward the substrate. Magnetic recording layers 2992 are provided on upper parts 2993 of the convex members so that they are not in contact with each other between the adjacent upper surface parts.
    Type: Grant
    Filed: August 9, 2007
    Date of Patent: September 14, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Saito, Takashi Nakamura, Shigeru Ichihara, Toru Den, Aya Imada, Nobuhiro Yasui
  • Patent number: 7651736
    Abstract: The present invention provides a method of producing a structure, which is capable of easily obtaining a structure of the nanometer scale by using an anodic oxidation method. A method of producing a structure with a hole includes: forming first projected structures regularly arranged on a substrate; forming a first anodic oxidating layer on the substrate having the first projected structures, thereby forming first recessed structures at center portions of cells formed by the projected structures on the anodic oxidating layer; removing the first projected structures to form holes; and subjecting the first anodic oxidating layer to anodic oxidation to form holes at positions of the first recessed structures.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: January 26, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Toru Den
  • Patent number: 7636214
    Abstract: A nano structure having pore array structures in which a plurality of periodic arrays are formed adjacent to one another and a method of manufacturing the nano structure are provided. A nano structure having periodic array structures of pores formed in an anodized oxide film with a plurality of types of the periodic array structures arranged adjacent to one another is provided. Furthermore, a method of manufacturing a nano structure in which a plurality of periodic array structures formed in an anodized oxide film having different periods are arranged adjacent to one another, including (1) a step of forming pore starting points made up of a plurality of types of periodic arrays on the surface of a substrate comprised of aluminum as a principal component and (2) a step of anodizing the substrate simultaneously at the same anodization voltage is provided.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: December 22, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den
  • Patent number: 7591641
    Abstract: A novel mold is provided. The mold is prepared through steps of forming a concavo-convex pattern on a substrate, forming a film by embedding a material of a composition having shape-memory in the concavo-convex pattern, and forming a mold having the concavo-convex pattern by separating the film from the concavo-convex pattern after the film formation in the film formation step.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: September 22, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Saito, Aya Imada, Tohru Den
  • Patent number: 7538042
    Abstract: A method of manufacturing a structure is provided. This method include a steps of preparing a first substrate having a projection, forming a first layer on the projection, transferring the first layer to a second substrate, and removing at least apart of the second substrate.
    Type: Grant
    Filed: March 2, 2005
    Date of Patent: May 26, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den
  • Patent number: 7534359
    Abstract: The present invention relates to a process for producing a structure having holes at prescribed positions. The structure is produced through steps of (A) providing an impressing member having protrusions, and a substrate, (B) forming a layer, on the substrate, from a material having a less strength than the impressing member, (C) forming depressions by impressing the impressing member on the layer corresponding to protrusions of the impressing member, (D) etching the layer to bare at least a part of the surface of the substrate, and (E) anodizing the substrate to form holes on the substrate.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: May 19, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den
  • Publication number: 20090120904
    Abstract: A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.
    Type: Application
    Filed: September 5, 2006
    Publication date: May 14, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Aya Imada, Toru Den, Takashi Nakamura
  • Patent number: 7517554
    Abstract: A process for producing a nano-structure is provided which enables control of the pore diameters and the pore intervals by film formation conditions. The process produces a nano-structure of an aluminum-silicon-germanium mixed film containing silicon and germanium at a content of 20 to 70 atom % relative to aluminum, the mixed film being constituted of a matrix composed mainly of silicon and germanium in a composition ratio of SixGe1-x (0?X?1), and cylindrical portions mainly composed of aluminum having a diameter of not larger 30 nm in the matrix. In the process, the mixed film is formed at a film-forming rate of not higher than 150 nm/min.
    Type: Grant
    Filed: January 26, 2006
    Date of Patent: April 14, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Saito, Tohru Den, Kazuhiko Fukutani, Aya Imada
  • Patent number: 7455759
    Abstract: An anodized coating suitable for formation of highly regulated pores is provided. A method for production of a structure having pores characterized by including the steps of: forming starting points at predetermined intervals in an aluminum alloy formed on a substrate, and forming pores by anodization with the starting points as origins. In another embodiment, first and second aluminum alloy layers are anodized to form pores penetrating into the layers, wherein a diameter of a pore in the first alloy is different from a diameter of a pore in the second alloy. In an additional embodiment, a substrate is anodized to form pores, wherein the substrate contains an additive which changes the diameter within each pore, the amount of the additive continuously changing along the direction perpendicular to the substrate.
    Type: Grant
    Filed: August 10, 2004
    Date of Patent: November 25, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Saito, Aya Imada, Tohru Den
  • Patent number: 7432218
    Abstract: A process of a porous body comprises the steps of disposing a first material in which pores are formed by anodization on a substrate to form a first layer, disposing on the first layer a second material which has a hardness lower than that of the first material and an oxide of which is dissolved by an anodization step to form a second layer, forming a concave structure on a surface of the second layer, oxidizing the second layer, and subjecting the first layer to anodization to dissolve the second layer. A magnetic recording medium or a light-emitting element comprises a first layer which is comprised of an oxide of aluminum and comprises a porous portion on a substrate, and a second layer on the first layer which has a hardness lower than that of the first layer and is comprised of a metal element, wherein the pores are packed with a magnetic substance or a light-emitting material.
    Type: Grant
    Filed: August 26, 2005
    Date of Patent: October 7, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Aya Imada, Tohru Den
  • Publication number: 20080050526
    Abstract: The present invention provides a method of producing a structure, which is capable of easily obtaining a structure of the nanometer scale by using an anodic oxidation method. A method of producing a structure with a hole includes: forming first projected structures regularly arranged on a substrate; forming a first anodic oxidating layer on the substrate having the first projected structures, thereby forming first recessed structures at center portions of cells formed by the projected structures on the anodic oxidating layer; removing the first projected structures to form holes; and subjecting the first anodic oxidating layer to anodic oxidation to form holes at positions of the first recessed structures.
    Type: Application
    Filed: June 22, 2007
    Publication date: February 28, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Aya Imada, Toru Den
  • Publication number: 20080037173
    Abstract: To provide patterned media having novel structure. Plural convex members 2991 are provided in an array form on a substrate 2990. The convex member has a shape such that the cross section at each plane in parallel to the substrate tapers toward the substrate. Magnetic recording layers 2992 are provided on upper parts 2993 of the convex members so that they are not in contact with each other between the adjacent upper surface parts.
    Type: Application
    Filed: August 9, 2007
    Publication date: February 14, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Tatsuya Saito, Takashi Nakamura, Shigeru Ichihara, Toru Den, Aya Imada, Nobuhiro Yasui