Abstract: Provided is a primer pair of primers for methicillin-resistant gene detection for the purpose of achieving highly sensitive methicillin-resistant gene detection. Said primer pair comprises a combination of SEQ ID NO: 3 and SEQ ID NO: 7, a combination of SEQ ID NO: 2 and SEQ ID NO: 9, a combination of SEQ ID NO: 1 and SEQ ID NO: 8, a combination of SEQ ID NO: 1 and SEQ ID NO: 9, a combination of SEQ ID NO: 4 and SEQ ID NO: 11, a combination of SEQ ID NO: 5 and SEQ ID NO: 12, a combination of SEQ ID NO: 6 and SEQ ID NO: 10, or a combination of SEQ ID NO: 6 and SEQ ID NO: 12.

Abstract: A photosensitive resin composition contains polymer (A) having an acid dissociative group, photoacid generator (B), and solvent (C), the solvent (C) containing 80 to 95% by mass of propylene glycol monomethyl ether acetate (C1) and 5 to 18% by mass of 3-methoxybutyl acetate (C2), a content ratio of other solvent (C3) in the solvent (C) being 0 to 10% by mass, and a content ratio of the solvent (C) contained in the photosensitive resin composition being less than 60% by mass.

Abstract: A photosensitive resin composition contains at least one compound selected from the group consisting of compound (C1) represented by formula (C1), compound (C2) represented by formula (C2), and a multimer of the compound (C2). Z each independently represents an oxygen atom or a sulfur atom. R31 each independently represents a monovalent hydrocarbon group or a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group, and at least one R31 is a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group when p is 1 and when p is an integer of 2 or more and all of Z is an oxygen atom. R32 and R33 each independently represent a divalent hydrocarbon group, and R34 represents a glycoluril ring structure or an isocyanul ring structure.

Abstract: A method for producing a plated formed product includes: a step (1) of forming on a substrate of the substrate having a metal film a resin film of a photosensitive resin composition containing a sulfur-containing compound having at least one selected from a mercapto group, a sulfide bond, and a polysulfide bond; a step (2) of exposing the resin film; a step (3) of developing the exposed resin film to form a resist pattern film; a step (4) of performing plasma treatment of a substrate having the resist pattern film on the metal film with oxygen-containing gas; and a step (5) of performing, after the plasma treatment, plating treatment with the resist pattern film as a mold.

Abstract: A method for identifying a bacterium includes: (1) A step of performing a reverse transcription reaction using a first reaction system consisting of a primer for reverse transcription to prepare a cDNA containing a base sequence for identification of a bacterium of interest, an RNA extracted from the bacterium in a sample, and an enzyme with RNA-dependent DNA polymerase activity to obtain a reaction mixture containing the synthesized cDNA and the primers for the reverse transcription, (2) A step of performing PCR using a second reaction system consisting of the reaction mixture, a primer pair for synthesis of a double-stranded DNA containing the base sequence for identification of the bacterium of interest, and an enzyme with DNA-dependent DNA polymerase activity, and (3) A step of detecting the generation of the double-stranded DNA containing the base sequence for identification of the bacterium of interest from the second reaction system after PCR.

Abstract: Provided is a primer pair of primers for methicillin-resistant gene detection for the purpose of achieving highly sensitive methicillin-resistant gene detection. Said primer pair comprises a combination of SEQ ID NO: 3 and SEQ ID NO: 7, a combination of SEQ ID NO: 2 and SEQ ID NO: 9, a combination of SEQ ID NO: 1 and SEQ ID NO: 8, a combination of SEQ ID NO: 1 and SEQ ID NO: 9, a combination of SEQ ID NO: 4 and SEQ ID NO: 11, a combination of SEQ ID NO: 5 and SEQ ID NO: 12, a combination of SEQ ID NO: 6 and SEQ ID NO: 10, or a combination of SEQ ID NO: 6 and SEQ ID NO: 12.

Abstract: An acetyl-CoA-producing microorganism, which is capable of efficiently synthesizing acetyl-CoA using carbon dioxide, and a substance production method using the same are provided. An acetyl-CoA-producing microorganism including an acetyl-CoA production cycle obtained by imparting at least one type of enzymatic activity selected from the group consisting of malate thiokinase, malyl-CoA lyase, glyoxylate carboligase, 2-hydroxy-3-oxopropionate reductase, and hydroxypyruvate reductase, to a microorganism.

Abstract: An acetyl-CoA-producing microorganism, which is capable of efficiently synthesizing acetyl-CoA using carbon dioxide, and a substance production method using the same are provided. An acetyl-CoA-producing microorganism including an acetyl-CoA production cycle obtained by imparting at least one type of enzymatic activity selected from the group consisting of malate thiokinase, malyl-CoA lyase, glyoxylate carboligase, 2-hydroxy-3-oxopropionate reductase, and hydroxypyruvate reductase, to a microorganism.

Abstract: A monosaccharide production method of producing a monosaccharide from a lignocellulosic raw material comprising: obtaining a saccharified liquid obtained from a lignocellulosic raw material and a saccharification enzyme; recovering the saccharification enzyme from the saccharified liquid by allowing the saccharification enzyme to be adsorbed on the lignocellulosic raw material; and saccharifying the lignocellulosic raw material using the recovered saccharification enzyme.

Abstract: A process control method comprises adjusting a process condition in consideration of a performance variation among a plurality of manufacturing apparatuses, the performance variation affecting a finished shape of a pattern used to manufacture a semiconductor device, running a simulation of the finished shape under the adjusted process condition, extracting a dangerous point of the pattern affecting satisfaction from the result of the simulation, comparing a first process capability serving as a judgment standard to find whether a production schedule of the device is achieved with a second capability serving to form a dangerous pattern containing the dangerous point, and improving the second process when the second process capability is lower than the first process capability.

Abstract: A process control method comprises adjusting a process condition in consideration of a performance variation among a plurality of manufacturing apparatuses, the performance variation affecting a finished shape of a pattern used to manufacture a semiconductor device, running a simulation of the finished shape under the adjusted process condition, extracting a dangerous point of the pattern affecting satisfaction from the result of the simulation, comparing a first process capability serving as a judgment standard to find whether a production schedule of the device is achieved with a second capability serving to form a dangerous pattern containing the dangerous point, and improving the second process when the second process capability is lower than the first process capability.