Patents by Inventor Ayako Mizushima

Ayako Mizushima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8916206
    Abstract: Drug-containing nanoparticles are provided that enable effective targeting and sustained-release of a water-soluble, non-peptide, low-molecular weight drug and cause reduced accumulation of the drug in the liver. The nanoparticles containing a water-soluble, non-peptide, low-molecular weight drug are obtained by hydrophobicizing the water-soluble, non-peptide, low-molecular weight drug by a metal ion, and reacting the hydrophobicized drug with a poly(lactic acid)-polyethylene glycol block copolymer or a poly(lactic-co-glycolic acid)-polyethylene glycol block copolymer. The nanoparticles have favorable targeting and sustained-release properties and cause reduced accumulation of the drug in the liver.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: December 23, 2014
    Assignee: LTT Bio-Pharma Co., Ltd.
    Inventors: Tsutomu Ishihara, Ayako Mizushima
  • Patent number: 8080350
    Abstract: Disclosed is a positive photosensitive resin composition containing (A) an alkali-soluble resin, (B) a diazoquinone compound, (d1) an activated silicon compound and (d2) an aluminum complex. Also disclosed is a positive photosensitive resin composition containing (A) an alkali-soluble resin, (B) a diazoquinone compound, (C) a compound having two or more oxetanyl groups in one molecule and (D) a catalyst for accelerating the ring-opening reaction of the oxetanyl groups of the compound (C).
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: December 20, 2011
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Toshio Banba, Ayako Mizushima
  • Publication number: 20100196808
    Abstract: An objective of the present invention is to achieve both prevention of scum generation in an open area and improvement in sensitivity in patterning process of the positive photosensitive resin composition. This objective can be achieved by a positive photosensitive resin composition comprising an alkali-soluble resin (A) containing an ingredient having a molecular weight of 80,000 or more in 0.5% or less and a photosensitizing agent (B), wherein the amount of said photosensitizing agent (B) is 10 parts by weight or more and 40 parts by weight or less to 100 parts by weight of said alkali-soluble resin (A).
    Type: Application
    Filed: January 7, 2009
    Publication date: August 5, 2010
    Applicant: SUMITOMO BAKELITE CO., LTD.
    Inventors: Ayako Mizushima, Hiroaki Makabe, Naoshige Takeda
  • Publication number: 20100143321
    Abstract: A therapeutic agent for interstitial pneumonia is provided which effectively exploits the effect of superoxide dismutase (SOD). The therapeutic composition for interstitial pneumonia contains 10 to 100 mg of lecithinized superoxide dismutase represented by the following general formula (I): SOD?(Q-B)m ??(I) (wherein SOD? is a residue of superoxide dismutase; Q is a chemical crosslink; B is a residue of lysolecithin having the hydrogen atom of the hydroxyl group at position 2 of its glycerol moiety removed; and m is the average number of lysolecithin molecules bound to one molecule of the superoxide dismutase and is an integer of 1 or greater) and further contains sucrose to give it a stable form suitable for intravenous administration.
    Type: Application
    Filed: December 19, 2007
    Publication date: June 10, 2010
    Applicant: LTT BIO PHARMA CO., LTD.
    Inventors: Kouji Shirai, Tatsuo Kawashima, Toshihisa Kuroda, Yutaka Mizushima, Ayako Mizushima, Masahiro Murakami, Tomoharu Fukuzaki
  • Publication number: 20100129456
    Abstract: A nanoparticle containing a low-molecular-weight drug having a negatively charged group is provided that is effectively targeted to an affected site, is capable of sufficiently sustained release of the drug, and has a reduced tendency to accumulate in the liver to cause reduced side effects. The nanoparticle containing a low-molecular-weight drug having a negatively charged group is obtained by hydrophobicizing the low-molecular-weight drug having a negatively charged group with a metal ion, and reacting the hydrophobicized drug with poly L-lactic acid or poly(L-lactic acid/glycolic acid) copolymer and poly DL- or L-lactic acid-polyethylene glycol block copolymer or poly(DL- or L-lactic acid/glycolic acid)-polyethylene glycol block copolymer.
    Type: Application
    Filed: April 11, 2008
    Publication date: May 27, 2010
    Applicant: LTT Bio-Pharma Co., Ltd.
    Inventors: Tsutomu Ishihara, Yutaka Mizushima, Ayako Mizushima, Toru Mizushima
  • Publication number: 20090166818
    Abstract: Disclosed is a positive photosensitive resin composition containing (A) an alkali-soluble resin, (B) a diazoquinone compound, (d1) an activated silicon compound and (d2) an aluminum complex. Also disclosed is a positive photosensitive resin composition containing (A) an alkali-soluble resin, (B) a diazoquinone compound, (C) a compound having two or more oxetanyl groups in one molecule and (D) a catalyst for accelerating the ring-opening reaction of the oxetanyl groups of the compound (C).
    Type: Application
    Filed: November 17, 2006
    Publication date: July 2, 2009
    Applicant: SUMITOMO BAKELITE COMPANY LIMITED
    Inventors: Toshio Banba, Ayako Mizushima
  • Patent number: 6830825
    Abstract: An epoxy resin composition for encapsulation of semiconductors which contains substantially no halogen-based flame retarding agents or antimony compounds having properties of moldability, flame retardance, high-temperature storage characteristics, reliability for moisture resistance, and solder cracking resistance. The epoxy resin composition for encapsulating semiconductors contains (A) an epoxy resin, (B) a phenolic resin, (C) a curing accelerator, (D) an inorganic filler and (E) a phosphazene compound as essential components, the total weight of phosphate ion and phosphite ion contained in the phosphazene compound being not more than 500 ppm. Further, the epoxy resin composition may optionally contain a flame-retarding assistant or an ion scavenger.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: December 14, 2004
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Takafumi Sumiyoshi, Ayako Mizushima, Ken Oota, Yoshio Fujieda, Hiroki Nikaido, Takashi Aihara
  • Publication number: 20030187107
    Abstract: The present invention provides an epoxy resin composition for encapsulation of semiconductors which contains substantially neither halogen-based flame retarding agents nor antimony compounds and is excellent in moldability, flame retardance, high-temperature storage characteristics, reliability for moisture resistance, and solder cracking resistance. That is, the present invention is an epoxy resin composition for encapsulating semiconductors which contains (A) an epoxy resin, (B) a phenolic resin, (C) a curing accelerator, (D) an inorganic filler and (E) a phosphazene compound as essential components, the total weight of phosphate ion and phosphite ion contained in the phosphazene compound being not more than 500 ppm. Further, the epoxy resin composition may optionally contain a flame-retarding assistant or an ion scavenger.
    Type: Application
    Filed: October 31, 2002
    Publication date: October 2, 2003
    Inventors: Takafumi Sumiyoshi, Ayako Mizushima, Ken Oota, Yoshio Fujieda, Hiroki Nikaido, Takashi Aihara