Patents by Inventor Ayako FURUSE

Ayako FURUSE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11566108
    Abstract: A polyimide film includes a polyimide in which a specific amount of molecular framework containing one or two silicon atoms in its main chain, wherein a total light transmittance measured in accordance with JIS K7361-1 is 85% or more; wherein a yellowness index calculated in accordance with JIS K7373-2006 is 30 or less; wherein a glass transition temperature is in a temperature range of from 150° C. to 400° C.; and wherein a tensile elastic modulus at 25° C. obtained by measuring a 15 mm×40 mm test piece at a tensile rate of 10 mm/min and a chuck distance of 20 mm in accordance with JIS K7127, is 1.8 GPa or more.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: January 31, 2023
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Katsuya Sakayori, Koudai Okada, Ayako Furuse, Keisuke Wakita, Yoshihiro Kobayashi, Aya Takao, Takanori Maeda, Nahomi Kanazawa, Takayuki Ota
  • Publication number: 20220046801
    Abstract: A mold includes a mold base material and a rugged structure located at a main surface of the mold base material. The rugged structure includes a plurality of linearly shaped projected portions for forming wiring, and a circularly shaped projected portion for forming a pad portion, in which a light-shielding layer is provided at a top portion flat surface of the circularly shaped projected portion for forming the pad portion.
    Type: Application
    Filed: October 20, 2021
    Publication date: February 10, 2022
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Ryohei KASAI, Tadashi FURUKAWA, Ryo FURUGEN, Teppei SOTODA, Tetsushi HOSODA, Ayako FURUSE
  • Patent number: 11191164
    Abstract: A mold includes a mold base material and a rugged structure located at a main surface of the mold base material. The rugged structure includes a plurality of linearly shaped projected portions for forming wiring, and a circularly shaped projected portion for forming a pad portion, in which a light-shielding layer is provided at a top portion flat surface of the circularly shaped projected portion for forming the pad portion.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: November 30, 2021
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Ryohei Kasai, Tadashi Furukawa, Ryo Furugen, Teppei Sotoda, Tetsushi Hosoda, Ayako Furuse
  • Publication number: 20190375894
    Abstract: A polyimide film includes a polyimide in which a specific amount of molecular framework containing one or two silicon atoms in its main chain, wherein a total light transmittance measured in accordance with JIS K7361-1 is 85% or more; wherein a yellowness index calculated in accordance with JIS K7373-2006 is 30 or less; wherein a glass transition temperature is in a temperature range of from 150° C. to 400° C.; and wherein a tensile elastic modulus at 25° C. obtained by measuring a 15 mm×40 mm test piece at a tensile rate of 10 mm/min and a chuck distance of 20 mm in accordance with JIS K7127, is 1.8 GPa or more.
    Type: Application
    Filed: August 8, 2017
    Publication date: December 12, 2019
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Katsuya SAKAYORI, Koudai OKADA, Ayako FURUSE, Keisuke WAKITA, Yoshihiro KOBAYASHI, Aya TAKAO, Takanori MAEDA, Nahomi KANAZAWA, Takayuki OTA
  • Publication number: 20190092913
    Abstract: A resin film has improved rigidity and flex resistance, and reduced optical distortion. A polyimide film has a polyimide containing an aromatic ring, and inorganic particles having a smaller refractive index in a major axis direction than an average refractive index in a direction perpendicular to the major axis direction, wherein, when the polyimide film is monotonically heated from 25° C. at 10° C./min, a size shrinkage ratio represented by the following formula in at least one direction is 0.1% or more at at least one temperature in a range of from 250° C. to 400° C.: size shrinkage ratio (%)=[{(size at 25° C.)?(size after heating)}/(size at 25° C.)]×100; wherein a birefringence index in a thickness direction is 0.020 or less at a wavelength of 590 nm; and wherein a total light transmittance measured in accordance with JIS K7361-1 is 80% or more at a thickness of 10 ?m.
    Type: Application
    Filed: February 24, 2017
    Publication date: March 28, 2019
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Katsuya SAKAYORI, Yoshihiro KOBAYASHI, Keisuke WAKITA, Ayako FURUSE, Koudai OKADA
  • Publication number: 20180310413
    Abstract: A mold includes a mold base material and a rugged structure located at a main surface of the mold base material. The rugged structure includes a plurality of linearly shaped projected portions for forming wiring, and a circularly shaped projected portion for forming a pad portion, in which a light-shielding layer is provided at a top portion flat surface of the circularly shaped projected portion for forming the pad portion.
    Type: Application
    Filed: September 26, 2016
    Publication date: October 25, 2018
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Ryohei KASAI, Tadashi FURUKAWA, Ryo FURUGEN, Teppei SOTODA, Tetsushi HOSODA, Ayako FURUSE