Patents by Inventor Aya Ono

Aya Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12595998
    Abstract: According to the present disclosure, a strain gauge has: a flexible substrate; a resistor formed on the substrate; and a pair of electrodes formed on the substrate and electrically connected with the resistor via conductive traces, and, in this strain gauge, a width of the resistor is 10 ?m or more and 100 ?m or less, and the conductive traces include a portion with a width of 5 ?m or more and 100 ?m or less.
    Type: Grant
    Filed: December 3, 2021
    Date of Patent: April 7, 2026
    Assignee: MINEBEA MITSUMI Inc.
    Inventors: Iku Ishihara, Aya Ono, Yosuke Ogasa, Yuta Aizawa, Toshiaki Asakawa, Atsushi Kitamura
  • Patent number: 12523461
    Abstract: A strain gauge includes a flexible substrate, at least one resistor formed on or above the substrate, and a pair of electrodes formed on or above the substrate, electrodes being electrically coupled to the resistor via lines, respectively. Each of the lines electrically connects an end of the resistor and a given electrode, the end being situated in a width direction of a grid. Each of the lines includes a first metallic layer and a second metallic layer that is formed of a material having a lower resistance than a material of the first metallic layer, the second metallic layer being situated on the first metallic layer.
    Type: Grant
    Filed: April 1, 2021
    Date of Patent: January 13, 2026
    Assignee: MINEBEA MITSUMI Inc.
    Inventors: Atsushi Kitamura, Toshiaki Asakawa, Yosuke Ogasa, Aya Ono, Akiyo Yuguchi
  • Publication number: 20250314539
    Abstract: A strain gauge includes a substrate, a resistor formed on the substrate, and two lines formed on the substrate and coupled to both ends of the resistor. In plan view, each of the two lines includes a first line portion arranged parallel to the resistor with a space between each of the two lines and the resistor in a grid width direction. Each of the two lines includes a first metal layer and a second metal layer laminated on the first metal layer, and an end of the second metal layer in the first line portion protrudes beyond an end of the space in a grid direction along which the resistor is disposed.
    Type: Application
    Filed: June 18, 2025
    Publication date: October 9, 2025
    Inventors: Aya ONO, Yosuke Ogasa
  • Patent number: 12411000
    Abstract: A strain gauge includes a flexible resin substrate and a resistor formed of a film that includes Cr, CrN, and Cr2N, the resistor being situated on or above the substrate. A film thickness of the resistor is greater than or equal to 100 nm and less than or equal to 700 nm.
    Type: Grant
    Filed: March 26, 2021
    Date of Patent: September 9, 2025
    Assignee: MINEBEA MITSUMI Inc.
    Inventors: Atsushi Kitamura, Toshiaki Asakawa, Aya Ono, Akiyo Yuguchi
  • Patent number: 12379268
    Abstract: A strain gauge includes a flexible substrate and a resistor formed of material including at least one of chromium or nickel, the resistor being situated above the substrate. The strain gauge includes a functional layer formed of an insulating material that has a higher thermal conductivity than the resistor, the functional layer being situated between the substrate and the resistor. The resistor includes multiple resistive patterns that are juxtaposed. The resistor includes folded portions each of which connects end portions of resistive portions that are next to each other. A first metallic layer formed of a material that has a higher thermal conductivity than the resistor is laminated on the folded portions.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: August 5, 2025
    Assignee: MINEBEA MITSUMI Inc.
    Inventors: Aya Ono, Toshiaki Asakawa, Atsushi Kitamura, Akiyo Yuguchi, Shinya Toda, Yosuke Ogasa, Yuta Aizawa, Iku Ishihara
  • Patent number: 12359990
    Abstract: A strain gauge includes a substrate, a resistor formed on the substrate, and two lines. The resistor includes multiple elongated portions. Each of the lines includes a first metal layer and a second metal layer that is laminated on the first metal layer and is formed of a material having lower volume resistivity than the first metal layer. In plan view, an outer edge of the first metal layer is exposed from the second metal layer. In plan view, an end of the second metal layer on a first end side in a first direction protrudes further toward the first end side in the first direction than an end of a space that is situated between the first metal layer and an elongated portion adjacent to the first metal layer.
    Type: Grant
    Filed: April 27, 2023
    Date of Patent: July 15, 2025
    Assignee: MINEBEA MITSUMI Inc.
    Inventors: Aya Ono, Yosuke Ogasa
  • Publication number: 20250198737
    Abstract: A strain gauge includes a substrate made of a resin, and a resistor situated on one surface side of the substrate and formed of a film that includes Cr, CrN, and Cr2N. An elastic modulus of the substrate is greater than 9.8 GPa.
    Type: Application
    Filed: March 10, 2023
    Publication date: June 19, 2025
    Inventors: Aya ONO, Toshiaki ASAKAWA, Atsushi KITAMURA, Akiyo YUGUCHI, Shigeyuki ADACHI
  • Publication number: 20250172444
    Abstract: A strain gauge includes a substrate, a resistor formed on the substrate, and two lines formed on the substrate and coupled in series to both ends of the resistor. The resistor includes multiple elongated portions, whose longitudinal directions are aligned with a first direction and which are coupled in series with each other, are arranged side by side. One of the lines is disposed parallel to a given elongated portion, among the multiple elongated portions, that is located at one end in a second direction perpendicular to the first direction. The one line is coupled to one end of the given elongated portion in the first direction, and the other of the lines is disposed parallel to a given elongated portion, among the multiple elongated portions, that is located at the other end in the second direction.
    Type: Application
    Filed: April 27, 2023
    Publication date: May 29, 2025
    Inventors: Aya ONO, Yosuke OGASA
  • Publication number: 20250102380
    Abstract: A strain gauge according to the present disclosure includes: a resin substrate; a resistor formed of a film containing Cr, CrN, and Cr2N on one side of the substrate; and an inorganic insulating layer formed on another side of the substrate, and, in this strain gauge, the inorganic insulating layer is formed at least at a position overlapping a region where the resistor is formed in plan view.
    Type: Application
    Filed: March 24, 2022
    Publication date: March 27, 2025
    Inventors: Aya ONO, Atsushi KITAMURA, Toshiaki ASAKAWA, Akiyo YUGUCHI
  • Publication number: 20240271920
    Abstract: The present strain gauge is a strain gauge installed on a Roberval-type strain generator, and includes a substrate having flexibility; and a resistor formed of a film that contains Cr, CrN, and Cr2N over the substrate, wherein a film thickness of the resistor is greater than or equal to 6 nm and less than or equal to 100 nm.
    Type: Application
    Filed: March 24, 2022
    Publication date: August 15, 2024
    Inventors: Aya ONO, Yosuke OGASA, Toshiaki ASAKAWA, Akiyo YUGUCHI, Atsushi KITAMURA
  • Publication number: 20230408245
    Abstract: According to the present disclosure, a strain gauge has: a flexible substrate; a resistor formed on the substrate; and a pair of electrodes formed on the substrate and electrically connected with the resistor via conductive traces, and, in this strain gauge, a width of the resistor is 10 ?m or more and 100 ?m or less, and the conductive traces include a portion with a width of 5 ?m or more and 100 ?m or less.
    Type: Application
    Filed: December 3, 2021
    Publication date: December 21, 2023
    Inventors: Iku ISHIHARA, Aya ONO, Yosuke OGASA, Yuta AIZAWA, Toshiaki ASAKAWA, Atsushi KITAMURA
  • Publication number: 20230358623
    Abstract: A strain gauge includes a flexible substrate and a resistor formed of material including at least one of chromium or nickel, the resistor being situated above the substrate. The strain gauge includes a functional layer formed of an insulating material that has a higher thermal conductivity than the resistor, the functional layer being situated between the substrate and the resistor. The resistor includes multiple resistive patterns that are juxtaposed. The resistor includes folded portions each of which connects end portions of resistive portions that are next to each other. A first metallic layer formed of a material that has a higher thermal conductivity than the resistor is laminated on the folded portions.
    Type: Application
    Filed: March 19, 2021
    Publication date: November 9, 2023
    Inventors: Aya ONO, Toshiaki ASAKAWA, Atsushi KITAMURA, Akiyo YUGUCHI, Shinya TODA, Yosuke OGASA, Yuta AIZAWA, Iku ISHIHARA
  • Publication number: 20230175831
    Abstract: A strain gauge includes a flexible substrate, at least one resistor formed on or above the substrate, and a pair of electrodes formed on or above the substrate, electrodes being electrically coupled to the resistor via lines, respectively. Each of the lines electrically connects an end of the resistor and a given electrode, the end being situated in a width direction of a grid. Each of the lines includes a first metallic layer and a second metallic layer that is formed of a material having a lower resistance than a material of the first metallic layer, the second metallic layer being situated on the first metallic layer.
    Type: Application
    Filed: April 1, 2021
    Publication date: June 8, 2023
    Inventors: Atsushi KITAMURA, Toshiaki ASAKAWA, Yosuke OGASA, Aya ONO, Akiyo YUGUCHI
  • Publication number: 20230147031
    Abstract: A strain gauge includes a flexible resin substrate and a resistor formed of a film that includes Cr, CrN, and Cr2N, the resistor being situated on or above the substrate. A film thickness of the resistor is greater than or equal to 100 nm and less than or equal to 700 nm.
    Type: Application
    Filed: March 26, 2021
    Publication date: May 11, 2023
    Inventors: Atsushi KITAMURA, Toshiaki ASAKAWA, Aya ONO, Akiyo YUGUCHI
  • Patent number: 11543308
    Abstract: A strain gauge includes a flexible substrate; a resistor formed of material including at least one from among chromium and nickel, on or above the substrate; and electrodes electrically coupled to the resistor. Each electrode includes a terminal section extending from a corresponding end portion from among end portions of the resistor; a first metallic layer formed of copper, a copper alloy, nickel, or a nickel alloy, on or above the terminal section; and a second metallic layer formed of material having better solder wettability than the first metallic layer, on or above the first metallic layer.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: January 3, 2023
    Assignee: MINEBEA MITSUMI Inc.
    Inventors: Akiyo Yuguchi, Aya Ono, Eiji Misaizu
  • Publication number: 20200271533
    Abstract: A strain gauge includes a flexible substrate; a resistor formed of material including at least one from among chromium and nickel, on or above the substrate; and electrodes electrically coupled to the resistor. Each electrode includes a terminal section extending from a corresponding end portion from among end portions of the resistor; a first metallic layer formed of copper, a copper alloy, nickel, or a nickel alloy, on or above the terminal section; and a second metallic layer formed of material having better solder wettability than the first metallic layer, on or above the first metallic layer.
    Type: Application
    Filed: September 27, 2018
    Publication date: August 27, 2020
    Inventors: Akiyo YUGUCHI, Aya ONO, Eiji MISAIZU
  • Patent number: 7365148
    Abstract: A polycarbonate containing an ether diol residue producible from a polysaccharide and expressed by the following formula (1), and a diol residue expressed by the following formula (2) —O—(CmH2m)—O— ??(2) (here, m is an integer of 2 to 12), wherein said ether diol residue amounts to 65-98 wt. % of all the diol residues, and having a glass transition temperature of 90° C. or higher.
    Type: Grant
    Filed: June 14, 2004
    Date of Patent: April 29, 2008
    Assignee: Teijin Limited
    Inventors: Aya Ono, Kiyotsuna Toyohara, Hiroyoshi Minematsu, Yuuichi Kageyama
  • Publication number: 20060149024
    Abstract: A polycarbonate containing an ether diol residue producible from a polysaccharide and expressed by the following formula (1), and a diol residue expressed by the following formula (2) —O—(CmH2m)—O—??(2) (here, m is an integer of 2 to 12), wherein said ether diol residue amounts to 65-98 wt. % of all the diol residues, and having a glass transition temperature of 90° C. or higher.
    Type: Application
    Filed: June 14, 2004
    Publication date: July 6, 2006
    Inventors: Aya Ono, Kiyotsuna Toyohara, Hiroyoshi Minematsu, Yuuichi Kageyama