Patents by Inventor Aya MIURA

Aya MIURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200306700
    Abstract: A zeolite membrane complex includes a support and a zeolite membrane formed on the support. The zeolite membrane is of an SAT-type zeolite. Among particles on the surface of the zeolite membrane, particles that have aspect ratios higher than or equal to 1.2 and lower than or equal to 10 account for 85% or more of the area of the surface of the zeolite membrane. This improves the orientations of the particles and also reduces the interstices among the particles. As a result, the denseness of the zeolite membrane is improved. Accordingly, for example, high gas separation performance can be obtained when the zeolite membrane complex is used as a gas separation membrane.
    Type: Application
    Filed: June 12, 2020
    Publication date: October 1, 2020
    Applicant: NGK INSULATORS, LTD.
    Inventors: Kenichi NODA, Aya MIURA, Ryotaro YOSHIMURA
  • Publication number: 20200197879
    Abstract: A zeolite membrane complex comprises: a support; and a zeolite membrane formed on the support. The membrane is of SAT-type zeolite, and in an X-ray diffraction pattern obtained by X-ray irradiation to the zeolite membrane, a peak intensity around 2?=13.9° is 1.5 times or more a peak intensity around 2?=8.5°.
    Type: Application
    Filed: March 2, 2020
    Publication date: June 25, 2020
    Applicant: NGK INSULATORS, LTD.
    Inventors: Kenichi NODA, Aya MIURA, Ryotaro YOSHIMURA, Takeshi HAGIO
  • Publication number: 20200030753
    Abstract: A peak intensity of a (110) plane is greater than or equal to 2.5 times a peak intensity of a (004) plane in an X-ray diffraction pattern obtained by irradiation of X-rays to a membrane surface of the AFX membrane.
    Type: Application
    Filed: September 17, 2019
    Publication date: January 30, 2020
    Applicant: NGK INSULATORS, LTD.
    Inventors: Takeshi HAGIO, Kenichi Noda, Makoto Miyahara, Katsuya Shimizu, Aya Miura, Ryotaro Yoshimura
  • Publication number: 20200009512
    Abstract: A peak intensity of a (002) plane is greater than or equal to 0.5 times a peak intensity of a (100) plane in an X-ray diffraction pattern obtained by irradiation of X-rays to a membrane surface of the ERI membrane.
    Type: Application
    Filed: September 17, 2019
    Publication date: January 9, 2020
    Applicant: NGK INSULATORS, LTD.
    Inventors: Takeshi HAGIO, Kenichi Noda, Makoto Miyahara, Katsuya Shimizu, Aya Miura, Ryotaro Yoshimura
  • Patent number: 10486110
    Abstract: A silica membrane filter 10 includes a porous substrate 13 and a silica membrane 18 formed on the porous substrate 13, the silica membrane 18 having an aryl group. The silica membrane 18 has an atomic ratio Si/C, as determined by elemental analysis using energy-dispersive X-ray spectrometry (EDX), in the range of 0.2 to 15. The silica membrane 18 preferably has a thickness in the range of 30 nm to 300 nm and an X/Y, a ratio of an absorption intensity X of a Si—O—Si bond to an absorption intensity Y based on the aryl group in a Fourier transform infrared absorption spectrum (FT-IR), in the range of 5.0 to 200.
    Type: Grant
    Filed: September 13, 2017
    Date of Patent: November 26, 2019
    Assignee: NGK Insulators, Ltd.
    Inventors: Aya Miura, Masahiro Furukawa
  • Publication number: 20190292062
    Abstract: Seed crystals are crystals of zeolite to be attached onto a support in production of a zeolite membrane complex including the support and a zeolite membrane formed on the support. The specific surface area of the seed crystals is not smaller than 10 m2/g and not larger than 150 m2/g. The strength obtained from a crystal component at a diffraction angle 2? indicating a maximum peak in a range of diffraction angle 2? from 12° to 25° in an X-ray diffraction pattern obtained by emitting X-ray to the seed crystals is not less than once and not more than 30 times that obtained from an amorphous component. It is thereby possible to improve adherence of the seed crystals to the support.
    Type: Application
    Filed: March 11, 2019
    Publication date: September 26, 2019
    Applicant: NGK INSULATORS, LTD.
    Inventors: Ryotaro YOSHIMURA, Aya MIURA, Kenichi NODA
  • Cap
    Patent number: 10308403
    Abstract: A cap includes a main unit fit onto the mouth of a double-walled container, a spout cylinder provided on the main unit, an inner stopper that is provided in the main unit, and a first inner valve. The inner stopper includes a communicating part that communicates with the inside of the inner container and the inside of the spout cylinder. The first inner valve includes a first valve body that covers the communicating part. The first valve body has passage holes. The first valve body being deformed from a closing position S toward an opening position O keeps acting as a partition between the communicating part and the spout cylinder.
    Type: Grant
    Filed: September 6, 2016
    Date of Patent: June 4, 2019
    Assignees: MIKASA INDUSTRY CO., LTD., KIKKOMAN CORPORATION
    Inventors: Takehisa Hashimoto, Eisuke Miura, Hirotaka Hori, Aya Sakanoue, Hiroaki Mori, Denmi Kuwagaki
  • Publication number: 20190001280
    Abstract: The monolithic separation membrane structure includes a monolithic base, an intermediate layer and a separation membrane. The monolithic base has a plurality of filtration cells extending from a first end face to a second end face. The intermediate layer is formed on an inner surface of the filtration cells. The separation membrane is formed on an inner surface of the intermediate layer. An inner diameter not including the intermediate layer and the separation membrane of the plurality of respective filtration cells is greater than or equal to 1.0 mm to less than or equal to 2.0 mm. A partition wall thickness not including the intermediate layer and the separation membrane of the shortest portion of two adjacent filtration cells of the plurality of filtration cells is greater than or equal to 0.05 mm to less than 0.2 mm. A thickness of the intermediate layer is greater than or equal to 20 ?m to less than 100 ?m.
    Type: Application
    Filed: September 6, 2018
    Publication date: January 3, 2019
    Applicant: NGK INSULATORS, LTD.
    Inventors: Masahiro FURUKAWA, Kei TANAKA, Aya MIURA
  • Publication number: 20180015427
    Abstract: A silica membrane filter 10 includes a porous substrate 13 and a silica membrane 18 formed on the porous substrate 13, the silica membrane 18 having an aryl group. The silica membrane 18 has an atomic ratio Si/C, as determined, by elemental analysis using energy-dispersive X-ray spectrometry (EDX), in the range of 0.2 to 15. The silica membrane 18 preferably has a thickness in the range of 30 nm to 300 nm and an X/Y, a ratio of an absorption intensity X of a Si—O—Si bond to an absorption intensity Y based on the aryl group in a Fourier transform infrared absorption spectrum (FT-IR), in the range of 5.0 to 200.
    Type: Application
    Filed: September 13, 2017
    Publication date: January 18, 2018
    Applicant: NGK INSULATOS, LTD.
    Inventors: AYA MIURA, MASAHIRO FURUKAWA
  • Publication number: 20180001273
    Abstract: A silica membrane filter 10 includes an ultrafiltration membrane 15, which is disposed on a support body 14 and which contains an element 14 as a primary component, and a silica membrane 18 which is disposed on the ultrafiltration membrane 15 and which has an aryl group. The ultrafiltration membrane 15 has a structure infiltrated by Si of the silica membrane 18, the atomic ratio A (=Si/M) of Si to the element M in a membrane-side region 16, which is a region corresponding to 25% of the ultrafiltration membrane 15 from the silica membrane 18, satisfies 0.01?A?0.5, and the ratio A/B of the atomic ratio A to the atomic ratio B (=Si/M) in a base-material-side region 17, which is a region corresponding to 25% from the support body 14, is within the range of 1.1 or more.
    Type: Application
    Filed: September 12, 2017
    Publication date: January 4, 2018
    Applicant: NGK INSULATORS, LTD.
    Inventors: Aya MIURA, Masahiro FURUKAWA
  • Patent number: 9579610
    Abstract: A method for manufacturing a silica membrane filter includes performing, at least once, a fired membrane forming operation having a membrane forming step of applying, to a porous substrate, a precursor sol which is a sol of a silicon alcoxide including a p-tolyl group to form a precursor sol membrane, a drying step of drying the precursor sol membrane formed in the porous substrate to form a dried membrane, and a firing step of firing the dried membrane formed in the porous substrate to form a fired membrane, thereby preparing the silica membrane filter including the porous substrate and a silica membrane which is the fired membrane formed in the porous substrate, and a ratio of a total mass of the silica membrane to a total mass of the dried membrane is 38 mass % or more and 85 mass % or less.
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: February 28, 2017
    Assignee: NGK Insulators, Ltd.
    Inventors: Masaaki Kawai, Aya Miura, Nobuhiko Mori
  • Publication number: 20150053605
    Abstract: A method for manufacturing a silica membrane filter includes performing, at least once, a fired membrane forming operation having a membrane forming step of applying, to a porous substrate, a precursor sol which is a sol of a silicon alcoxide including a p-tolyl group to form a precursor sol membrane, a drying step of drying the precursor sol membrane formed in the porous substrate to form a dried membrane, and a firing step of firing the dried membrane formed in the porous substrate to form a fired membrane, thereby preparing the silica membrane filter including the porous substrate and a silica membrane which is the fired membrane formed in the porous substrate, and a ratio of a total mass of the silica membrane to a total mass of the dried membrane is 38 mass % or more and 85 mass % or less.
    Type: Application
    Filed: September 12, 2014
    Publication date: February 26, 2015
    Inventors: Masaaki KAWAI, Aya MIURA, Nobuhiko MORI