Patents by Inventor Ayako Kuramoto
Ayako Kuramoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10973750Abstract: An object of the present invention is to provide a copolymer which is capable of forming a viscous aqueous solution having a desired viscosity in the presence of an electrolyte, in particular, a polyvalent electrolyte, a thickening agent comprising the copolymer, and a cosmetic preparation comprising the copolymer. The present invention relates to an acrylic acid ester (A)/compound (B) copolymer, comprising, as constitutional components, an acrylic acid ester (A) and a compound (B), wherein the acrylic acid ester (A) is represented by the general formula [1], and the compound (B) has, in each molecule, a polymerizable unsaturated group and any functional group selected from the group consisting of a carboxyl group, a sulfo group, and a phosphate group, and a weight ratio of the acrylic acid ester (A) and the compound (B), which is (A)/(B), is 9.0/91.0 to 28.5/71.Type: GrantFiled: March 30, 2017Date of Patent: April 13, 2021Assignee: FUJIFILM Wako Pure Chemical CorporationInventors: Takatoshi Matsuura, Yasuyoshi Mori, Ayako Kuramoto
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Publication number: 20190110975Abstract: An object of the present invention is to provide a copolymer which is capable of forming a viscous aqueous solution having a desired viscosity in the presence of an electrolyte, in particular, a polyvalent electrolyte, a thickening agent comprising the copolymer, and a cosmetic preparation comprising the copolymer. The present invention relates to an acrylic acid ester (A)/compound (B) copolymer, comprising, as constitutional components, an acrylic acid ester (A) and a compound (B), wherein the acrylic acid ester (A) is represented by the general formula [1], and the compound (B) has, in each molecule, a polymerizable unsaturated group and any functional group selected from the group consisting of a carboxyl group, a sulfo group, and a phosphate group, and a weight ratio of the acrylic acid ester (A) and the compound (B), which is (A)/(B), is 9.0/91.0 to 28.5/71.Type: ApplicationFiled: March 30, 2017Publication date: April 18, 2019Applicant: FUJIFILM Wako Pure Chemical CorporationInventors: Takatoshi MATSUURA, Yasuyoshi MORI, Ayako KURAMOTO
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Patent number: 8969591Abstract: The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.Type: GrantFiled: January 24, 2014Date of Patent: March 3, 2015Assignee: Wako Pure Chemical Industries, Ltd.Inventors: Ayako Kuramoto, Kuniaki Okamoto, Tsutomu Watahiki, Motoshige Sumino
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Patent number: 8957212Abstract: There is intended to provide the novel compounds which generate a base easily when irradiated with long wavelength light (active energy rays), a photobase generator containing the compounds and a photobase generation method, and the present invention relates to the compounds represented by the general formula [1], a photobase generator containing the compounds and a photobase generation method: (wherein, Ar represents any of groups with specific structures selected from the group consisting of an anthracenyl group, an anthraquinonyl group and a pyrenyl group; R1 and R2 each independently represent a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, or represent ones which can form an alicyclic ring containing nitrogen atom(s) or an aromatic ring containing nitrogen atom(s) together with a nitrogen atom to which they are bound, which the rings having 3 to 8 carbon atoms which may have a substituent, R3 and R4 each independently represent a hydrogen atom, a linear, brancType: GrantFiled: December 1, 2009Date of Patent: February 17, 2015Assignee: Wako Pure Chemical Industries, Ltd.Inventors: Ayako Kuramoto, Motoshige Sumino, Nobuhiko Sakai
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Publication number: 20140142324Abstract: The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.Type: ApplicationFiled: January 24, 2014Publication date: May 22, 2014Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.Inventors: Ayako KURAMOTO, Kuniaki OKAMOTO, Tsutomu WATAHIKI, Motoshige SUMINO
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Patent number: 8673963Abstract: The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.Type: GrantFiled: August 3, 2010Date of Patent: March 18, 2014Assignee: Wako Pure Chemical Industries, Ltd.Inventors: Ayako Kuramoto, Kuniaki Okamoto, Tsutomu Watahiki, Motoshige Sumino
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Publication number: 20120130089Abstract: The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.Type: ApplicationFiled: August 3, 2010Publication date: May 24, 2012Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.Inventors: Ayako Kuramoto, Kuniaki Okamoto, Tsutomu Watahiki, Motoshige Sumino
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Publication number: 20110233048Abstract: There is intended to provide the novel compounds which generate a base easily when irradiated with long wavelength light (active energy rays), a photobase generator containing the compounds and a photobase generation method, and the present invention relates to the compounds represented by the general formula [1], a photobase generator containing the compounds and a photobase generation method: (wherein, Ar represents any of groups with specific structures selected from the group consisting of an anthracenyl group, an anthraquinonyl group and a pyrenyl group; R1 and R2 each independently represent a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, or represent ones which can form an alicyclic ring containing nitrogen atom(s) or an aromatic ring containing nitrogen atom(s) together with a nitrogen atom to which they are bound, which the rings having 3 to 8 carbon atoms which may have a substituent, R3 and R4 each independently represent a hydrogen atom, a linear, brancType: ApplicationFiled: December 1, 2009Publication date: September 29, 2011Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.Inventors: Ayako Kuramoto, Motoshige Sumino, Nobuhiko Sakai