Patents by Inventor Ayako Sugase

Ayako Sugase has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6187493
    Abstract: The present invention provides an electrophotosensitive material comprising a conductive substrate and a photosensitive layer provided on the conductive substrate, the photosensitive layer comprising a specific hole transferring material and/or electron transferring material and a binding resin of a polyester resin which is a substantially linear polymer obtained by using a specific dihydroxy compound represented by the general formula (1): wherein R1 is an alkylene group having 2 to 4 carbon atoms; and R2, R3, R4 and R5 are the same or different and indicate a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group or an aralkyl group or the like. This photosensitive material is improved in sensitivity, and is also superior in adhesion to conductive substrate as well as mechanical strength such as wear resistance, etc.
    Type: Grant
    Filed: February 10, 1998
    Date of Patent: February 13, 2001
    Assignee: Kyocera Mita Corporation
    Inventors: Masato Katsukawa, Akiyoshi Urano, Ayako Sugase, Mitsuo Ihara, Ichiro Yamazato, Yuka Nakamura
  • Patent number: 5780194
    Abstract: The present invention provides an electrophotosensitive material comprising a conductive substrate and a photosensitive layer provided on the conductive substrate, the photosensitive layer comprising a specific hole transferring material and/or electron transferring material and a binding resin of a polyester resin which is a substantially linear polymer obtained by using a specific dihydroxy compound represented by the general formula (1): ##STR1## wherein R.sup.1 is an alkylene group having 2 to 4 carbon atoms; and R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are the same or different and indicate a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group or an aralkyl group or the like. This photosensitive material is improved in sensitivity, and is also superior in adhesion to conductive substrate as well as mechanical strength such as wear resistance, etc.
    Type: Grant
    Filed: April 9, 1996
    Date of Patent: July 14, 1998
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Masato Katsukawa, Akiyoshi Urano, Ayako Sugase, Mitsuo Ihara, Ichiro Yamazato, Yuka Nakamura